AU2003236345A1 - Exposure apparatus and exposure method, device fabricating method, and measurement method and measurement instrument - Google Patents

Exposure apparatus and exposure method, device fabricating method, and measurement method and measurement instrument

Info

Publication number
AU2003236345A1
AU2003236345A1 AU2003236345A AU2003236345A AU2003236345A1 AU 2003236345 A1 AU2003236345 A1 AU 2003236345A1 AU 2003236345 A AU2003236345 A AU 2003236345A AU 2003236345 A AU2003236345 A AU 2003236345A AU 2003236345 A1 AU2003236345 A1 AU 2003236345A1
Authority
AU
Australia
Prior art keywords
measurement
exposure
device fabricating
exposure apparatus
measurement instrument
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003236345A
Inventor
Kiyoshi Motegi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2003001648A external-priority patent/JP2003282430A/en
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003236345A1 publication Critical patent/AU2003236345A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003236345A 2003-01-08 2003-04-02 Exposure apparatus and exposure method, device fabricating method, and measurement method and measurement instrument Abandoned AU2003236345A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003001648A JP2003282430A (en) 2002-01-21 2003-01-08 Aligner and exposure method, device manufacturing method, and measurement method and apparatus
JP2003-001648 2003-01-08
PCT/JP2003/004234 WO2004064127A1 (en) 2003-01-08 2003-04-02 Exposure apparatus and exposure method, device fabricating method, and measurement method and measurement instrument

Publications (1)

Publication Number Publication Date
AU2003236345A1 true AU2003236345A1 (en) 2004-08-10

Family

ID=32708825

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003236345A Abandoned AU2003236345A1 (en) 2003-01-08 2003-04-02 Exposure apparatus and exposure method, device fabricating method, and measurement method and measurement instrument

Country Status (3)

Country Link
AU (1) AU2003236345A1 (en)
TW (1) TW200412616A (en)
WO (1) WO2004064127A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9841684B2 (en) 2012-08-23 2017-12-12 Gigaphoton Inc. Light source apparatus and data processing method

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6899314B2 (en) 2017-11-17 2021-07-07 浜松ホトニクス株式会社 Adsorption method
US11387073B2 (en) * 2020-03-24 2022-07-12 Applied Materials, Inc. In situ angle measurement using channeling
TWI796907B (en) * 2021-12-28 2023-03-21 宏碁股份有限公司 Light curing apparatus and method for manufacturing display device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01106426A (en) * 1987-10-19 1989-04-24 Canon Inc Aligner
JPH02207522A (en) * 1989-02-07 1990-08-17 Canon Inc Aligner
JPH09199403A (en) * 1996-01-14 1997-07-31 Nikon Corp Peojection aligner
JPH1038757A (en) * 1996-07-25 1998-02-13 Nikon Corp Method and equipment for measuring wave aberration of lens for excimer laser light
JPH10256146A (en) * 1997-03-13 1998-09-25 Canon Inc Aligner and manufacture of device
JPH11243050A (en) * 1998-02-24 1999-09-07 Canon Inc Aligner
US6408260B1 (en) * 2000-02-16 2002-06-18 Cymer, Inc. Laser lithography quality alarm system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9841684B2 (en) 2012-08-23 2017-12-12 Gigaphoton Inc. Light source apparatus and data processing method

Also Published As

Publication number Publication date
WO2004064127A1 (en) 2004-07-29
TW200412616A (en) 2004-07-16

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase