AU2001243650A1 - Chamber cleaning mechanism - Google Patents

Chamber cleaning mechanism

Info

Publication number
AU2001243650A1
AU2001243650A1 AU2001243650A AU4365001A AU2001243650A1 AU 2001243650 A1 AU2001243650 A1 AU 2001243650A1 AU 2001243650 A AU2001243650 A AU 2001243650A AU 4365001 A AU4365001 A AU 4365001A AU 2001243650 A1 AU2001243650 A1 AU 2001243650A1
Authority
AU
Australia
Prior art keywords
cleaning mechanism
chamber cleaning
chamber
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001243650A
Inventor
David M. Inori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Technology Materials Inc
Original Assignee
Advanced Technology Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Technology Materials Inc filed Critical Advanced Technology Materials Inc
Publication of AU2001243650A1 publication Critical patent/AU2001243650A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D25/00—Devices or methods for removing incrustations, e.g. slag, metal deposits, dust; Devices or methods for preventing the adherence of slag
    • F27D25/001—Devices or methods for removing incrustations, e.g. slag, metal deposits, dust; Devices or methods for preventing the adherence of slag comprising breaking tools, e.g. hammers, drills, scrapers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B08B17/06—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/0804—Cleaning containers having tubular shape, e.g. casks, barrels, drums
    • B08B9/0808—Cleaning containers having tubular shape, e.g. casks, barrels, drums by methods involving the use of tools, e.g. by brushes, scrapers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning In General (AREA)
  • Mixers Of The Rotary Stirring Type (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Chemical Vapour Deposition (AREA)
AU2001243650A 2000-03-14 2001-03-14 Chamber cleaning mechanism Abandoned AU2001243650A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/525,221 US6544482B1 (en) 2000-03-14 2000-03-14 Chamber cleaning mechanism
US09525221 2000-03-14
PCT/US2001/008152 WO2001069131A2 (en) 2000-03-14 2001-03-14 Chamber cleaning mechanism

Publications (1)

Publication Number Publication Date
AU2001243650A1 true AU2001243650A1 (en) 2001-09-24

Family

ID=24092403

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001243650A Abandoned AU2001243650A1 (en) 2000-03-14 2001-03-14 Chamber cleaning mechanism

Country Status (7)

Country Link
US (2) US6544482B1 (en)
EP (1) EP1268039A2 (en)
JP (1) JP2003527749A (en)
KR (1) KR100808740B1 (en)
AU (1) AU2001243650A1 (en)
TW (1) TW497119B (en)
WO (1) WO2001069131A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG152904A1 (en) * 2000-10-20 2009-06-29 Silverbrook Res Pty Ltd Cartridge for an electronic pen
US6773581B2 (en) * 2001-10-18 2004-08-10 General Atomics System and method for solids transport in hydrothermal processes
US7569193B2 (en) * 2003-12-19 2009-08-04 Applied Materials, Inc. Apparatus and method for controlled combustion of gaseous pollutants
US7736599B2 (en) * 2004-11-12 2010-06-15 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement
CN101300411B (en) * 2005-10-31 2012-10-03 应用材料公司 Process abatement reactor
KR101623965B1 (en) 2014-10-07 2016-05-24 주식회사 싸이노스 A washing table
CN109126371A (en) * 2018-10-27 2019-01-04 何娟娟 A kind of unordered type bulky grain active carbon purifying equipment
CN113267046B (en) * 2021-04-28 2022-09-30 怀仁县恒益陶瓷有限公司 Functional ceramic preparation equipment
CN113770136B (en) * 2021-05-14 2022-12-20 王志鑫 Atmospheric detection case structure
CN117656679B (en) * 2024-01-31 2024-04-09 中迅杰工业科技(荣成)有限公司 Ink box body cleaning device for character display equipment

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US548138A (en) 1895-10-15 Apparatus for cleaning reservoirs
US851134A (en) 1906-10-15 1907-04-23 Leo C Kleidon Flue-cleaner.
US1082766A (en) 1912-09-16 1913-12-30 Tyler Co W S Collector.
US1261243A (en) 1916-03-25 1918-04-02 Louis H Kettner Device for cleaning boilers.
US1616777A (en) 1924-02-26 1927-02-08 Booth James William Still cleaner
US1697390A (en) 1926-05-14 1929-01-01 Herman B Kipper Process of speeding chemical reactions
US2114553A (en) 1936-06-24 1938-04-19 Murray Co Separator
US2222283A (en) 1938-12-13 1940-11-19 Nat Aniline & Chem Co Inc Manufacture of maleic anhydride
US2554546A (en) 1946-05-24 1951-05-29 Hurd Corp Cleansing brush for columnar evaporator and the like
US2661811A (en) 1951-12-29 1953-12-08 Kautz Karl Apparatus for continuously filtering solids from gases
US3120020A (en) 1962-10-31 1964-02-04 Paul Woolridge Soot remover
US3423186A (en) 1964-07-02 1969-01-21 Ppg Industries Inc Scraped removal of metal oxide deposit by a ceramic edge
US3589609A (en) 1968-12-10 1971-06-29 Stuart C Wyant Timed motorized flue cleaning apparatus
FI56037C (en) 1975-10-30 1979-11-12 Enso Gutzeit Oy HYDROCYCLON
DE2723547C2 (en) 1977-05-25 1983-10-20 Otto Junker Gmbh, 5107 Simmerath Device for removing the slag deposits and infiltrated inner surface layers on melting or pouring vessels
JPS5432166A (en) 1977-08-15 1979-03-09 Hisashi Imai Gas treatment apparatus with catalytic cell
SE417673B (en) 1980-03-14 1981-04-06 Rilett Energitjenst Ab SCRUBBES FOR CLEANING OF DUST CONDITIONS GAS AND ANGES
DE3115152A1 (en) * 1981-04-15 1982-12-02 Hoechst Ag, 6000 Frankfurt "HETEROCYCLIC PHENYL ETHERS AND HERBICIDES CONTAINING THEM"
DE4013912A1 (en) 1990-04-26 1991-10-31 Fischer Karl Ind Gmbh Reactor for high viscosity melts etc.
JPH0653089B2 (en) * 1990-07-06 1994-07-20 技術研究組合医療福祉機器研究所 Sleeper
JP3057738B2 (en) * 1990-09-20 2000-07-04 日本電気株式会社 CVD equipment
JPH06180391A (en) * 1992-12-11 1994-06-28 Ishikawajima Harima Heavy Ind Co Ltd Carbon dioxide gas absorbing tower
JP3013652B2 (en) * 1993-06-01 2000-02-28 富士通株式会社 Exhaust device and its cleaning method
US6182325B1 (en) * 1998-03-10 2001-02-06 Advanced Technology Materials, Inc. Chamber cleaning mechanism
JPH11319470A (en) * 1998-05-21 1999-11-24 Taiyo Roki Kk Waste gas treating device
US6119299A (en) * 1998-12-03 2000-09-19 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus for cleaning a conduit

Also Published As

Publication number Publication date
JP2003527749A (en) 2003-09-16
EP1268039A2 (en) 2003-01-02
TW497119B (en) 2002-08-01
US20030070247A1 (en) 2003-04-17
WO2001069131A2 (en) 2001-09-20
US6775876B2 (en) 2004-08-17
WO2001069131A3 (en) 2002-01-31
KR20020086483A (en) 2002-11-18
US6544482B1 (en) 2003-04-08
KR100808740B1 (en) 2008-02-29

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