AU2001234172A1 - Method and apparatus for electromagnetic irradiation of liquid - Google Patents

Method and apparatus for electromagnetic irradiation of liquid

Info

Publication number
AU2001234172A1
AU2001234172A1 AU2001234172A AU3417201A AU2001234172A1 AU 2001234172 A1 AU2001234172 A1 AU 2001234172A1 AU 2001234172 A AU2001234172 A AU 2001234172A AU 3417201 A AU3417201 A AU 3417201A AU 2001234172 A1 AU2001234172 A1 AU 2001234172A1
Authority
AU
Australia
Prior art keywords
liquid
electromagnetic irradiation
irradiation
electromagnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001234172A
Other languages
English (en)
Inventor
Mitsuru Imai
Yasushi Kosaka
Sota Nakagawa
Toshihiro Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of AU2001234172A1 publication Critical patent/AU2001234172A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/123—Ultraviolet light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/125—X-rays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/127—Sunlight; Visible light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/128—Infrared light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/129—Radiofrequency
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/247—Suited for forming thin films
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325—Irradiation devices or lamp constructions
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/38—Treatment of water, waste water, or sewage by centrifugal separation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/722—Oxidation by peroxides
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/30—Organic compounds
    • C02F2101/36—Organic compounds containing halogen
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/06—Contaminated groundwater or leachate
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3223—Single elongated lamp located on the central axis of a turbular reactor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Physical Water Treatments (AREA)
AU2001234172A 2000-02-25 2001-02-26 Method and apparatus for electromagnetic irradiation of liquid Abandoned AU2001234172A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000/49657 2000-02-25
JP2000049657 2000-02-25
PCT/JP2001/001401 WO2001062671A1 (fr) 2000-02-25 2001-02-26 Procede et appareil permettant d'appliquer un rayonnement electromagnetique a un liquide

Publications (1)

Publication Number Publication Date
AU2001234172A1 true AU2001234172A1 (en) 2001-09-03

Family

ID=18571562

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001234172A Abandoned AU2001234172A1 (en) 2000-02-25 2001-02-26 Method and apparatus for electromagnetic irradiation of liquid

Country Status (5)

Country Link
US (1) US6713771B2 (de)
EP (1) EP1260483A4 (de)
JP (1) JP4090241B2 (de)
AU (1) AU2001234172A1 (de)
WO (1) WO2001062671A1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8734654B2 (en) 2001-07-16 2014-05-27 Foret Plasma Labs, Llc Method for treating a substance with wave energy from an electrical arc and a second source
US7622693B2 (en) 2001-07-16 2009-11-24 Foret Plasma Labs, Llc Plasma whirl reactor apparatus and methods of use
US7422695B2 (en) * 2003-09-05 2008-09-09 Foret Plasma Labs, Llc Treatment of fluids with wave energy from a carbon arc
US10188119B2 (en) 2001-07-16 2019-01-29 Foret Plasma Labs, Llc Method for treating a substance with wave energy from plasma and an electrical arc
US7857972B2 (en) * 2003-09-05 2010-12-28 Foret Plasma Labs, Llc Apparatus for treating liquids with wave energy from an electrical arc
US8734643B2 (en) 2001-07-16 2014-05-27 Foret Plasma Labs, Llc Apparatus for treating a substance with wave energy from an electrical arc and a second source
US8764978B2 (en) 2001-07-16 2014-07-01 Foret Plasma Labs, Llc System for treating a substance with wave energy from an electrical arc and a second source
US9481584B2 (en) * 2001-07-16 2016-11-01 Foret Plasma Labs, Llc System, method and apparatus for treating liquids with wave energy from plasma
US8981250B2 (en) 2001-07-16 2015-03-17 Foret Plasma Labs, Llc Apparatus for treating a substance with wave energy from plasma and an electrical Arc
JP3847326B2 (ja) * 2003-10-05 2006-11-22 泰三 青山 光線を液体に照射する方法
WO2005062946A2 (en) * 2003-12-23 2005-07-14 San Diego State University Foundation Perchlorate removal apparatus
US6991733B2 (en) * 2004-05-25 2006-01-31 Industrial Technology Research Institute Process for removing organics from ultrapure water
US7241380B2 (en) * 2005-06-15 2007-07-10 Reiling Dennis R Ultraviolet treatment unit and septic tank system
NZ542509A (en) * 2005-09-20 2008-01-31 Logistic Solutions Ltd A treatment system
AT508099B1 (de) * 2009-03-17 2015-07-15 Semperit Ag Holding Verfahren zur herstellung eines vernetzten elastomers
JP5818628B2 (ja) * 2011-10-24 2015-11-18 太平洋セメント株式会社 非液体物質の製造方法、及び非液体物質の製造装置
FR2998486B1 (fr) * 2012-11-28 2014-11-21 Alfaa France Dispositif de traitement de fluide
MX2015007359A (es) 2012-12-11 2015-12-01 Foret Plasma Labs Llc Sistema de reactor de vortice a contracorriente a alta temperatura, metodo y aparato.
US10135236B2 (en) * 2013-02-20 2018-11-20 The Board of Regents of the Nevada Systems of Higher Education on behalf of the University of Nevada, Las Vegas Auto-triggered methods and systems for protecting against direct and indirect electronic attack
MX358199B (es) 2013-03-12 2018-08-08 Foret Plasma Labs Llc Método y aparato para la sinterización de agentes de sostén.
JP5853982B2 (ja) * 2013-03-29 2016-02-09 三浦工業株式会社 紫外線殺菌装置及び紫外線殺菌システム
JP6404404B1 (ja) * 2017-06-06 2018-10-10 日機装株式会社 流体殺菌装置
GB2567817A (en) * 2017-10-24 2019-05-01 Ipurtech Ltd Treating thin film with UV radiation
JP7035499B2 (ja) * 2017-12-14 2022-03-15 豊田合成株式会社 紫外光照射殺菌装置
KR20230026536A (ko) 2018-07-18 2023-02-24 레바론 아이피 홀딩스, 엘엘씨 바람직하지 않은 유기체를 비활성화하기 위한 공정 유체 처리 시스템 및 방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB450341A (en) * 1934-12-24 1936-07-15 Creamery Package Mfg Co Improvements in liquid irradiating apparatus
NL282311A (de) * 1964-01-14
US3659096A (en) * 1970-06-16 1972-04-25 Controlex Corp America Apparatus for irradiating a liquid
DE2258393B1 (de) 1972-11-29 1973-10-11 Licentia Gmbh Verfahren und Einrichtung zur Bestrahlung von Fluessigkeiten und aehnlichen Medien mit energiereichen Elektronen
JPS5523662Y2 (de) * 1974-11-01 1980-06-05
JPS5159449A (en) 1974-11-21 1976-05-24 Mitsui Mining & Smelting Co Kendakuekino shoriho
DE2527009C3 (de) * 1975-06-18 1979-05-31 Original Hanau Quarzlampen Gmbh, 6450 Hanau Vorrichtung zur UV-Entkeimung von Wasser
US4274970A (en) * 1979-10-29 1981-06-23 Beitzel Stuart W Method and apparatus for treating water
JP2757213B2 (ja) 1989-09-22 1998-05-25 日本原子力研究所 水流殺菌装置
DE4136949A1 (de) * 1991-11-11 1993-05-13 Roswitha Niedermeier Verfahren und vorrichtung zur photooxidativen reinigung von organisch belastetem wasser
JP3301499B2 (ja) * 1993-02-15 2002-07-15 株式会社荏原製作所 液体への電磁波照射装置
DE4317939C2 (de) * 1993-04-27 1995-09-28 Darius Jung Vorrichtung zur Optimierung der Intensität der auf zu bestrahlende Flüssigabfälle und Abwasser gerichteten Strahlung
US5503800A (en) * 1994-03-10 1996-04-02 Uv Systems Technology, Inc. Ultra-violet sterilizing system for waste water
FR2729382B1 (fr) * 1995-01-16 1997-03-28 Omnium Traitement Valorisa Reacteur d'irradiation uv pour le traitement de liquides
GB2318264A (en) * 1996-10-14 1998-04-15 Malcolm James Robins Liquid steriliser
AUPP158098A0 (en) * 1998-01-29 1998-02-26 Arnold, Geoffery Peter Laser alignment apparatus and method

Also Published As

Publication number Publication date
EP1260483A1 (de) 2002-11-27
US20030141457A1 (en) 2003-07-31
JP4090241B2 (ja) 2008-05-28
EP1260483A4 (de) 2007-08-01
WO2001062671A1 (fr) 2001-08-30
US6713771B2 (en) 2004-03-30

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