AU2001239698A1 - Phase shift masking for complex patterns - Google Patents
Phase shift masking for complex patternsInfo
- Publication number
- AU2001239698A1 AU2001239698A1 AU2001239698A AU3969801A AU2001239698A1 AU 2001239698 A1 AU2001239698 A1 AU 2001239698A1 AU 2001239698 A AU2001239698 A AU 2001239698A AU 3969801 A AU3969801 A AU 3969801A AU 2001239698 A1 AU2001239698 A1 AU 2001239698A1
- Authority
- AU
- Australia
- Prior art keywords
- phase shift
- features
- phase
- structures
- regions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/29—Rim PSM or outrigger PSM; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Steroid Compounds (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21593800P | 2000-07-05 | 2000-07-05 | |
US60215938 | 2000-07-05 | ||
US09/669,359 US6503666B1 (en) | 2000-07-05 | 2000-09-26 | Phase shift masking for complex patterns |
US09669359 | 2000-09-26 | ||
PCT/US2000/042284 WO2002003140A1 (en) | 2000-07-05 | 2000-11-28 | Phase shift masking for complex patterns |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001239698A1 true AU2001239698A1 (en) | 2002-01-14 |
Family
ID=26910506
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001239698A Abandoned AU2001239698A1 (en) | 2000-07-05 | 2000-11-28 | Phase shift masking for complex patterns |
Country Status (6)
Country | Link |
---|---|
EP (2) | EP1299771B1 (ja) |
JP (1) | JP4393063B2 (ja) |
CN (1) | CN1218217C (ja) |
AT (1) | ATE502321T1 (ja) |
AU (1) | AU2001239698A1 (ja) |
DE (1) | DE60045744D1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7858450B2 (en) * | 2004-01-06 | 2010-12-28 | Samsung Electronics Co., Ltd. | Optic mask and manufacturing method of thin film transistor array panel using the same |
KR100586549B1 (ko) * | 2004-12-02 | 2006-06-08 | 주식회사 하이닉스반도체 | 포토 마스크 및 이를 이용한 패턴 제조 방법 |
KR100675882B1 (ko) * | 2004-12-22 | 2007-02-02 | 주식회사 하이닉스반도체 | 다중투과 위상 마스크 및 이를 이용한 노광 방법 |
US8065638B2 (en) * | 2009-01-30 | 2011-11-22 | Synopsys, Inc. | Incremental concurrent processing for efficient computation of high-volume layout data |
US8732629B2 (en) | 2009-10-30 | 2014-05-20 | Synopsys, Inc. | Method and system for lithography hotspot correction of a post-route layout |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5595844A (en) * | 1990-11-29 | 1997-01-21 | Kabushiki Kaisha Toshiba | Method of exposing light in a method of fabricating a reticle |
US5246800A (en) | 1991-09-12 | 1993-09-21 | Etec Systems, Inc. | Discrete phase shift mask writing |
DE69328220T2 (de) | 1992-09-01 | 2000-08-24 | Dainippon Printing Co Ltd | Verfahren zur Herstellung einer Phasenschiebermaske oder eines Phasenschiebermasken-Rohlings |
US5362584A (en) * | 1993-04-02 | 1994-11-08 | International Business Machines Corporation | Phase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areas |
US5496666A (en) * | 1994-10-27 | 1996-03-05 | Chartered Semiconductor Manufacturing Pte Ltd. | Contact hole mask for semiconductor fabrication |
US5472814A (en) | 1994-11-17 | 1995-12-05 | International Business Machines Corporation | Orthogonally separated phase shifted and unphase shifted mask patterns for image improvement |
US5523186A (en) * | 1994-12-16 | 1996-06-04 | International Business Machines Corporation | Split and cover technique for phase shifting photolithography |
JP2790127B2 (ja) * | 1996-06-27 | 1998-08-27 | 日本電気株式会社 | フォトマスク及びその製造方法 |
US5858580A (en) | 1997-09-17 | 1999-01-12 | Numerical Technologies, Inc. | Phase shifting circuit manufacture method and apparatus |
US5923566A (en) * | 1997-03-25 | 1999-07-13 | International Business Machines Corporation | Phase shifted design verification routine |
US6057063A (en) | 1997-04-14 | 2000-05-02 | International Business Machines Corporation | Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith |
JPH11109603A (ja) * | 1997-10-06 | 1999-04-23 | Mitsubishi Electric Corp | フォトマスクおよび半導体装置の製造方法 |
US6096458A (en) | 1998-08-05 | 2000-08-01 | International Business Machines Corporation | Methods for manufacturing photolithography masks utilizing interfering beams of radiation |
-
2000
- 2000-11-28 EP EP00992248A patent/EP1299771B1/en not_active Expired - Lifetime
- 2000-11-28 JP JP2002508143A patent/JP4393063B2/ja not_active Expired - Lifetime
- 2000-11-28 DE DE60045744T patent/DE60045744D1/de not_active Expired - Lifetime
- 2000-11-28 AU AU2001239698A patent/AU2001239698A1/en not_active Abandoned
- 2000-11-28 CN CN008197296A patent/CN1218217C/zh not_active Expired - Fee Related
- 2000-11-28 AT AT00992248T patent/ATE502321T1/de not_active IP Right Cessation
- 2000-11-28 EP EP11153593.6A patent/EP2322992B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP2322992B1 (en) | 2013-07-24 |
JP2004502971A (ja) | 2004-01-29 |
EP2322992A1 (en) | 2011-05-18 |
CN1218217C (zh) | 2005-09-07 |
DE60045744D1 (de) | 2011-04-28 |
EP1299771B1 (en) | 2011-03-16 |
EP1299771A1 (en) | 2003-04-09 |
CN1454332A (zh) | 2003-11-05 |
JP4393063B2 (ja) | 2010-01-06 |
ATE502321T1 (de) | 2011-04-15 |
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