AU2002229742A1 - High-resolution photoresist structuring of multi-layer structures deposited onto substrates - Google Patents

High-resolution photoresist structuring of multi-layer structures deposited onto substrates

Info

Publication number
AU2002229742A1
AU2002229742A1 AU2002229742A AU2002229742A AU2002229742A1 AU 2002229742 A1 AU2002229742 A1 AU 2002229742A1 AU 2002229742 A AU2002229742 A AU 2002229742A AU 2002229742 A AU2002229742 A AU 2002229742A AU 2002229742 A1 AU2002229742 A1 AU 2002229742A1
Authority
AU
Australia
Prior art keywords
deposited onto
layer structures
onto substrates
structures deposited
resolution photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002229742A
Inventor
Thomas Daeubler
Andreas Dietzel
Frank Voges
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of AU2002229742A1 publication Critical patent/AU2002229742A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AU2002229742A 2001-02-21 2002-02-05 High-resolution photoresist structuring of multi-layer structures deposited onto substrates Abandoned AU2002229742A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP01104098.7 2001-02-21
EP01104098 2001-02-21
PCT/EP2002/001140 WO2002067054A2 (en) 2001-02-21 2002-02-05 High-resolution photoresist structuring of multi-layer structures deposited onto substrates

Publications (1)

Publication Number Publication Date
AU2002229742A1 true AU2002229742A1 (en) 2002-09-04

Family

ID=8176547

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002229742A Abandoned AU2002229742A1 (en) 2001-02-21 2002-02-05 High-resolution photoresist structuring of multi-layer structures deposited onto substrates

Country Status (5)

Country Link
EP (1) EP1433027A2 (en)
JP (1) JP2004530255A (en)
KR (1) KR100582830B1 (en)
AU (1) AU2002229742A1 (en)
WO (1) WO2002067054A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009072658A1 (en) * 2007-12-04 2009-06-11 Canon Kabushiki Kaisha Method of manufacturing flat panel display
KR100980115B1 (en) * 2008-01-07 2010-09-07 서울대학교산학협력단 method for coating light emitting diode
WO2011132805A1 (en) * 2010-04-23 2011-10-27 우리엘에스티 주식회사 Method for coating an led
KR102037357B1 (en) * 2018-06-21 2019-11-26 (주)라이타이저 Fabrication method of color conversion diode
US11094530B2 (en) 2019-05-14 2021-08-17 Applied Materials, Inc. In-situ curing of color conversion layer

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1399696A (en) * 1972-06-19 1975-07-02 Burroughs Corp Display panel printing apparatus
US4666236A (en) * 1982-08-10 1987-05-19 Omron Tateisi Electronics Co. Optical coupling device and method of producing same
JPS60188927A (en) * 1984-03-08 1985-09-26 Toshiba Corp Manufacture of color matrix type liquid crystal display device
JPS62160421A (en) * 1986-01-08 1987-07-16 Shinto Paint Co Ltd Method for forming functional coated film between fine conductive circuits
JPH0273306A (en) * 1988-09-09 1990-03-13 Toppan Printing Co Ltd Color filter and production thereof
WO1991010170A1 (en) * 1989-12-22 1991-07-11 Manufacturing Sciences, Inc. Programmable masking apparatus
JPH08179121A (en) * 1994-12-20 1996-07-12 Shinto Paint Co Ltd Multicolor filter and production of multicolor display

Also Published As

Publication number Publication date
WO2002067054A2 (en) 2002-08-29
JP2004530255A (en) 2004-09-30
KR100582830B1 (en) 2006-05-23
EP1433027A2 (en) 2004-06-30
KR20040024545A (en) 2004-03-20
WO2002067054A3 (en) 2003-04-17

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase