AU2002332649A1 - Method for fabricating chirped fiber bragg gratings - Google Patents
Method for fabricating chirped fiber bragg gratings Download PDFInfo
- Publication number
- AU2002332649A1 AU2002332649A1 AU2002332649A AU2002332649A AU2002332649A1 AU 2002332649 A1 AU2002332649 A1 AU 2002332649A1 AU 2002332649 A AU2002332649 A AU 2002332649A AU 2002332649 A AU2002332649 A AU 2002332649A AU 2002332649 A1 AU2002332649 A1 AU 2002332649A1
- Authority
- AU
- Australia
- Prior art keywords
- grating
- segments
- segment
- substrate
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims description 43
- 239000000835 fiber Substances 0.000 title claims description 33
- 238000012937 correction Methods 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 33
- 238000001459 lithography Methods 0.000 claims description 21
- 229920002120 photoresistant polymer Polymers 0.000 claims description 17
- 238000012935 Averaging Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims 2
- 230000000750 progressive effect Effects 0.000 claims 1
- 239000013307 optical fiber Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000010894 electron beam technology Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 230000000737 periodic effect Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/0208—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response
- G02B6/02085—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response characterised by the grating profile, e.g. chirped, apodised, tilted, helical
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
- G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
- G02B6/02138—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Optical Integrated Circuits (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/940,947 US6567588B2 (en) | 2001-08-28 | 2001-08-28 | Method for fabricating chirped fiber bragg gratings |
| US09/940,947 | 2001-08-28 | ||
| PCT/US2002/026951 WO2003046628A1 (en) | 2001-08-28 | 2002-08-22 | Method for fabricating chirped fiber bragg gratings |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2002332649A1 true AU2002332649A1 (en) | 2003-06-10 |
Family
ID=25475697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2002332649A Abandoned AU2002332649A1 (en) | 2001-08-28 | 2002-08-22 | Method for fabricating chirped fiber bragg gratings |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6567588B2 (enExample) |
| EP (1) | EP1430343A4 (enExample) |
| JP (1) | JP2005510755A (enExample) |
| AU (1) | AU2002332649A1 (enExample) |
| CA (1) | CA2458886C (enExample) |
| WO (1) | WO2003046628A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001242313A (ja) * | 2000-02-28 | 2001-09-07 | Dainippon Printing Co Ltd | 光ファイバー加工用位相マスクの製造方法及びその光ファイバー加工用位相マスクを使用して作製されたブラッグ回折格子付き光ファイバー |
| JP3829325B2 (ja) * | 2002-02-07 | 2006-10-04 | 日本電気株式会社 | 半導体素子およびその製造方法並びに半導体装置の製造方法 |
| US20050042523A1 (en) * | 2003-08-20 | 2005-02-24 | Banqiu Wu | Endpoint detection of plasma-assisted etch process |
| US7909396B2 (en) * | 2004-01-08 | 2011-03-22 | Audiovox Corporation | Automobile entertainment system |
| US7435533B2 (en) * | 2004-06-14 | 2008-10-14 | Photronics, Inc. | Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases |
| US7396617B2 (en) * | 2004-06-14 | 2008-07-08 | Photronics, Inc. | Photomask reticle having multiple versions of the same mask pattern with different biases |
| WO2006014376A1 (en) * | 2004-07-02 | 2006-02-09 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory | Deformable mirror apparatus |
| US9005848B2 (en) * | 2008-06-17 | 2015-04-14 | Photronics, Inc. | Photomask having a reduced field size and method of using the same |
| US9005849B2 (en) * | 2009-06-17 | 2015-04-14 | Photronics, Inc. | Photomask having a reduced field size and method of using the same |
| US9435944B2 (en) * | 2011-10-11 | 2016-09-06 | Baker Hughes Incorporated | Phase mask period control |
| RU2707663C1 (ru) * | 2019-01-18 | 2019-11-28 | Федеральное государственное бюджетное учреждение науки Институт Ядерной Физики им. Г.И. Будкера Сибирского отделения (ИЯФ СО РАН) | Способ изготовления брэгговской структуры с гофрировкой поверхности |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5499134A (en) | 1994-08-24 | 1996-03-12 | Imra America | Optical pulse amplification using chirped Bragg gratings |
| US5718738A (en) | 1996-11-04 | 1998-02-17 | Lucent Technologies Inc. | Method for making continuously chirped fiber bragg gratings |
| JP3526215B2 (ja) * | 1997-07-03 | 2004-05-10 | 大日本印刷株式会社 | 光ファイバー加工用位相マスク及びその製造方法 |
| EP0974853B1 (en) | 1998-01-20 | 2006-09-13 | Hiroyuki Hoshino | Method for producing chirped in-fibre bragg grating |
| JP2001242313A (ja) | 2000-02-28 | 2001-09-07 | Dainippon Printing Co Ltd | 光ファイバー加工用位相マスクの製造方法及びその光ファイバー加工用位相マスクを使用して作製されたブラッグ回折格子付き光ファイバー |
| US6833954B2 (en) * | 2000-09-20 | 2004-12-21 | Teraxion Inc. | Lithographic method for manufacturing a mask used in the fabrication of a fiber Bragg grating |
| US6778733B2 (en) * | 2001-01-05 | 2004-08-17 | Teraxion Inc. | Lithographic fabrication of phase mask for fiber Bragg gratings |
-
2001
- 2001-08-28 US US09/940,947 patent/US6567588B2/en not_active Expired - Lifetime
-
2002
- 2002-08-22 EP EP02803958A patent/EP1430343A4/en not_active Withdrawn
- 2002-08-22 CA CA2458886A patent/CA2458886C/en not_active Expired - Lifetime
- 2002-08-22 AU AU2002332649A patent/AU2002332649A1/en not_active Abandoned
- 2002-08-22 JP JP2003548011A patent/JP2005510755A/ja active Pending
- 2002-08-22 WO PCT/US2002/026951 patent/WO2003046628A1/en not_active Ceased
-
2003
- 2003-02-19 US US10/369,262 patent/US6868209B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US6567588B2 (en) | 2003-05-20 |
| WO2003046628A8 (en) | 2004-04-29 |
| CA2458886C (en) | 2010-02-16 |
| US20030128929A1 (en) | 2003-07-10 |
| US6868209B2 (en) | 2005-03-15 |
| WO2003046628A1 (en) | 2003-06-05 |
| CA2458886A1 (en) | 2003-06-05 |
| JP2005510755A (ja) | 2005-04-21 |
| EP1430343A1 (en) | 2004-06-23 |
| EP1430343A4 (en) | 2007-04-18 |
| US20030048988A1 (en) | 2003-03-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK1 | Application lapsed section 142(2)(a) - no request for examination in relevant period |