AU2002232716A1 - Method and apparatus for creating photolithographic masks - Google Patents
Method and apparatus for creating photolithographic masksInfo
- Publication number
- AU2002232716A1 AU2002232716A1 AU2002232716A AU3271602A AU2002232716A1 AU 2002232716 A1 AU2002232716 A1 AU 2002232716A1 AU 2002232716 A AU2002232716 A AU 2002232716A AU 3271602 A AU3271602 A AU 3271602A AU 2002232716 A1 AU2002232716 A1 AU 2002232716A1
- Authority
- AU
- Australia
- Prior art keywords
- photolithographic masks
- creating
- creating photolithographic
- masks
- photolithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/28—Phase shift masks [PSM]; PSM blanks; Preparation thereof with three or more diverse phases on the same PSM; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/703,294 US6728946B1 (en) | 2000-10-31 | 2000-10-31 | Method and apparatus for creating photolithographic masks |
US09/703,294 | 2000-10-31 | ||
PCT/US2001/049720 WO2002037182A2 (en) | 2000-10-31 | 2001-10-25 | Method and apparatus for creating photolithographic masks |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002232716A1 true AU2002232716A1 (en) | 2002-05-15 |
Family
ID=24824819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002232716A Abandoned AU2002232716A1 (en) | 2000-10-31 | 2001-10-25 | Method and apparatus for creating photolithographic masks |
Country Status (3)
Country | Link |
---|---|
US (2) | US6728946B1 (en) |
AU (1) | AU2002232716A1 (en) |
WO (1) | WO2002037182A2 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6787271B2 (en) * | 2000-07-05 | 2004-09-07 | Numerical Technologies, Inc. | Design and layout of phase shifting photolithographic masks |
US6728946B1 (en) * | 2000-10-31 | 2004-04-27 | Franklin M. Schellenberg | Method and apparatus for creating photolithographic masks |
US6931613B2 (en) * | 2002-06-24 | 2005-08-16 | Thomas H. Kauth | Hierarchical feature extraction for electrical interaction calculations |
JP3746497B2 (en) * | 2003-06-24 | 2006-02-15 | 松下電器産業株式会社 | Photo mask |
US7069534B2 (en) * | 2003-12-17 | 2006-06-27 | Sahouria Emile Y | Mask creation with hierarchy management using cover cells |
US7861207B2 (en) | 2004-02-25 | 2010-12-28 | Mentor Graphics Corporation | Fragmentation point and simulation site adjustment for resolution enhancement techniques |
US7234130B2 (en) * | 2004-02-25 | 2007-06-19 | James Word | Long range corrections in integrated circuit layout designs |
US7493587B2 (en) * | 2005-03-02 | 2009-02-17 | James Word | Chromeless phase shifting mask for integrated circuits using interior region |
US8037429B2 (en) * | 2005-03-02 | 2011-10-11 | Mentor Graphics Corporation | Model-based SRAF insertion |
DE102005036207A1 (en) * | 2005-08-02 | 2007-02-22 | X-Fab Semiconductor Foundries Ag | Method of designing integrated circuits |
TWI257979B (en) * | 2005-08-19 | 2006-07-11 | Delta Electronics Inc | Dynamic bearing manufacturing method |
US7541116B2 (en) * | 2005-10-21 | 2009-06-02 | Promos Technologies Inc. | Mask at frequency domain and method for preparing the same and exposing system using the same |
US7712068B2 (en) * | 2006-02-17 | 2010-05-04 | Zhuoxiang Ren | Computation of electrical properties of an IC layout |
US7506285B2 (en) | 2006-02-17 | 2009-03-17 | Mohamed Al-Imam | Multi-dimensional analysis for predicting RET model accuracy |
US7799487B2 (en) * | 2007-02-09 | 2010-09-21 | Ayman Yehia Hamouda | Dual metric OPC |
US8151236B2 (en) * | 2008-01-19 | 2012-04-03 | Synopsys, Inc. | Steiner tree based approach for polygon fracturing |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0612540B2 (en) | 1990-06-28 | 1994-02-16 | 富士ゼロックス株式会社 | Document creation support device |
US6132908A (en) * | 1990-10-26 | 2000-10-17 | Nikon Corporation | Photo mask and exposure method using the same |
US5364716A (en) | 1991-09-27 | 1994-11-15 | Fujitsu Limited | Pattern exposing method using phase shift and mask used therefor |
US5573890A (en) | 1994-07-18 | 1996-11-12 | Advanced Micro Devices, Inc. | Method of optical lithography using phase shift masking |
US5537648A (en) | 1994-08-15 | 1996-07-16 | International Business Machines Corporation | Geometric autogeneration of "hard" phase-shift designs for VLSI |
US5663017A (en) | 1995-06-07 | 1997-09-02 | Lsi Logic Corporation | Optical corrective techniques with reticle formation and reticle stitching to provide design flexibility |
US5867401A (en) | 1996-01-11 | 1999-02-02 | Fujitsu Limited | Phase shifter arranging method and computer readable medium storing program for carrying out the method |
US5858580A (en) | 1997-09-17 | 1999-01-12 | Numerical Technologies, Inc. | Phase shifting circuit manufacture method and apparatus |
US5807649A (en) | 1996-10-31 | 1998-09-15 | International Business Machines Corporation | Lithographic patterning method and mask set therefor with light field trim mask |
WO1999014637A1 (en) | 1997-09-17 | 1999-03-25 | Numerical Technologies, Inc. | Data hierarchy layout correction and verification method and apparatus |
US6416907B1 (en) * | 2000-04-27 | 2002-07-09 | Micron Technology, Inc. | Method for designing photolithographic reticle layout, reticle, and photolithographic process |
US6493866B1 (en) * | 2000-06-30 | 2002-12-10 | Synopsys, Inc. | Phase-shift lithography mapping and apparatus |
US6524752B1 (en) * | 2000-07-05 | 2003-02-25 | Numerical Technologies, Inc. | Phase shift masking for intersecting lines |
US6681379B2 (en) * | 2000-07-05 | 2004-01-20 | Numerical Technologies, Inc. | Phase shifting design and layout for static random access memory |
US6541165B1 (en) * | 2000-07-05 | 2003-04-01 | Numerical Technologies, Inc. | Phase shift mask sub-resolution assist features |
US6503666B1 (en) * | 2000-07-05 | 2003-01-07 | Numerical Technologies, Inc. | Phase shift masking for complex patterns |
US6728946B1 (en) * | 2000-10-31 | 2004-04-27 | Franklin M. Schellenberg | Method and apparatus for creating photolithographic masks |
US6797438B1 (en) * | 2001-12-11 | 2004-09-28 | Advanced Micro Devices, Inc. | Method and enhancing clear field phase shift masks with border around edges of phase regions |
-
2000
- 2000-10-31 US US09/703,294 patent/US6728946B1/en not_active Expired - Lifetime
-
2001
- 2001-10-25 WO PCT/US2001/049720 patent/WO2002037182A2/en active Application Filing
- 2001-10-25 AU AU2002232716A patent/AU2002232716A1/en not_active Abandoned
-
2004
- 2004-03-26 US US10/811,418 patent/US7174531B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
WO2002037182A3 (en) | 2004-02-26 |
US7174531B2 (en) | 2007-02-06 |
WO2002037182A2 (en) | 2002-05-10 |
US6728946B1 (en) | 2004-04-27 |
US20040230937A1 (en) | 2004-11-18 |
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