AU2003304526B2 - Radiation curable microstructure-bearing articles - Google Patents

Radiation curable microstructure-bearing articles Download PDF

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Publication number
AU2003304526B2
AU2003304526B2 AU2003304526A AU2003304526A AU2003304526B2 AU 2003304526 B2 AU2003304526 B2 AU 2003304526B2 AU 2003304526 A AU2003304526 A AU 2003304526A AU 2003304526 A AU2003304526 A AU 2003304526A AU 2003304526 B2 AU2003304526 B2 AU 2003304526B2
Authority
AU
Australia
Prior art keywords
meth
acrylate
article
article according
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
AU2003304526A
Other languages
English (en)
Other versions
AU2003304526A1 (en
Inventor
Bret Ja Chisholm
Dennis Joseph Coyle
Grant Hay
Chris Anthony Molaison
Daniel Robert Olson
James Alan Resue
Tiberiu Mircea Siclovan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SABIC Global Technologies BV
Original Assignee
SABIC Innovative Plastics IP BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SABIC Innovative Plastics IP BV filed Critical SABIC Innovative Plastics IP BV
Publication of AU2003304526A1 publication Critical patent/AU2003304526A1/en
Assigned to SABIC INNOVATIVE PLASTICS IP B.V. reassignment SABIC INNOVATIVE PLASTICS IP B.V. Request for Assignment Assignors: GENERAL ELECTRIC COMPANY
Application granted granted Critical
Publication of AU2003304526B2 publication Critical patent/AU2003304526B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041—Lenses
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
AU2003304526A 2003-01-06 2003-12-17 Radiation curable microstructure-bearing articles Expired - Fee Related AU2003304526B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/336,493 2003-01-06
US10/336,493 US6833176B2 (en) 2003-01-06 2003-01-06 Radiation curable microstructure-bearing articles
PCT/US2003/040457 WO2005043201A2 (en) 2003-01-06 2003-12-17 Radiation curable microstructure-bearing articles

Publications (2)

Publication Number Publication Date
AU2003304526A1 AU2003304526A1 (en) 2005-05-19
AU2003304526B2 true AU2003304526B2 (en) 2008-10-09

Family

ID=32681025

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003304526A Expired - Fee Related AU2003304526B2 (en) 2003-01-06 2003-12-17 Radiation curable microstructure-bearing articles

Country Status (13)

Country Link
US (1) US6833176B2 (enExample)
EP (1) EP1583987B1 (enExample)
JP (1) JP2006513309A (enExample)
KR (1) KR20050114605A (enExample)
CN (1) CN1756968A (enExample)
AT (1) ATE363665T1 (enExample)
AU (1) AU2003304526B2 (enExample)
BR (1) BR0317354A (enExample)
CA (1) CA2512538A1 (enExample)
DE (1) DE60314187T2 (enExample)
ES (1) ES2287587T3 (enExample)
TW (1) TW200422179A (enExample)
WO (1) WO2005043201A2 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060056031A1 (en) * 2004-09-10 2006-03-16 Capaldo Kevin P Brightness enhancement film, and methods of making and using the same
US7361409B2 (en) * 2003-08-22 2008-04-22 3M Innovative Properties Company Microstructured article comprising a polymerized composition having low glass transition temperature
US7282272B2 (en) 2003-09-12 2007-10-16 3M Innovative Properties Company Polymerizable compositions comprising nanoparticles
US7074463B2 (en) * 2003-09-12 2006-07-11 3M Innovative Properties Company Durable optical element
US7341784B2 (en) * 2004-09-10 2008-03-11 General Electric Company Light management film and its preparation and use
US7241437B2 (en) * 2004-12-30 2007-07-10 3M Innovative Properties Company Zirconia particles
JP2008530346A (ja) * 2005-02-17 2008-08-07 スリーエム イノベイティブ プロパティズ カンパニー 低ガラス転移温度を有する重合有機相を含む輝度向上フィルム
US20060204676A1 (en) 2005-03-11 2006-09-14 Jones Clinton L Polymerizable composition comprising low molecular weight organic component
JP2008533525A (ja) * 2005-03-11 2008-08-21 スリーエム イノベイティブ プロパティズ カンパニー ジルコニア粒子を有する調光フィルム
CN1320009C (zh) * 2005-03-24 2007-06-06 上海交通大学 包含酯基部分带羟基基团的丙烯酸酯的组合物
WO2006099818A1 (fr) * 2005-03-24 2006-09-28 Shanghai Jiao Tong University Composition de monomères durcissable à la lumière et utilisation de celle-ci
CN1320006C (zh) * 2005-03-24 2007-06-06 上海交通大学 包含酯基部分带酯基基团的丙烯酸酯的组合物
CN1320008C (zh) * 2005-03-24 2007-06-06 上海交通大学 包含酯基部分带羧基基团的丙烯酸酯的组合物
CN1326894C (zh) * 2005-03-24 2007-07-18 上海交通大学 包含酯基部分带烷氧基的丙烯酸酯的组合物
CN1320005C (zh) * 2005-03-24 2007-06-06 上海交通大学 包含酯基部分带烷烃基的丙烯酸酯的组合物
CN1320012C (zh) * 2005-03-24 2007-06-06 上海交通大学 包含丙烯酰胺的组合物
DE112007000148T5 (de) 2006-01-12 2008-11-20 3M Innovative Properties Co., St. Paul Licht kollimierender Film
TW200900723A (en) * 2007-02-27 2009-01-01 3M Innovative Properties Co Brightness enhancing film comprising nanocomposite structure having improved crack resistance
EP2237089A1 (en) * 2007-12-17 2010-10-06 Hitachi Chemical Company, Ltd. Optical waveguide and method for manufacturing the same
JP5463005B2 (ja) * 2008-02-18 2014-04-09 積水化成品工業株式会社 架橋樹脂粒子及びそれを用いた光学シート
CN102702987B (zh) * 2012-03-21 2015-02-18 北京京东方光电科技有限公司 封框胶组合物、防止液晶污染方法、液晶面板及显示装置
JPWO2017047585A1 (ja) * 2015-09-15 2018-08-09 株式会社リコー ポリマー、樹脂組成物、調光材料、光導波路材料、アサーマル光学素子、カラー表示素子及び光学材料

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5626800A (en) * 1995-02-03 1997-05-06 Minnesota Mining And Manufacturing Company Prevention of groove tip deformation in brightness enhancement film
US5635278A (en) * 1995-02-03 1997-06-03 Minnesota Mining And Manufacturing Company Scratch resistant optical films and method for producing same
US5650215A (en) * 1993-10-29 1997-07-22 Minnesota Mining And Manufacturing Company Pressure-sensitive adhesives having microstructured surfaces
EP1258742A1 (en) * 1999-11-29 2002-11-20 Omron Corporation Light-resistant microlens array and resin composition for use therein

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4576850A (en) * 1978-07-20 1986-03-18 Minnesota Mining And Manufacturing Company Shaped plastic articles having replicated microstructure surfaces
US5183597A (en) * 1989-02-10 1993-02-02 Minnesota Mining And Manufacturing Company Method of molding microstructure bearing composite plastic articles
US5175030A (en) * 1989-02-10 1992-12-29 Minnesota Mining And Manufacturing Company Microstructure-bearing composite plastic articles and method of making
US5932626A (en) 1997-05-09 1999-08-03 Minnesota Mining And Manufacturing Company Optical product prepared from high index of refraction brominated monomers

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5650215A (en) * 1993-10-29 1997-07-22 Minnesota Mining And Manufacturing Company Pressure-sensitive adhesives having microstructured surfaces
US5626800A (en) * 1995-02-03 1997-05-06 Minnesota Mining And Manufacturing Company Prevention of groove tip deformation in brightness enhancement film
US5635278A (en) * 1995-02-03 1997-06-03 Minnesota Mining And Manufacturing Company Scratch resistant optical films and method for producing same
EP1258742A1 (en) * 1999-11-29 2002-11-20 Omron Corporation Light-resistant microlens array and resin composition for use therein

Also Published As

Publication number Publication date
AU2003304526A1 (en) 2005-05-19
US20040131826A1 (en) 2004-07-08
EP1583987B1 (en) 2007-05-30
ES2287587T3 (es) 2007-12-16
WO2005043201A2 (en) 2005-05-12
BR0317354A (pt) 2005-11-08
KR20050114605A (ko) 2005-12-06
CN1756968A (zh) 2006-04-05
CA2512538A1 (en) 2005-05-12
WO2005043201A3 (en) 2005-07-28
DE60314187D1 (de) 2007-07-12
EP1583987A2 (en) 2005-10-12
JP2006513309A (ja) 2006-04-20
ATE363665T1 (de) 2007-06-15
TW200422179A (en) 2004-11-01
US6833176B2 (en) 2004-12-21
DE60314187T2 (de) 2008-01-31

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Legal Events

Date Code Title Description
PC1 Assignment before grant (sect. 113)

Owner name: SABIC INNOVATIVE PLASTICS IP B.V.

Free format text: FORMER APPLICANT(S): GENERAL ELECTRIC COMPANY

MK4 Application lapsed section 142(2)(d) - no continuation fee paid for the application