AU3469999A - Fluid nozzle system, energy emission system for photolithography and its method of manufacture - Google Patents

Fluid nozzle system, energy emission system for photolithography and its method of manufacture

Info

Publication number
AU3469999A
AU3469999A AU34699/99A AU3469999A AU3469999A AU 3469999 A AU3469999 A AU 3469999A AU 34699/99 A AU34699/99 A AU 34699/99A AU 3469999 A AU3469999 A AU 3469999A AU 3469999 A AU3469999 A AU 3469999A
Authority
AU
Australia
Prior art keywords
photolithography
manufacture
fluid nozzle
energy emission
nozzle system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU34699/99A
Other languages
English (en)
Inventor
Vincent S. Calia
Robert M. Gutowski
Edwin G. Haas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energy Systems Inc
Original Assignee
Advanced Energy Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/054,987 external-priority patent/US6065203A/en
Priority claimed from US09/054,831 external-priority patent/US6105885A/en
Application filed by Advanced Energy Systems Inc filed Critical Advanced Energy Systems Inc
Publication of AU3469999A publication Critical patent/AU3469999A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Nozzles (AREA)
AU34699/99A 1998-04-03 1999-04-02 Fluid nozzle system, energy emission system for photolithography and its method of manufacture Abandoned AU3469999A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09/054,987 US6065203A (en) 1998-04-03 1998-04-03 Method of manufacturing very small diameter deep passages
US09054831 1998-04-03
US09054987 1998-04-03
US09/054,831 US6105885A (en) 1998-04-03 1998-04-03 Fluid nozzle system and method in an emitted energy system for photolithography
PCT/US1999/007414 WO1999051356A1 (fr) 1998-04-03 1999-04-02 Ajutage de liquide, systeme d'emission d'energie pour photolithographie et son procede de fabrication

Publications (1)

Publication Number Publication Date
AU3469999A true AU3469999A (en) 1999-10-25

Family

ID=26733564

Family Applications (1)

Application Number Title Priority Date Filing Date
AU34699/99A Abandoned AU3469999A (en) 1998-04-03 1999-04-02 Fluid nozzle system, energy emission system for photolithography and its method of manufacture

Country Status (4)

Country Link
EP (1) EP1068020A1 (fr)
JP (1) JP2002510874A (fr)
AU (1) AU3469999A (fr)
WO (1) WO1999051356A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004507873A (ja) * 2000-08-31 2004-03-11 パワーレイズ・リミテッド レーザ発生されたプラズマを使用する電磁放射発生
SE523503C2 (sv) * 2002-07-23 2004-04-27 Jettec Ab Kapillärrör
US7137274B2 (en) 2003-09-24 2006-11-21 The Boc Group Plc System for liquefying or freezing xenon
GB0324883D0 (en) * 2003-10-24 2003-11-26 Boc Group Plc Extreme ultra violet lithography
JP4517147B2 (ja) * 2004-11-26 2010-08-04 国立大学法人 宮崎大学 極端紫外光源装置
JP5789443B2 (ja) * 2011-08-03 2015-10-07 ギガフォトン株式会社 ターゲット供給装置、そのノズルのクリーニング機構、および、そのノズルのクリーニング方法
JP5930553B2 (ja) * 2014-07-25 2016-06-08 株式会社Ihi Ｌｐｐ方式のｅｕｖ光源とその発生方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2804339A (en) * 1955-03-30 1957-08-27 Union Carbide Corp Injection nozzle
US3550864A (en) * 1967-12-11 1970-12-29 Borg Warner High efficiency flashing nozzle
GB2055058B (en) * 1979-06-29 1983-01-12 Gilson J J Nozzle
US5487078A (en) * 1994-03-14 1996-01-23 Board Of Trustees Of The University Of Illinois Apparatus and method for generating prompt x-radiation from gas clusters
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
US6133577A (en) * 1997-02-04 2000-10-17 Advanced Energy Systems, Inc. Method and apparatus for producing extreme ultra-violet light for use in photolithography
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法

Also Published As

Publication number Publication date
EP1068020A1 (fr) 2001-01-17
WO1999051356A1 (fr) 1999-10-14
JP2002510874A (ja) 2002-04-09

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase