BE569884A - - Google Patents
Info
- Publication number
- BE569884A BE569884A BE569884DA BE569884A BE 569884 A BE569884 A BE 569884A BE 569884D A BE569884D A BE 569884DA BE 569884 A BE569884 A BE 569884A
- Authority
- BE
- Belgium
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/18—Benzimidazoles; Hydrogenated benzimidazoles with aryl radicals directly attached in position 2
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK32622A DE1047622B (de) | 1957-08-03 | 1957-08-03 | Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE569884A true BE569884A (US08124317-20120228-C00009.png) |
Family
ID=7219501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE569884D BE569884A (US08124317-20120228-C00009.png) | 1957-08-03 |
Country Status (7)
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3868254A (en) * | 1972-11-29 | 1975-02-25 | Gaf Corp | Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants |
| US4024122A (en) * | 1973-02-12 | 1977-05-17 | Rca Corporation | Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone) |
| US4093461A (en) * | 1975-07-18 | 1978-06-06 | Gaf Corporation | Positive working thermally stable photoresist composition, article and method of using |
| US4853315A (en) * | 1988-01-15 | 1989-08-01 | International Business Machines Corporation | O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists |
| US5273856A (en) * | 1990-10-31 | 1993-12-28 | International Business Machines Corporation | Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation |
| JP2976597B2 (ja) * | 1991-04-17 | 1999-11-10 | 住友化学工業株式会社 | キノンジアジドスルホン酸エステルの製造方法 |
| WO2007007464A1 (ja) * | 2005-07-11 | 2007-01-18 | Idemitsu Kosan Co., Ltd. | 含窒素複素環誘導体及びそれを用いた有機エレクトロルミネッセンス素子 |
| US8187727B2 (en) * | 2005-07-22 | 2012-05-29 | Lg Chem, Ltd. | Imidazole derivatives, preparation method thereof and organic electronic device using the same |
| KR102638582B1 (ko) * | 2016-01-13 | 2024-02-21 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물, 레지스트 패턴 형성 방법 및 산 확산 제어제 |
| JP7215970B2 (ja) * | 2019-06-28 | 2023-01-31 | 富士フイルム株式会社 | 光電変換素子、撮像素子、光センサ、光電変換素子用材料、化合物 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB567659A (en) * | 1943-06-17 | 1945-02-26 | Nat Marking Machine Company Lt | Improvements in or relating to laundry marking with fluorescent material |
| NL80569C (US08124317-20120228-C00009.png) * | 1949-07-23 | |||
| BE504900A (US08124317-20120228-C00009.png) * | 1949-07-30 | |||
| CH307356A (de) * | 1951-08-08 | 1955-05-31 | Kalle & Co Ag | Lichtempfindliches Material für die photomechanische Reproduktion. |
| US2754209A (en) * | 1952-06-10 | 1956-07-10 | Azoplate Corp | Light-sensitive para quinone diazides for making printing plates |
-
0
- NL NL104507D patent/NL104507C/xx active
- NL NL230139D patent/NL230139A/xx unknown
- BE BE569884D patent/BE569884A/xx unknown
-
1957
- 1957-08-03 DE DEK32622A patent/DE1047622B/de active Pending
-
1958
- 1958-07-25 CH CH6223558A patent/CH371689A/de unknown
- 1958-07-28 US US751114A patent/US3050389A/en not_active Expired - Lifetime
- 1958-07-30 FR FR1209341D patent/FR1209341A/fr not_active Expired
- 1958-07-31 GB GB24718/58A patent/GB837368A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL230139A (US08124317-20120228-C00009.png) | |
| DE1047622B (de) | 1958-12-24 |
| US3050389A (en) | 1962-08-21 |
| CH371689A (de) | 1963-08-31 |
| NL104507C (US08124317-20120228-C00009.png) | |
| GB837368A (en) | 1960-06-15 |
| FR1209341A (fr) | 1960-03-01 |
