AU2001222241A1 - Laser machinning device - Google Patents
Laser machinning deviceInfo
- Publication number
- AU2001222241A1 AU2001222241A1 AU2001222241A AU2224101A AU2001222241A1 AU 2001222241 A1 AU2001222241 A1 AU 2001222241A1 AU 2001222241 A AU2001222241 A AU 2001222241A AU 2224101 A AU2224101 A AU 2224101A AU 2001222241 A1 AU2001222241 A1 AU 2001222241A1
- Authority
- AU
- Australia
- Prior art keywords
- machinning
- laser
- machinning device
- laser machinning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/359—Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/46—Systems using spatial filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2294—Addressing the hologram to an active spatial light modulator
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/135—Liquid crystal cells structurally associated with a photoconducting or a ferro-electric layer, the properties of which can be optically or electrically varied
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H2001/0094—Adaptation of holography to specific applications for patterning or machining using the holobject as input light distribution
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0486—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations
- G03H2001/0491—Improving or monitoring the quality of the record, e.g. by compensating distortions, aberrations by monitoring the hologram formation, e.g. via a feed-back loop
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2202—Reconstruction geometries or arrangements
- G03H1/2205—Reconstruction geometries or arrangements using downstream optical component
- G03H2001/221—Element having optical power, e.g. field lens
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2202—Reconstruction geometries or arrangements
- G03H1/2205—Reconstruction geometries or arrangements using downstream optical component
- G03H2001/2213—Diffusing screen revealing the real holobject, e.g. container filed with gel to reveal the 3D holobject
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2202—Reconstruction geometries or arrangements
- G03H2001/2244—Means for detecting or recording the holobject
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2210/00—Object characteristics
- G03H2210/40—Synthetic representation, i.e. digital or optical object decomposition
- G03H2210/44—Digital representation
- G03H2210/441—Numerical processing applied to the object data other than numerical propagation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2223/00—Optical components
- G03H2223/12—Amplitude mask, e.g. diaphragm, Louver filter
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2223/00—Optical components
- G03H2223/50—Particular location or purpose of optical element
- G03H2223/55—Arranged at a Fourier plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2225/00—Active addressable light modulator
- G03H2225/20—Nature, e.g. e-beam addressed
- G03H2225/25—Optically addressed SLM [OA-SLM]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2225/00—Active addressable light modulator
- G03H2225/30—Modulation
- G03H2225/32—Phase only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2225/00—Active addressable light modulator
- G03H2225/52—Reflective modulator
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Laser Beam Processing (AREA)
- Holo Graphy (AREA)
Applications Claiming Priority (13)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-10853 | 2000-01-19 | ||
JP2000-10856 | 2000-01-19 | ||
JP2000010853 | 2000-01-19 | ||
JP2000010852 | 2000-01-19 | ||
JP2000-10852 | 2000-01-19 | ||
JP10865A JP2000215766A (en) | 1999-01-21 | 2000-01-19 | Monitoring diagnosis device |
JP2000319584A JP3980822B2 (en) | 2000-01-19 | 2000-10-19 | Image projection apparatus and image projection method |
JP2000-319594 | 2000-10-19 | ||
JP2000-319584 | 2000-10-19 | ||
JP2000319594A JP3990534B2 (en) | 2000-01-19 | 2000-10-19 | Laser processing equipment |
JP2000-327386 | 2000-10-26 | ||
JP2000327386A JP2001272636A (en) | 2000-01-19 | 2000-10-26 | Laser beam machining device |
PCT/JP2000/009192 WO2001053876A1 (en) | 2000-01-19 | 2000-12-25 | Laser machinning device |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001222241A1 true AU2001222241A1 (en) | 2001-07-31 |
Family
ID=27554710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001222241A Abandoned AU2001222241A1 (en) | 2000-01-19 | 2000-12-25 | Laser machinning device |
Country Status (4)
Country | Link |
---|---|
US (1) | US6710292B2 (en) |
AU (1) | AU2001222241A1 (en) |
DE (1) | DE10085411B3 (en) |
WO (1) | WO2001053876A1 (en) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AUPQ125999A0 (en) * | 1999-06-28 | 1999-07-22 | Securency Pty Ltd | Method of producing a diffractive structure in security documents |
JP2001299941A (en) * | 2000-04-27 | 2001-10-30 | Hamamatsu Photonics Kk | Laser therapeutic device |
GB0121308D0 (en) | 2001-09-03 | 2001-10-24 | Thomas Swan & Company Ltd | Optical processing |
GB0213809D0 (en) * | 2002-06-15 | 2002-07-24 | Brocklehurst John R | Dynamic shaping of laser beams |
WO2005098552A1 (en) * | 2004-03-31 | 2005-10-20 | Pioneer Corporation | Hologram reproduction device and hologram reproduction method |
HUP0401338A2 (en) * | 2004-06-29 | 2006-02-28 | Optimal Optik Kft | Optical mead and multiplexing methods for reflection type holographic storage |
JP4606831B2 (en) * | 2004-08-31 | 2011-01-05 | 浜松ホトニクス株式会社 | Optical pattern forming method and apparatus, and optical tweezers |
EP1630588B1 (en) * | 2004-08-31 | 2011-10-12 | Hamamatsu Photonics K.K. | Method of forming an optical pattern, optical pattern formation system, and optical tweezer |
WO2007147407A1 (en) * | 2006-06-19 | 2007-12-27 | Danmarks Tekniske Universitet | Light beam generation |
JP5312748B2 (en) * | 2007-03-02 | 2013-10-09 | オリンパス株式会社 | Holographic projection method and holographic projection apparatus |
JP2008216579A (en) * | 2007-03-02 | 2008-09-18 | Olympus Corp | Holographic projection method and holographic projection apparatus |
US8324529B2 (en) * | 2007-11-14 | 2012-12-04 | Hamamatsu Photonics K.K. | Laser machining device with a converged laser beam and laser machining method |
CN102137731B (en) * | 2008-08-26 | 2014-01-01 | 浜松光子学株式会社 | Laser processing device and laser processing method |
JP5254761B2 (en) | 2008-11-28 | 2013-08-07 | 浜松ホトニクス株式会社 | Laser processing equipment |
ES2393896B1 (en) * | 2009-06-10 | 2013-11-11 | Easy Laser S.L. | LASER IMAGE PROJECTION SYSTEM APPLICABLE TO THE MARKING OF OBJECTS AND METHOD FOR THE GENERATION OF HOLOGRAMS. |
JP2012037572A (en) | 2010-08-03 | 2012-02-23 | Hamamatsu Photonics Kk | Optical system for shaping laser beam and controlling wave front |
GB2499579B (en) * | 2012-02-07 | 2014-11-26 | Two Trees Photonics Ltd | Lighting device |
GB2504970A (en) | 2012-08-15 | 2014-02-19 | Swan Thomas & Co Ltd | Optical device and methods to reduce cross-talk |
JP6272145B2 (en) | 2014-05-29 | 2018-01-31 | 浜松ホトニクス株式会社 | Laser processing apparatus and laser processing method |
US10350705B2 (en) | 2014-07-01 | 2019-07-16 | Qiova | Micromachining method for patterning a material |
CN105448681B (en) * | 2014-07-04 | 2018-11-09 | 上海微电子装备(集团)股份有限公司 | Laser anneal device |
FR3026940B1 (en) * | 2014-10-08 | 2021-09-03 | Univ Jean Monnet | DEVICE AND METHOD FOR CUTTING A HORN OR A CRYSTALLINE |
JP6689646B2 (en) * | 2016-04-01 | 2020-04-28 | 浜松ホトニクス株式会社 | Laser processing equipment |
JP6747910B2 (en) * | 2016-08-10 | 2020-08-26 | 浜松ホトニクス株式会社 | Light emitting device |
US11031751B2 (en) | 2016-08-10 | 2021-06-08 | Hamamatsu Photonics K.K. | Light-emitting device |
US10734786B2 (en) * | 2016-09-07 | 2020-08-04 | Hamamatsu Photonics K.K. | Semiconductor light emitting element and light emitting device including same |
JP6747922B2 (en) * | 2016-09-07 | 2020-08-26 | 浜松ホトニクス株式会社 | Semiconductor light emitting device and light emitting device |
US11646546B2 (en) | 2017-03-27 | 2023-05-09 | Hamamatsu Photonics K.K. | Semiconductor light emitting array with phase modulation regions for generating beam projection patterns |
US11637409B2 (en) | 2017-03-27 | 2023-04-25 | Hamamatsu Photonics K.K. | Semiconductor light-emitting module and control method therefor |
JP6959042B2 (en) | 2017-06-15 | 2021-11-02 | 浜松ホトニクス株式会社 | Light emitting device |
DE102017008454B4 (en) * | 2017-09-10 | 2019-05-02 | Keming Du | Arrangement for generating spatially and temporally addressable radiation fields of high power / energy |
US11626709B2 (en) | 2017-12-08 | 2023-04-11 | Hamamatsu Photonics K.K. | Light-emitting device and production method for same |
CN114517291A (en) * | 2020-11-20 | 2022-05-20 | 赫智科技(苏州)有限公司 | Spatially-resolved photoinduction additive manufacturing method |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2154092A (en) * | 1984-02-07 | 1985-08-29 | Standard Telephones Cables Ltd | Optical correlator |
GB2154331B (en) * | 1984-02-16 | 1987-07-01 | Standard Telephones Cables Ltd | Coherent light optical processor |
JPS6244718A (en) * | 1985-08-23 | 1987-02-26 | Matsushita Electric Ind Co Ltd | Pattern exposing device |
US5132811A (en) * | 1989-08-10 | 1992-07-21 | Seiko Instruments Inc. | Holographic operating optical apparatus |
JPH0820916B2 (en) | 1989-09-25 | 1996-03-04 | セイコー電子工業株式会社 | Optical coordinate transformation device |
JPH0439690A (en) * | 1990-06-05 | 1992-02-10 | Matsushita Electric Ind Co Ltd | Optical information processor |
US5233554A (en) * | 1990-09-10 | 1993-08-03 | United Technologies Corporation | Programmable optical correlator |
US5187598A (en) * | 1991-08-26 | 1993-02-16 | United Technologies Corporation | Optical processor for pulse train identification |
JPH0577067A (en) * | 1991-09-17 | 1993-03-30 | Hitachi Ltd | Laser beam machine and laser beam machining method |
JP2711194B2 (en) | 1991-09-30 | 1998-02-10 | 三菱電機株式会社 | Exposure equipment |
JP3430531B2 (en) * | 1993-01-08 | 2003-07-28 | セイコーエプソン株式会社 | Light marking device |
US6130009A (en) * | 1994-01-03 | 2000-10-10 | Litel Instruments | Apparatus and process for nozzle production utilizing computer generated holograms |
JP3110609B2 (en) | 1994-04-28 | 2000-11-20 | 松下電子工業株式会社 | Gas discharge type display device and driving method thereof |
US5523543A (en) * | 1994-09-09 | 1996-06-04 | Litel Instruments | Laser ablation control system and method |
JPH09207343A (en) * | 1995-11-29 | 1997-08-12 | Matsushita Electric Ind Co Ltd | Laser machining method |
JP3918044B2 (en) | 1996-11-01 | 2007-05-23 | 浜松ホトニクス株式会社 | Image forming apparatus |
WO1998021629A2 (en) * | 1996-11-15 | 1998-05-22 | Diffraction, Ltd. | In-line holographic mask for micromachining |
JPH116981A (en) * | 1997-06-18 | 1999-01-12 | Hamamatsu Photonics Kk | Optical image projection device, optical image reading device and chemical synthesizer |
-
2000
- 2000-12-25 WO PCT/JP2000/009192 patent/WO2001053876A1/en active Application Filing
- 2000-12-25 DE DE10085411.7T patent/DE10085411B3/en not_active Expired - Lifetime
- 2000-12-25 AU AU2001222241A patent/AU2001222241A1/en not_active Abandoned
- 2000-12-25 US US10/181,376 patent/US6710292B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6710292B2 (en) | 2004-03-23 |
DE10085411T1 (en) | 2002-12-19 |
DE10085411B3 (en) | 2017-03-02 |
US20030010763A1 (en) | 2003-01-16 |
WO2001053876A1 (en) | 2001-07-26 |
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