AU2000278552A1 - Carbon-based field emission electron device for high current density applications - Google Patents

Carbon-based field emission electron device for high current density applications

Info

Publication number
AU2000278552A1
AU2000278552A1 AU2000278552A AU7855200A AU2000278552A1 AU 2000278552 A1 AU2000278552 A1 AU 2000278552A1 AU 2000278552 A AU2000278552 A AU 2000278552A AU 7855200 A AU7855200 A AU 7855200A AU 2000278552 A1 AU2000278552 A1 AU 2000278552A1
Authority
AU
Australia
Prior art keywords
carbon
current density
high current
field emission
electron device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2000278552A
Inventor
Keith D. Jamison
Donald E. Patterson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Extreme Devices Inc
Original Assignee
Extreme Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Extreme Devices Inc filed Critical Extreme Devices Inc
Publication of AU2000278552A1 publication Critical patent/AU2000278552A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/304—Field-emissive cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/16—Circuit elements, having distributed capacitance and inductance, structurally associated with the tube and interacting with the discharge
    • H01J23/165—Manufacturing processes or apparatus therefore
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J25/00—Transit-time tubes, e.g. klystrons, travelling-wave tubes, magnetrons
    • H01J25/34—Travelling-wave tubes; Tubes in which a travelling wave is simulated at spaced gaps
    • H01J25/36—Tubes in which an electron stream interacts with a wave travelling along a delay line or equivalent sequence of impedance elements, and without magnet system producing an H-field crossing the E-field
    • H01J25/38—Tubes in which an electron stream interacts with a wave travelling along a delay line or equivalent sequence of impedance elements, and without magnet system producing an H-field crossing the E-field the forward travelling wave being utilised
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/304—Field emission cathodes
    • H01J2201/30446—Field emission cathodes characterised by the emitter material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2223/00—Details of transit-time tubes of the types covered by group H01J2225/00
    • H01J2223/02—Electrodes; Magnetic control means; Screens
    • H01J2223/04—Cathodes
AU2000278552A 2000-10-04 2000-10-04 Carbon-based field emission electron device for high current density applications Abandoned AU2000278552A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2000/027380 WO2002029843A1 (en) 2000-10-04 2000-10-04 Carbon-based field emission electron device for high current density applications

Publications (1)

Publication Number Publication Date
AU2000278552A1 true AU2000278552A1 (en) 2002-04-15

Family

ID=21741844

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2000278552A Abandoned AU2000278552A1 (en) 2000-10-04 2000-10-04 Carbon-based field emission electron device for high current density applications

Country Status (2)

Country Link
AU (1) AU2000278552A1 (en)
WO (1) WO2002029843A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102339712B (en) * 2011-09-30 2013-07-31 福州大学 Patterned graphene field emission cathode and preparation method thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4091332A (en) * 1977-02-03 1978-05-23 Northrop Corporation Traveling wave tube amplifier employing field emission cathodes
US5543680A (en) * 1993-10-20 1996-08-06 Nec Corporation Field emission type cathode structure for cathode-ray tube
US5439753A (en) * 1994-10-03 1995-08-08 Motorola, Inc. Electron emissive film
KR0181256B1 (en) * 1996-02-01 1999-03-20 김은영 Method of manufacturing diamond tip
JP2871579B2 (en) * 1996-03-28 1999-03-17 日本電気株式会社 Light emitting device and cold cathode used therefor
JP3086193B2 (en) * 1996-07-08 2000-09-11 三星エスディアイ株式会社 Cathode structure, electron gun for cathode ray tube using the same, and color cathode ray tube
RU2158037C2 (en) * 1996-07-16 2000-10-20 ООО "Высокие технологии" Process of manufacture of diamond films by method of gas- phase synthesis
FR2780601B1 (en) * 1998-06-24 2000-07-21 Commissariat Energie Atomique ELECTRONIC CYCLOTRON RESONANCE PLASMA DEPOSIT PROCESS OF CARBON LAYERS EMITTING ELECTRONS UNDER THE EFFECT OF AN APPLIED ELECTRIC FIELD
RU2149477C1 (en) * 1998-08-12 2000-05-20 Акционерное общество закрытого типа "Карбид" Field-effect electron emitter
US6181055B1 (en) * 1998-10-12 2001-01-30 Extreme Devices, Inc. Multilayer carbon-based field emission electron device for high current density applications

Also Published As

Publication number Publication date
WO2002029843A1 (en) 2002-04-11

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