AU5860701A - Improvements to filters - Google Patents

Improvements to filters

Info

Publication number
AU5860701A
AU5860701A AU58607/01A AU5860701A AU5860701A AU 5860701 A AU5860701 A AU 5860701A AU 58607/01 A AU58607/01 A AU 58607/01A AU 5860701 A AU5860701 A AU 5860701A AU 5860701 A AU5860701 A AU 5860701A
Authority
AU
Australia
Prior art keywords
filters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU58607/01A
Inventor
Paul B. Kirby
Eiju Komuro
Qingxin Su
Roger W. Whatmore
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Publication of AU5860701A publication Critical patent/AU5860701A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02094—Means for compensation or elimination of undesirable effects of adherence
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezo-electric or electrostrictive material
    • H03H9/58—Multiple crystal filters
    • H03H9/60—Electric coupling means therefor
    • H03H9/605—Electric coupling means therefor consisting of a ladder configuration
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H03H2003/0414—Resonance frequency
    • H03H2003/0421—Modification of the thickness of an element
    • H03H2003/0435—Modification of the thickness of an element of a piezoelectric layer
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H03H2003/0414—Resonance frequency
    • H03H2003/045—Modification of the area of an element
    • H03H2003/0457—Modification of the area of an element of an electrode
AU58607/01A 2000-05-24 2001-05-23 Improvements to filters Abandoned AU5860701A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB0012437.0A GB0012437D0 (en) 2000-05-24 2000-05-24 Improvements to filters
GB0012437 2000-05-24
PCT/GB2001/002293 WO2001091290A1 (en) 2000-05-24 2001-05-23 Improvements to filters

Publications (1)

Publication Number Publication Date
AU5860701A true AU5860701A (en) 2001-12-03

Family

ID=9892141

Family Applications (1)

Application Number Title Priority Date Filing Date
AU58607/01A Abandoned AU5860701A (en) 2000-05-24 2001-05-23 Improvements to filters

Country Status (8)

Country Link
US (1) US7046103B2 (en)
EP (1) EP1287613B1 (en)
JP (1) JP2003534696A (en)
CN (1) CN1205742C (en)
AU (1) AU5860701A (en)
DE (1) DE60137764D1 (en)
GB (1) GB0012437D0 (en)
WO (1) WO2001091290A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0014630D0 (en) * 2000-06-16 2000-08-09 Koninkl Philips Electronics Nv Bulk accoustic wave filter
GB0029090D0 (en) * 2000-11-29 2001-01-10 Univ Cranfield Improvements in or relating to filters
KR100622393B1 (en) * 2005-07-05 2006-09-12 삼성전자주식회사 Bulk acoustic resonator comprising a resonance part with dimple and fabrication method therefor
US7528681B2 (en) * 2005-12-20 2009-05-05 Palo Alto Research Center Incorporated Acoustic devices using an AlGaN piezoelectric region
JP5190841B2 (en) 2007-05-31 2013-04-24 独立行政法人産業技術総合研究所 Piezoelectric thin film, piezoelectric body and manufacturing method thereof, and piezoelectric resonator, actuator element, and physical sensor using the piezoelectric thin film
KR101375660B1 (en) * 2008-02-22 2014-03-19 삼성전자주식회사 A resonator, bandpass filter and manufacturing method of resonator using overlay electromagnetic bandgap structure
US8476809B2 (en) 2008-04-29 2013-07-02 Sand 9, Inc. Microelectromechanical systems (MEMS) resonators and related apparatus and methods
US8410868B2 (en) * 2009-06-04 2013-04-02 Sand 9, Inc. Methods and apparatus for temperature control of devices and mechanical resonating structures
US9048811B2 (en) 2009-03-31 2015-06-02 Sand 9, Inc. Integration of piezoelectric materials with substrates
CN109167128B (en) * 2018-08-20 2021-01-26 武汉衍熙微器件有限公司 Method for improving performance of filter and filter thereof
CN111600566B (en) * 2020-04-21 2021-06-01 诺思(天津)微系统有限责任公司 Filter, bulk acoustic wave resonator assembly, method of manufacturing the same, and electronic apparatus

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS639141Y2 (en) * 1980-10-22 1988-03-18
US4320365A (en) 1980-11-03 1982-03-16 United Technologies Corporation Fundamental, longitudinal, thickness mode bulk wave resonator
US4818959A (en) * 1986-03-28 1989-04-04 Tdk Corporation Phase equalizer
US4837533A (en) 1987-07-22 1989-06-06 Toko Kabushiki Kaisha Ladder-type ceramic filter
JPH0513061Y2 (en) 1987-07-27 1993-04-06
JPH01314008A (en) * 1988-06-13 1989-12-19 Ngk Spark Plug Co Ltd Ladder-type piezoelectric filter
US5185589A (en) * 1991-05-17 1993-02-09 Westinghouse Electric Corp. Microwave film bulk acoustic resonator and manifolded filter bank
US5587620A (en) 1993-12-21 1996-12-24 Hewlett-Packard Company Tunable thin film acoustic resonators and method for making the same
US5471178A (en) 1994-02-03 1995-11-28 Motorola, Inc. Ladder filter and method for producing conjugately matched impedance
JP3371050B2 (en) 1995-10-27 2003-01-27 三菱電機株式会社 Thin film piezoelectric element
JPH0964609A (en) * 1995-08-23 1997-03-07 Murata Mfg Co Ltd Thin film laminated electrode and its production
JP3087651B2 (en) * 1996-06-03 2000-09-11 株式会社村田製作所 Thin film multilayer electrode, high frequency transmission line, high frequency resonator and high frequency filter
US5939957A (en) 1996-07-26 1999-08-17 Ngk Spark Plug Co., Ltd. 6-elements ladder type piezoelectric filter
US6051907A (en) 1996-10-10 2000-04-18 Nokia Mobile Phones Limited Method for performing on-wafer tuning of thin film bulk acoustic wave resonators (FBARS)
US5910756A (en) * 1997-05-21 1999-06-08 Nokia Mobile Phones Limited Filters and duplexers utilizing thin film stacked crystal filter structures and thin film bulk acoustic wave resonators
JP3227649B2 (en) * 1997-08-07 2001-11-12 株式会社村田製作所 Surface acoustic wave filter
JP3228223B2 (en) * 1998-05-26 2001-11-12 株式会社村田製作所 Surface acoustic wave filter
JP3444218B2 (en) * 1999-02-10 2003-09-08 株式会社村田製作所 Dielectric resonator, dielectric filter, dielectric duplexer, oscillator, communication device
JP3498204B2 (en) * 1999-03-10 2004-02-16 株式会社村田製作所 Surface acoustic wave filter and communication device using the same
US6377136B1 (en) * 2000-02-04 2002-04-23 Agere Systems Guardian Corporation Thin film resonator filter having at least one component with different resonant frequency sets or electrode capacitance
JP3389911B2 (en) * 2000-02-07 2003-03-24 株式会社村田製作所 Surface acoustic wave filter, duplexer and communication device
US6462631B2 (en) * 2001-02-14 2002-10-08 Agilent Technologies, Inc. Passband filter having an asymmetrical filter response

Also Published As

Publication number Publication date
US20020118078A1 (en) 2002-08-29
CN1205742C (en) 2005-06-08
WO2001091290A1 (en) 2001-11-29
EP1287613B1 (en) 2009-02-25
JP2003534696A (en) 2003-11-18
GB0012437D0 (en) 2000-07-12
EP1287613A1 (en) 2003-03-05
CN1386320A (en) 2002-12-18
US7046103B2 (en) 2006-05-16
DE60137764D1 (en) 2009-04-09

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase