BE569884A - - Google Patents

Info

Publication number
BE569884A
BE569884A BE569884DA BE569884A BE 569884 A BE569884 A BE 569884A BE 569884D A BE569884D A BE 569884DA BE 569884 A BE569884 A BE 569884A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE569884A publication Critical patent/BE569884A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
    • C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
    • C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
    • C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
    • C07D235/18—Benzimidazoles; Hydrogenated benzimidazoles with aryl radicals directly attached in position 2
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE569884D 1957-08-03 BE569884A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK32622A DE1047622B (de) 1957-08-03 1957-08-03 Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen

Publications (1)

Publication Number Publication Date
BE569884A true BE569884A (xx)

Family

ID=7219501

Family Applications (1)

Application Number Title Priority Date Filing Date
BE569884D BE569884A (xx) 1957-08-03

Country Status (7)

Country Link
US (1) US3050389A (xx)
BE (1) BE569884A (xx)
CH (1) CH371689A (xx)
DE (1) DE1047622B (xx)
FR (1) FR1209341A (xx)
GB (1) GB837368A (xx)
NL (2) NL230139A (xx)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3868254A (en) * 1972-11-29 1975-02-25 Gaf Corp Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
US4024122A (en) * 1973-02-12 1977-05-17 Rca Corporation Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone)
US4093461A (en) * 1975-07-18 1978-06-06 Gaf Corporation Positive working thermally stable photoresist composition, article and method of using
US4853315A (en) * 1988-01-15 1989-08-01 International Business Machines Corporation O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists
US5273856A (en) * 1990-10-31 1993-12-28 International Business Machines Corporation Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation
JP2976597B2 (ja) * 1991-04-17 1999-11-10 住友化学工業株式会社 キノンジアジドスルホン酸エステルの製造方法
WO2007007464A1 (ja) * 2005-07-11 2007-01-18 Idemitsu Kosan Co., Ltd. 含窒素複素環誘導体及びそれを用いた有機エレクトロルミネッセンス素子
US8187727B2 (en) * 2005-07-22 2012-05-29 Lg Chem, Ltd. Imidazole derivatives, preparation method thereof and organic electronic device using the same
KR102638582B1 (ko) * 2016-01-13 2024-02-21 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 레지스트 패턴 형성 방법 및 산 확산 제어제
JP7215970B2 (ja) * 2019-06-28 2023-01-31 富士フイルム株式会社 光電変換素子、撮像素子、光センサ、光電変換素子用材料、化合物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB567659A (en) * 1943-06-17 1945-02-26 Nat Marking Machine Company Lt Improvements in or relating to laundry marking with fluorescent material
NL80569C (xx) * 1949-07-23
BE504900A (xx) * 1949-07-30
CH307356A (de) * 1951-08-08 1955-05-31 Kalle & Co Ag Lichtempfindliches Material für die photomechanische Reproduktion.
US2754209A (en) * 1952-06-10 1956-07-10 Azoplate Corp Light-sensitive para quinone diazides for making printing plates

Also Published As

Publication number Publication date
NL230139A (xx)
DE1047622B (de) 1958-12-24
US3050389A (en) 1962-08-21
CH371689A (de) 1963-08-31
NL104507C (xx)
GB837368A (en) 1960-06-15
FR1209341A (fr) 1960-03-01

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