AU2001237357A1 - Hollow cathode sputter ion source for generating high-intensity ion beams - Google Patents

Hollow cathode sputter ion source for generating high-intensity ion beams

Info

Publication number
AU2001237357A1
AU2001237357A1 AU2001237357A AU3735701A AU2001237357A1 AU 2001237357 A1 AU2001237357 A1 AU 2001237357A1 AU 2001237357 A AU2001237357 A AU 2001237357A AU 3735701 A AU3735701 A AU 3735701A AU 2001237357 A1 AU2001237357 A1 AU 2001237357A1
Authority
AU
Australia
Prior art keywords
hollow cathode
generating high
intensity
cathode sputter
ion source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001237357A
Other languages
English (en)
Inventor
Michael Muller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GSI Gesellschaft fuer Schwerionenforschung mbH
Original Assignee
GSI Gesellschaft fuer Schwerionenforschung mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GSI Gesellschaft fuer Schwerionenforschung mbH filed Critical GSI Gesellschaft fuer Schwerionenforschung mbH
Publication of AU2001237357A1 publication Critical patent/AU2001237357A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/04—Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
AU2001237357A 2000-03-04 2001-01-31 Hollow cathode sputter ion source for generating high-intensity ion beams Abandoned AU2001237357A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10010706 2000-03-04
DE2000110706 DE10010706C2 (de) 2000-03-04 2000-03-04 Hohlkathoden-Sputter-Ionenquelle zur Erzeugung von Ionenstrahlen hoher Intensität
PCT/EP2001/000996 WO2001067482A1 (de) 2000-03-04 2001-01-31 Hohlkathoden-sputter-ionenquelle zur erzeugung von ionenstrahlen hoher intensität

Publications (1)

Publication Number Publication Date
AU2001237357A1 true AU2001237357A1 (en) 2001-09-17

Family

ID=7633575

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001237357A Abandoned AU2001237357A1 (en) 2000-03-04 2001-01-31 Hollow cathode sputter ion source for generating high-intensity ion beams

Country Status (4)

Country Link
EP (1) EP1261982A1 (de)
AU (1) AU2001237357A1 (de)
DE (1) DE10010706C2 (de)
WO (1) WO2001067482A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10306936B3 (de) * 2003-02-19 2004-06-24 Gesellschaft für Schwerionenforschung mbH Multi-Mode-Metall-Ionenquelle mit der Struktur einer Hohlkathoden-Sputter-Ionenquelle mit radialer Ionenextraktion
DE102008022145B4 (de) * 2008-05-05 2015-03-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zum Hochleistungs-Puls-Gasfluß-Sputtern
CN102497717A (zh) * 2011-11-25 2012-06-13 北京大学 一种用于等离子体装置的磁铁及等离子体装置
CN102497721B (zh) * 2011-11-29 2014-04-30 北京大学 双空心阴极以及双空心阴极等离子体装置和应用
DE102016119791A1 (de) * 2016-10-18 2018-04-19 scia Systems GmbH Verfahren und Vorrichtung zum Bearbeiten einer Oberfläche eines Substrates mittels eines Teilchenstrahls

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3566185A (en) * 1969-03-12 1971-02-23 Atomic Energy Commission Sputter-type penning discharge for metallic ions
US4344019A (en) * 1980-11-10 1982-08-10 The United States Of America As Represented By The United States Department Of Energy Penning discharge ion source with self-cleaning aperture
JP3034076B2 (ja) * 1991-04-18 2000-04-17 日本真空技術株式会社 金属イオン源

Also Published As

Publication number Publication date
WO2001067482A1 (de) 2001-09-13
EP1261982A1 (de) 2002-12-04
DE10010706A1 (de) 2001-09-13
DE10010706C2 (de) 2002-07-25

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