AU4972099A - Exposure device having a planar motor - Google Patents

Exposure device having a planar motor

Info

Publication number
AU4972099A
AU4972099A AU49720/99A AU4972099A AU4972099A AU 4972099 A AU4972099 A AU 4972099A AU 49720/99 A AU49720/99 A AU 49720/99A AU 4972099 A AU4972099 A AU 4972099A AU 4972099 A AU4972099 A AU 4972099A
Authority
AU
Australia
Prior art keywords
exposure device
planar motor
planar
motor
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU49720/99A
Inventor
John K. Eaton
Andrew J. Hazelton
Keiichi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU4972099A publication Critical patent/AU4972099A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom
AU49720/99A 1998-07-09 1999-07-07 Exposure device having a planar motor Abandoned AU4972099A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10/193878 1998-07-09
JP19387898A JP4088728B2 (en) 1998-07-09 1998-07-09 Planar motor device, driving device and exposure device
PCT/US1999/015278 WO2000003301A2 (en) 1998-07-09 1999-07-07 Exposure device having a planar motor

Publications (1)

Publication Number Publication Date
AU4972099A true AU4972099A (en) 2000-02-01

Family

ID=16315253

Family Applications (1)

Application Number Title Priority Date Filing Date
AU49720/99A Abandoned AU4972099A (en) 1998-07-09 1999-07-07 Exposure device having a planar motor

Country Status (4)

Country Link
EP (1) EP1064713A4 (en)
JP (1) JP4088728B2 (en)
AU (1) AU4972099A (en)
WO (1) WO2000003301A2 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6351041B1 (en) 1999-07-29 2002-02-26 Nikon Corporation Stage apparatus and inspection apparatus having stage apparatus
TWI248718B (en) 1999-09-02 2006-02-01 Koninkl Philips Electronics Nv Displacement device
EP1124161A3 (en) * 2000-02-10 2004-01-07 ASML Netherlands B.V. Lithographic projection apparatus having a temperature controlled heat shield
TW588222B (en) * 2000-02-10 2004-05-21 Asml Netherlands Bv Cooling of voice coil motors in lithographic projection apparatus
JP4510419B2 (en) * 2003-10-01 2010-07-21 キヤノン株式会社 Stage apparatus, exposure apparatus, and device manufacturing method
JP4474151B2 (en) * 2003-11-28 2010-06-02 キヤノン株式会社 Motor, exposure apparatus using the same, and device manufacturing method
JP4418699B2 (en) * 2004-03-24 2010-02-17 キヤノン株式会社 Exposure equipment
JP2008527965A (en) * 2005-01-18 2008-07-24 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Coil assembly for electric motor
JP2006287014A (en) 2005-04-01 2006-10-19 Canon Inc Positioning apparatus and linear motor
JP4673117B2 (en) * 2005-04-08 2011-04-20 キヤノン株式会社 Stage apparatus and exposure apparatus
JP4936368B2 (en) * 2006-11-21 2012-05-23 株式会社リコー Vacuum chamber and electron beam drawing apparatus
DE102007035793A1 (en) 2007-07-04 2009-01-08 Institut für Mikroelektronik- und Mechatronik-Systeme gGmbH Precision planar positioning arrangement for workpiece, has discharging unit for discharging waste heat, so that sandwich structure of stator plate, rotor and auxiliary stator is provided, and measuring device for determining rotor position
US20100156198A1 (en) * 2008-12-22 2010-06-24 Alexander Cooper Shield layer plus refrigerated backside cooling for planar motors
JP5430204B2 (en) 2009-04-01 2014-02-26 キヤノン株式会社 Linear motor, stage apparatus using the same, exposure apparatus, and device manufacturing method
WO2011108170A1 (en) * 2010-03-04 2011-09-09 株式会社安川電機 Stage device
JP5632736B2 (en) * 2010-12-27 2014-11-26 キヤノンアネルバ株式会社 Substrate transfer apparatus and vacuum processing apparatus
RU2563967C1 (en) * 2014-07-01 2015-09-27 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" Linear pulse motor of executive mechanism of nuclear reactor control and protection
CN112470078A (en) * 2018-06-05 2021-03-09 Asml荷兰有限公司 Assembly comprising a cryostat and a superconducting coil layer and electrical machine system provided with such an assembly

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61189637A (en) * 1985-02-19 1986-08-23 Canon Inc Exposure device
JPH0487551A (en) * 1990-07-26 1992-03-19 Nippon Seiko Kk Linear motor device
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
JPH05198490A (en) * 1992-01-22 1993-08-06 Fujitsu Ltd Charged-particle beam exposure system
JP3475973B2 (en) * 1994-12-14 2003-12-10 株式会社ニコン Linear motor, stage device, and exposure device
JPH08293449A (en) * 1995-04-24 1996-11-05 Nikon Corp Aligner

Also Published As

Publication number Publication date
WO2000003301A2 (en) 2000-01-20
WO2000003301A9 (en) 2000-05-25
EP1064713A2 (en) 2001-01-03
JP4088728B2 (en) 2008-05-21
JP2000032733A (en) 2000-01-28
EP1064713A4 (en) 2005-07-20
WO2000003301A3 (en) 2000-03-16

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase