AU2003232226A1 - Projection lens comprising an extremely high aperture - Google Patents

Projection lens comprising an extremely high aperture

Info

Publication number
AU2003232226A1
AU2003232226A1 AU2003232226A AU2003232226A AU2003232226A1 AU 2003232226 A1 AU2003232226 A1 AU 2003232226A1 AU 2003232226 A AU2003232226 A AU 2003232226A AU 2003232226 A AU2003232226 A AU 2003232226A AU 2003232226 A1 AU2003232226 A1 AU 2003232226A1
Authority
AU
Australia
Prior art keywords
projection lens
extremely high
high aperture
aperture
extremely
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003232226A
Other languages
English (en)
Inventor
Karl-Heinz Schuster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/EP2002/004846 external-priority patent/WO2003077036A1/de
Priority claimed from DE10224361A external-priority patent/DE10224361A1/de
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2003232226A1 publication Critical patent/AU2003232226A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
AU2003232226A 2002-05-03 2003-04-30 Projection lens comprising an extremely high aperture Abandoned AU2003232226A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
AU2002312872 2002-05-03
PCT/EP2002/004846 WO2003077036A1 (de) 2002-03-08 2002-05-03 Projektionsobjektiv höchster apertur
DE10224361.1 2002-05-24
DE10224361A DE10224361A1 (de) 2002-05-03 2002-05-24 Projektionsobjektiv höchster Apertur
PCT/EP2003/004477 WO2003093904A1 (de) 2002-05-03 2003-04-30 Projektionsobjektiv höchster apertur

Publications (1)

Publication Number Publication Date
AU2003232226A1 true AU2003232226A1 (en) 2003-11-17

Family

ID=29403604

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003232226A Abandoned AU2003232226A1 (en) 2002-05-03 2003-04-30 Projection lens comprising an extremely high aperture

Country Status (4)

Country Link
JP (1) JP2005524866A (zh)
CN (1) CN1295566C (zh)
AU (1) AU2003232226A1 (zh)
WO (1) WO2003093904A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7187503B2 (en) 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
DE10229249A1 (de) 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refraktives Projektionsobjektiv mit einer Taille
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
JP4907596B2 (ja) * 2003-12-15 2012-03-28 カール・ツァイス・エスエムティー・ゲーエムベーハー 屈折性投影対物レンズ
JP2005189850A (ja) * 2003-12-15 2005-07-14 Carl Zeiss Smt Ag 液浸リソグラフィー用屈折性投影対物レンズ
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
JP2008527403A (ja) * 2004-12-30 2008-07-24 カール・ツァイス・エスエムティー・アーゲー 投影光学系
CN101950065B (zh) * 2010-09-10 2011-12-14 北京理工大学 深紫外全球面光刻物镜
CN111505912B (zh) * 2020-05-15 2021-03-23 安徽国芯智能装备有限公司 一种紫外宽光谱光刻镜头
CN111856736B (zh) * 2020-07-10 2022-06-03 宁波永新光学股份有限公司 一种显微镜的物镜

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2288462Y (zh) * 1996-04-10 1998-08-19 中国科学院光电技术研究所 一种紫外(i线)投影光刻光学透镜系统
US6097537A (en) * 1998-04-07 2000-08-01 Nikon Corporation Catadioptric optical system
TW448307B (en) * 1999-12-21 2001-08-01 Zeiss Stiftung Optical projection system
JP2001343582A (ja) * 2000-05-30 2001-12-14 Nikon Corp 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法

Also Published As

Publication number Publication date
CN1295566C (zh) 2007-01-17
JP2005524866A (ja) 2005-08-18
CN1666152A (zh) 2005-09-07
WO2003093904A1 (de) 2003-11-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase