AU2003277497A1 - Exposure device, exposure system, recipe generation system, and device manufacturing method - Google Patents

Exposure device, exposure system, recipe generation system, and device manufacturing method

Info

Publication number
AU2003277497A1
AU2003277497A1 AU2003277497A AU2003277497A AU2003277497A1 AU 2003277497 A1 AU2003277497 A1 AU 2003277497A1 AU 2003277497 A AU2003277497 A AU 2003277497A AU 2003277497 A AU2003277497 A AU 2003277497A AU 2003277497 A1 AU2003277497 A1 AU 2003277497A1
Authority
AU
Australia
Prior art keywords
exposure
recipe generation
generation system
device manufacturing
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003277497A
Other versions
AU2003277497A8 (en
Inventor
Akira Hiraoka
Mitsuhiro Nakai
Hiroyuki Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nikon Systems Inc
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003277497A8 publication Critical patent/AU2003277497A8/en
Publication of AU2003277497A1 publication Critical patent/AU2003277497A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70533—Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2003277497A 2002-10-09 2003-10-08 Exposure device, exposure system, recipe generation system, and device manufacturing method Abandoned AU2003277497A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002/296276 2002-10-09
JP2002296276 2002-10-09
PCT/JP2003/012913 WO2004034448A1 (en) 2002-10-09 2003-10-08 Exposure device, exposure system, recipe generation system, and device manufacturing method

Publications (2)

Publication Number Publication Date
AU2003277497A8 AU2003277497A8 (en) 2004-05-04
AU2003277497A1 true AU2003277497A1 (en) 2004-05-04

Family

ID=32089233

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003277497A Abandoned AU2003277497A1 (en) 2002-10-09 2003-10-08 Exposure device, exposure system, recipe generation system, and device manufacturing method

Country Status (2)

Country Link
AU (1) AU2003277497A1 (en)
WO (1) WO2004034448A1 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4323588B2 (en) * 1998-07-21 2009-09-02 キヤノン株式会社 Editing method, device manufacturing method, and computer
JP2000124125A (en) * 1998-10-21 2000-04-28 Canon Inc Semiconductor aligner
JP2001203142A (en) * 2000-01-20 2001-07-27 Canon Inc Aligner
JP2002132986A (en) * 2000-10-18 2002-05-10 Canon Inc Information-providing method and information-providing system
JP2002141276A (en) * 2000-11-06 2002-05-17 Canon Inc Aligner and its method, method for manufacturing thereof, manufacturing plant of semiconductor and maintaining method for the exposure device
JP4666747B2 (en) * 2000-11-06 2011-04-06 キヤノン株式会社 Exposure apparatus and device manufacturing method
JP2002190443A (en) * 2000-12-20 2002-07-05 Hitachi Ltd Exposure method and its aligner

Also Published As

Publication number Publication date
AU2003277497A8 (en) 2004-05-04
WO2004034448A1 (en) 2004-04-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase