AU2001233155A1 - Apparatus and method of cleaning reticles for use in a lithography tool - Google Patents

Apparatus and method of cleaning reticles for use in a lithography tool

Info

Publication number
AU2001233155A1
AU2001233155A1 AU2001233155A AU3315501A AU2001233155A1 AU 2001233155 A1 AU2001233155 A1 AU 2001233155A1 AU 2001233155 A AU2001233155 A AU 2001233155A AU 3315501 A AU3315501 A AU 3315501A AU 2001233155 A1 AU2001233155 A1 AU 2001233155A1
Authority
AU
Australia
Prior art keywords
lithography tool
reticles
cleaning
cleaning reticles
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001233155A
Inventor
Cindy J. Hayden
David H. Peterson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Publication of AU2001233155A1 publication Critical patent/AU2001233155A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Cleaning In General (AREA)
AU2001233155A 2000-02-15 2001-01-31 Apparatus and method of cleaning reticles for use in a lithography tool Abandoned AU2001233155A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/504,539 2000-02-15
US09/504,539 US6387602B1 (en) 2000-02-15 2000-02-15 Apparatus and method of cleaning reticles for use in a lithography tool
PCT/US2001/003076 WO2001061409A2 (en) 2000-02-15 2001-01-31 Apparatus and method of cleaning reticles for use in a lithography tool

Publications (1)

Publication Number Publication Date
AU2001233155A1 true AU2001233155A1 (en) 2001-08-27

Family

ID=24006706

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001233155A Abandoned AU2001233155A1 (en) 2000-02-15 2001-01-31 Apparatus and method of cleaning reticles for use in a lithography tool

Country Status (6)

Country Link
US (1) US6387602B1 (en)
EP (1) EP1256031A2 (en)
JP (1) JP2003523640A (en)
KR (1) KR20030034043A (en)
AU (1) AU2001233155A1 (en)
WO (1) WO2001061409A2 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6724460B2 (en) 2001-11-19 2004-04-20 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method of cleaning contaminated objects
US6828569B2 (en) * 2001-11-19 2004-12-07 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method and device manufactured thereby
EP1329773A3 (en) * 2002-01-18 2006-08-30 ASML Netherlands B.V. Lithographic apparatus, apparatus cleaning method, and device manufacturing method
FR2836158B1 (en) * 2002-02-19 2005-01-07 Usinor PROCESS FOR PLASMA CLEANING OF THE SURFACE OF A MATERIAL COATED WITH AN ORGANIC SUBSTANCE, AND IMPLEMENTATION INSTALLATION
DE10230675B4 (en) * 2002-07-04 2007-01-25 Infineon Technologies Ag Method for producing phase shift masks
US6829035B2 (en) * 2002-11-12 2004-12-07 Applied Materials Israel, Ltd. Advanced mask cleaning and handling
US7070832B2 (en) * 2003-09-11 2006-07-04 Intel Corporation Sublimating process for cleaning and protecting lithography masks
TWI417649B (en) * 2005-12-28 2013-12-01 尼康股份有限公司 Reticle carrying device, exposure device, reticle carrying method, and reticle processing method
US7808616B2 (en) * 2005-12-28 2010-10-05 Nikon Corporation Reticle transport apparatus, exposure apparatus, reticle transport method, and reticle processing method
US7342235B1 (en) 2006-04-27 2008-03-11 Metrosol, Inc. Contamination monitoring and control techniques for use with an optical metrology instrument
US7622310B2 (en) * 2006-04-27 2009-11-24 Metrosol, Inc. Contamination monitoring and control techniques for use with an optical metrology instrument
US7663747B2 (en) * 2006-04-27 2010-02-16 Metrosol, Inc. Contamination monitoring and control techniques for use with an optical metrology instrument
KR100817066B1 (en) * 2006-10-11 2008-03-27 삼성전자주식회사 Euv exposure apparatus in-situ performing exposing substrate and cleaning optical element and cleaning method of optical element included in the apparatus
TWM451568U (en) 2012-11-19 2013-04-21 Gudeng Prec Industral Co Ltd Mask cleaner device
US10459352B2 (en) 2015-08-31 2019-10-29 Taiwan Semiconductor Manufacturing Company, Ltd. Mask cleaning
CN114072732A (en) * 2019-07-01 2022-02-18 Asml荷兰有限公司 Surface treatment apparatus and method for surface treating patterning devices and other substrates
CN114798599A (en) * 2022-04-15 2022-07-29 深圳市华星光电半导体显示技术有限公司 Mask plate cleaning equipment and mask plate cleaning method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE510503C (en) 1927-06-28 1930-10-20 Adolf Schild Dipl Ing Process for the continuous production of a glass ribbon by rolling
JPH01265513A (en) 1988-04-15 1989-10-23 Nec Corp Reduction projection aligner
US6048588A (en) 1988-07-08 2000-04-11 Cauldron Limited Partnership Method for enhancing chemisorption of material
JP3133054B2 (en) 1990-07-26 2001-02-05 大日本スクリーン製造株式会社 Substrate cleaning processing method and cleaning processing apparatus
KR940012061A (en) 1992-11-27 1994-06-22 가나이 쯔또무 Organic matter removal method and organic matter removal apparatus for using the method
US5814156A (en) 1993-09-08 1998-09-29 Uvtech Systems Inc. Photoreactive surface cleaning
AU7682594A (en) 1993-09-08 1995-03-27 Uvtech Systems, Inc. Surface processing
TW260806B (en) 1993-11-26 1995-10-21 Ushio Electric Inc
JP3085128B2 (en) 1995-02-24 2000-09-04 ウシオ電機株式会社 Light cleaning method
TW284907B (en) 1995-06-07 1996-09-01 Cauldron Lp Removal of material by polarized irradiation and back side application for radiation
JPH1140478A (en) 1997-07-18 1999-02-12 Nikon Corp Electron beam projection aligner
JPH1195413A (en) 1997-09-25 1999-04-09 Nippon Telegr & Teleph Corp <Ntt> Mask storage device

Also Published As

Publication number Publication date
JP2003523640A (en) 2003-08-05
EP1256031A2 (en) 2002-11-13
KR20030034043A (en) 2003-05-01
WO2001061409A9 (en) 2002-10-24
WO2001061409A2 (en) 2001-08-23
WO2001061409A3 (en) 2002-02-21
US6387602B1 (en) 2002-05-14

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