AU2002312757A1 - Device and method for coating and/or treating the surfaces of substrates using low-pressure plasma - Google Patents

Device and method for coating and/or treating the surfaces of substrates using low-pressure plasma

Info

Publication number
AU2002312757A1
AU2002312757A1 AU2002312757A AU2002312757A AU2002312757A1 AU 2002312757 A1 AU2002312757 A1 AU 2002312757A1 AU 2002312757 A AU2002312757 A AU 2002312757A AU 2002312757 A AU2002312757 A AU 2002312757A AU 2002312757 A1 AU2002312757 A1 AU 2002312757A1
Authority
AU
Australia
Prior art keywords
substrates
treating
coating
low
pressure plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002312757A
Inventor
Thomas Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Publication of AU2002312757A1 publication Critical patent/AU2002312757A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32587—Triode systems

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
AU2002312757A 2001-05-15 2002-03-05 Device and method for coating and/or treating the surfaces of substrates using low-pressure plasma Abandoned AU2002312757A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2001123583 DE10123583B4 (en) 2001-05-15 2001-05-15 Apparatus and method for coating and / or surface treatment of substrates by means of low pressure plasma and use of the device
DE10123583.6 2001-05-15
PCT/EP2002/002397 WO2002092871A2 (en) 2001-05-15 2002-03-05 Device and method for coating and/or treating the surfaces of substrates using low-pressure plasma

Publications (1)

Publication Number Publication Date
AU2002312757A1 true AU2002312757A1 (en) 2002-11-25

Family

ID=7684851

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002312757A Abandoned AU2002312757A1 (en) 2001-05-15 2002-03-05 Device and method for coating and/or treating the surfaces of substrates using low-pressure plasma

Country Status (4)

Country Link
EP (1) EP1388161A2 (en)
AU (1) AU2002312757A1 (en)
DE (1) DE10123583B4 (en)
WO (1) WO2002092871A2 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01147068A (en) * 1987-12-01 1989-06-08 Idemitsu Petrochem Co Ltd Method and apparatus for manufacturing hard carbon film
JPH02150025A (en) * 1988-08-05 1990-06-08 Univ Toronto Innov Found Plasma etching by d.c. glow or plasma discharge, base-material washing or method and device for evaporating material onto base body
JPH02308829A (en) * 1989-05-23 1990-12-21 Tokyo Gas Co Ltd Method for treating surface of rubber material and apparatus therefor
US5409587A (en) * 1993-09-16 1995-04-25 Micron Technology, Inc. Sputtering with collinator cleaning within the sputtering chamber
DE19625977A1 (en) * 1996-06-28 1998-01-02 Joerg Dipl Chem Arndt CVD of poorly conductive or non-conductive thin film, used to produce e.g. ceramic
KR100206938B1 (en) * 1996-09-19 1999-07-01 구본준 Metan wiring structure of semiconductor device and manufacturing method thereof
DE19834733C1 (en) * 1998-07-31 2000-04-27 Fraunhofer Ges Forschung Device and method for coating and / or surface modification of objects in a vacuum by means of a plasma

Also Published As

Publication number Publication date
DE10123583A1 (en) 2002-11-28
WO2002092871A2 (en) 2002-11-21
DE10123583B4 (en) 2006-10-05
EP1388161A2 (en) 2004-02-11
WO2002092871A3 (en) 2003-02-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase