AU464727B2 - A method for controlling the composition ofa deposited film - Google Patents

A method for controlling the composition ofa deposited film

Info

Publication number
AU464727B2
AU464727B2 AU47782/72A AU4778272A AU464727B2 AU 464727 B2 AU464727 B2 AU 464727B2 AU 47782/72 A AU47782/72 A AU 47782/72A AU 4778272 A AU4778272 A AU 4778272A AU 464727 B2 AU464727 B2 AU 464727B2
Authority
AU
Australia
Prior art keywords
controlling
deposited film
composition ofa
ofa
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU47782/72A
Other languages
English (en)
Other versions
AU4778272A (en
Inventor
DONALD LEIBOWITZ DOROTHY MORSE HOFFMAN and FREDERICK JAMES TAMS ni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of AU4778272A publication Critical patent/AU4778272A/en
Application granted granted Critical
Publication of AU464727B2 publication Critical patent/AU464727B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
AU47782/72A 1971-11-04 1972-10-16 A method for controlling the composition ofa deposited film Expired AU464727B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US19578471A 1971-11-04 1971-11-04
USUS195,784 1971-11-04

Publications (2)

Publication Number Publication Date
AU4778272A AU4778272A (en) 1974-04-26
AU464727B2 true AU464727B2 (en) 1975-09-04

Family

ID=22722795

Family Applications (1)

Application Number Title Priority Date Filing Date
AU47782/72A Expired AU464727B2 (en) 1971-11-04 1972-10-16 A method for controlling the composition ofa deposited film

Country Status (12)

Country Link
US (1) US3756847A (ja)
JP (1) JPS5216467B2 (ja)
AU (1) AU464727B2 (ja)
BE (1) BE790940A (ja)
CA (1) CA975628A (ja)
CH (1) CH590935A5 (ja)
DE (1) DE2252484A1 (ja)
FR (1) FR2156413B1 (ja)
GB (1) GB1392865A (ja)
IT (1) IT975345B (ja)
NL (1) NL7214898A (ja)
SE (1) SE379059B (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3889019A (en) * 1969-03-13 1975-06-10 United Aircraft Corp Vapor randomization in vacuum deposition of coatings
JPS5137667B2 (ja) * 1971-11-13 1976-10-16
US4021277A (en) * 1972-12-07 1977-05-03 Sprague Electric Company Method of forming thin film resistor
JPS5181791A (ja) * 1975-01-13 1976-07-17 Osaka Koon Denki Kk Ionkapureeteinguhoho
US4416912A (en) * 1979-10-13 1983-11-22 The Gillette Company Formation of coatings on cutting edges
US4617192A (en) * 1982-12-21 1986-10-14 At&T Bell Laboratories Process for making optical INP devices
US4472453A (en) * 1983-07-01 1984-09-18 Rca Corporation Process for radiation free electron beam deposition
JPS60251273A (ja) * 1984-05-28 1985-12-11 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
US4842710A (en) * 1987-03-23 1989-06-27 Siemens Aktiengesellschaft Method of making mixed nitride films with at least two metals
US5514229A (en) * 1993-11-24 1996-05-07 Ramot-University Authority For Applied Research And Industrial Development Ltd., Tel Aviv University Method of producing transparent and other electrically conductive materials
US7250196B1 (en) 1999-10-26 2007-07-31 Basic Resources, Inc. System and method for plasma plating
US6521104B1 (en) * 2000-05-22 2003-02-18 Basic Resources, Inc. Configurable vacuum system and method
US6503379B1 (en) 2000-05-22 2003-01-07 Basic Research, Inc. Mobile plating system and method
US20030180450A1 (en) * 2002-03-22 2003-09-25 Kidd Jerry D. System and method for preventing breaker failure
US20050126497A1 (en) * 2003-09-30 2005-06-16 Kidd Jerry D. Platform assembly and method
US20080057195A1 (en) * 2006-08-31 2008-03-06 United Technologies Corporation Non-line of sight coating technique

Also Published As

Publication number Publication date
US3756847A (en) 1973-09-04
NL7214898A (ja) 1973-05-08
BE790940A (fr) 1973-03-01
IT975345B (it) 1974-07-20
JPS4855670A (ja) 1973-08-04
JPS5216467B2 (ja) 1977-05-10
DE2252484A1 (de) 1973-05-10
SE379059B (ja) 1975-09-22
FR2156413A1 (ja) 1973-05-25
CA975628A (en) 1975-10-07
FR2156413B1 (ja) 1976-05-21
CH590935A5 (ja) 1977-08-31
GB1392865A (en) 1975-05-07
AU4778272A (en) 1974-04-26

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