AU2004291042B2 - Ophthalmic binocular wafefront measurement system - Google Patents

Ophthalmic binocular wafefront measurement system Download PDF

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Publication number
AU2004291042B2
AU2004291042B2 AU2004291042A AU2004291042A AU2004291042B2 AU 2004291042 B2 AU2004291042 B2 AU 2004291042B2 AU 2004291042 A AU2004291042 A AU 2004291042A AU 2004291042 A AU2004291042 A AU 2004291042A AU 2004291042 B2 AU2004291042 B2 AU 2004291042B2
Authority
AU
Australia
Prior art keywords
eye
wavefront
light
image
patient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU2004291042A
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English (en)
Other versions
AU2004291042A1 (en
Inventor
Andreas W. Dreher
William G. Foote
Shui T. Lai
Gary D. Mills
David G. Sandler
Laurence Warden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EssilorLuxottica SA
Original Assignee
Essilor International Compagnie Generale dOptique SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/971,937 external-priority patent/US20050105044A1/en
Priority claimed from US10/971,769 external-priority patent/US7425067B2/en
Application filed by Essilor International Compagnie Generale dOptique SA filed Critical Essilor International Compagnie Generale dOptique SA
Publication of AU2004291042A1 publication Critical patent/AU2004291042A1/en
Application granted granted Critical
Publication of AU2004291042B2 publication Critical patent/AU2004291042B2/en
Assigned to ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) reassignment ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) Request for Assignment Assignors: OPHTHONIX, INC.
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0228—Testing optical properties by measuring refractive power
    • G01M11/0235—Testing optical properties by measuring refractive power by measuring multiple properties of lenses, automatic lens meters
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
    • A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
    • A61B3/1015—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions for wavefront analysis
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
    • A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
    • A61B3/103—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions for determining refraction, e.g. refractometers, skiascopes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Veterinary Medicine (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Medical Informatics (AREA)
  • Molecular Biology (AREA)
  • Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Biomedical Technology (AREA)
  • Ophthalmology & Optometry (AREA)
  • Biophysics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Geometry (AREA)
  • Eye Examination Apparatus (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
AU2004291042A 2003-11-14 2004-10-29 Ophthalmic binocular wafefront measurement system Ceased AU2004291042B2 (en)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US52029403P 2003-11-14 2003-11-14
US60/520,294 2003-11-14
US58112704P 2004-06-18 2004-06-18
US60/581,127 2004-06-18
US10/971,937 2004-10-22
US10/971,937 US20050105044A1 (en) 2003-11-14 2004-10-22 Lensometers and wavefront sensors and methods of measuring aberration
US10/971,769 US7425067B2 (en) 2003-11-14 2004-10-22 Ophthalmic diagnostic instrument
US10/971,769 2004-10-22
PCT/US2004/036306 WO2005048829A2 (en) 2003-11-14 2004-10-29 Ophthalmic binocular wafefront measurement system

Publications (2)

Publication Number Publication Date
AU2004291042A1 AU2004291042A1 (en) 2005-06-02
AU2004291042B2 true AU2004291042B2 (en) 2010-10-14

Family

ID=34623984

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2004291042A Ceased AU2004291042B2 (en) 2003-11-14 2004-10-29 Ophthalmic binocular wafefront measurement system

Country Status (5)

Country Link
EP (3) EP1690072A2 (enExample)
JP (2) JP4668204B2 (enExample)
KR (1) KR100992182B1 (enExample)
AU (1) AU2004291042B2 (enExample)
WO (2) WO2005048829A2 (enExample)

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US8820929B2 (en) * 2006-01-20 2014-09-02 Clarity Medical Systems, Inc. Real-time measurement/display/record/playback of wavefront data for use in vision correction procedures
US8506083B2 (en) 2011-06-06 2013-08-13 Clarity Medical Systems, Inc. Compact wavefront sensor module and its attachment to or integration with an ophthalmic instrument
FR2897426B1 (fr) * 2006-02-16 2012-07-27 Onera (Off Nat Aerospatiale) Procede d'analyse de surface d'onde par interferometrie multilaterale a difference de frequences
EP1999443B1 (en) 2006-03-14 2017-12-27 AMO Manufacturing USA, LLC Spatial frequency wavefront sensor system and method
JP2008246153A (ja) * 2007-03-30 2008-10-16 Topcon Corp 検眼装置及びその方法
JP5608892B2 (ja) * 2008-07-25 2014-10-22 東海光学株式会社 レンズ評価方法
JP5335922B2 (ja) * 2008-09-29 2013-11-06 サイファイ メドテック エッセ．エッレ．エッレ． カスタマイズされたバイオメトリック眼内レンズを設計および移植するためのシステムおよび方法
KR100900899B1 (ko) * 2009-03-17 2009-06-03 국방과학연구소 소화기 사격통제용 복합광학계
JP5265425B2 (ja) * 2009-03-19 2013-08-14 オリンパス株式会社 干渉計による２次元位相デ−タのアンラップ方法および装置
JP5237869B2 (ja) * 2009-04-08 2013-07-17 株式会社トプコン 模型眼
JP2010252994A (ja) * 2009-04-24 2010-11-11 Topcon Corp 眼科装置
JP2010286434A (ja) * 2009-06-15 2010-12-24 Brother Ind Ltd 動的面形状測定装置および動的面形状測定方法
JP5394902B2 (ja) * 2009-11-27 2014-01-22 株式会社トプコン 眼科装置
CN101947157B (zh) * 2009-12-18 2012-02-15 中国科学院光电技术研究所 人眼自适应光学视知觉学习训练仪
CN101947158B (zh) * 2009-12-18 2012-07-04 中国科学院光电技术研究所 双眼自适应光学视知觉学习训练仪
JP5641744B2 (ja) * 2010-02-10 2014-12-17 キヤノン株式会社 撮像装置及びその制御方法
KR101325988B1 (ko) 2010-10-29 2013-11-07 엘지디스플레이 주식회사 입체 디스플레이의 광학 측정 장치 및 방법
GB2484998B (en) * 2010-10-29 2014-08-20 Lg Display Co Ltd Optical measuring apparatus and measuring method of stereoscopic display device
EP2596745B1 (en) * 2011-10-07 2019-06-19 Popovic, Zoran Reference calibration for an adaptive optics system
EP2809220A4 (en) * 2012-02-03 2015-04-08 Digitalvision Llc REFRACTOMETER WITH A COMPARATIVE SEH CORRECTION SIMULATOR
FR2992843B1 (fr) * 2012-07-06 2016-05-06 Essilor Int Dispositif et procede de mesure de refraction oculaire objective et d'au moins un parametre geometrico-morphologique d'un individu
JP6000773B2 (ja) * 2012-09-13 2016-10-05 キヤノン株式会社 収差推定方法、プログラムおよび撮像装置
WO2014083392A1 (en) * 2012-11-28 2014-06-05 Perfect Vision Technology, Ltd. Methods and systems for automated measurement of the eyes and delivering of sunglasses and eyeglasses
CN105578947B (zh) * 2013-07-02 2018-10-26 麻省理工学院 确定眼处方的装置和方法
EP3242585A1 (en) * 2015-01-09 2017-11-15 Smart Vision Labs, Inc. Portable wavefront aberrometer with open field alignment channel
WO2016184571A2 (de) * 2015-05-20 2016-11-24 Carl Zeiss Smt Gmbh Messverfahren und messanordnung für ein abbildendes optisches system
JP6821361B2 (ja) * 2016-09-05 2021-01-27 キヤノン株式会社 計測装置、光学機器の製造方法および光学機器の製造装置
US10595724B2 (en) * 2017-08-04 2020-03-24 Ho Wa LAI Adaptor for an image capture device for fundus photography
FR3082274B1 (fr) 2018-06-06 2021-11-19 Gaztransport Et Technigaz Cuve etanche et thermiquement isolante
KR102082747B1 (ko) * 2019-01-23 2020-02-28 연세대학교 산학협력단 초점거리 조절이 가능한 ｌｅｄ 어레이 기반 3차원 이미징 장치 및 방법
EP3914144A4 (en) * 2019-01-24 2022-11-02 6 Over 6 Vision Ltd APPARATUS, SYSTEM AND METHOD FOR DETERMINING ONE OR MORE PARAMETERS OF A REFRACTION ERROR OF AN EYE TESTED
KR102771619B1 (ko) 2019-03-11 2025-02-25 삼성전자주식회사 영상의 횡이동이 가능한 디스플레이 장치
JP6581325B1 (ja) * 2019-06-12 2019-09-25 株式会社アサヒビジョン レンズ光学特性測定装置、レンズ光学特性測定方法、プログラム、及び、記録媒体。
CN110274696B (zh) * 2019-06-26 2020-11-06 中国科学院长春光学精密机械与物理研究所 大视场主动光学望远镜的波前传感方法、装置、及系统
AU2020358938B2 (en) 2019-09-30 2026-01-22 Alcon Inc. Improved ocular aberrometry recovery systems and methods
KR20230146387A (ko) * 2022-04-12 2023-10-19 주식회사 휴비츠 안경 렌즈의 근적외선 투과율을 측정할 수 있는 렌즈미터
CN117357056A (zh) * 2023-11-03 2024-01-09 瑞尔明康(浙江)医疗科技有限公司 人眼测量装置及人眼测量方法

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US20030071969A1 (en) * 2001-08-31 2003-04-17 Levine Bruce M. Ophthalmic instrument with adaptive optic subsystem that measures aberrations (including higher order aberrations) of a human eye and that provides a view of compensation of such aberrations to the human eye

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US5963300A (en) * 1998-02-17 1999-10-05 Amt Technologies, Corp. Ocular biometer
US20030071969A1 (en) * 2001-08-31 2003-04-17 Levine Bruce M. Ophthalmic instrument with adaptive optic subsystem that measures aberrations (including higher order aberrations) of a human eye and that provides a view of compensation of such aberrations to the human eye

Also Published As

Publication number Publication date
WO2005048829A2 (en) 2005-06-02
JP4668204B2 (ja) 2011-04-13
EP1691669A2 (en) 2006-08-23
WO2005052538A2 (en) 2005-06-09
WO2005048829A3 (en) 2005-08-18
JP2007511278A (ja) 2007-05-10
EP1691669B1 (en) 2018-03-28
EP1690072A2 (en) 2006-08-16
WO2005052538A3 (en) 2005-12-01
KR20070004550A (ko) 2007-01-09
AU2004291042A1 (en) 2005-06-02
JP4832310B2 (ja) 2011-12-07
EP3001945A3 (en) 2016-10-26
KR100992182B1 (ko) 2010-11-05
EP3001945B1 (en) 2021-01-27
EP3001945A2 (en) 2016-04-06
JP2007527526A (ja) 2007-09-27

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Legal Events

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FGA Letters patent sealed or granted (standard patent)
MK14 Patent ceased section 143(a) (annual fees not paid) or expired
NA Applications received for extensions of time, section 223

Free format text: AN APPLICATION TO EXTEND THE TIME FROM 29 OCT 2012 TO 29 SEP 2013 IN WHICH TO PAY A RENEWAL FEE HAS BEEN FILED .

NB Applications allowed - extensions of time section 223(2)

Free format text: THE TIME IN WHICH TO PAY A RENEWAL FEE HAS BEEN EXTENDED TO 29 SEP 2013 .

PC Assignment registered

Owner name: ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQU

Free format text: FORMER OWNER WAS: OPHTHONIX, INC.

MK14 Patent ceased section 143(a) (annual fees not paid) or expired