AU1380988A - Polymerizable N-containing acrylates and a radiation-polymerizable mixture containing same - Google Patents

Polymerizable N-containing acrylates and a radiation-polymerizable mixture containing same

Info

Publication number
AU1380988A
AU1380988A AU13809/88A AU1380988A AU1380988A AU 1380988 A AU1380988 A AU 1380988A AU 13809/88 A AU13809/88 A AU 13809/88A AU 1380988 A AU1380988 A AU 1380988A AU 1380988 A AU1380988 A AU 1380988A
Authority
AU
Australia
Prior art keywords
polymerizable
radiation
acrylates
mixture containing
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU13809/88A
Other versions
AU603196B2 (en
Inventor
Klaus Rode
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of AU1380988A publication Critical patent/AU1380988A/en
Application granted granted Critical
Publication of AU603196B2 publication Critical patent/AU603196B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/04—Acids, Metal salts or ammonium salts thereof
    • C08F20/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/32—Polyhydroxy compounds; Polyamines; Hydroxyamines
    • C08G18/3271—Hydroxyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/60—Compositions containing diazo compounds as photosensitive substances with macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
AU13809/88A 1987-03-28 1988-03-28 Polymerizable N-containing acrylates and a radiation-polymerizable mixture containing same Ceased AU603196B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19873710279 DE3710279A1 (en) 1987-03-28 1987-03-28 POLYMERIZABLE COMPOUNDS AND THIS CONTAINING MIXTURE MIXING BY RADIATION
DE3710279 1987-03-28

Publications (2)

Publication Number Publication Date
AU1380988A true AU1380988A (en) 1988-09-29
AU603196B2 AU603196B2 (en) 1990-11-08

Family

ID=6324223

Family Applications (1)

Application Number Title Priority Date Filing Date
AU13809/88A Ceased AU603196B2 (en) 1987-03-28 1988-03-28 Polymerizable N-containing acrylates and a radiation-polymerizable mixture containing same

Country Status (7)

Country Link
EP (1) EP0287818B1 (en)
JP (1) JP2509288B2 (en)
KR (1) KR960016468B1 (en)
AU (1) AU603196B2 (en)
BR (1) BR8801396A (en)
DE (2) DE3710279A1 (en)
ZA (1) ZA882204B (en)

Families Citing this family (200)

* Cited by examiner, † Cited by third party
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DE3743782A1 (en) * 1987-12-23 1989-07-13 Bayer Ag ESTER URETHANE (METH) ACRYLIC ACID DERIVATIVES
GB2263909B (en) * 1992-01-21 1996-09-11 Du Pont Improvements in or relating to photopolymerisable components of radiation sensitive compositions
DE4343246A1 (en) * 1993-12-17 1995-06-22 Thera Ges Fuer Patente Prepolymers, free-radically polymerizable compositions prepared therefrom and their use
EP0970945A1 (en) 1998-07-06 2000-01-12 Dsm N.V. Radiation curable acrylic-acid esters containing hydroxyalkylamide groups
EP0978507A1 (en) * 1998-07-06 2000-02-09 Dsm N.V. Radiation curable acrylic acid esters containing amide groups
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BR8801396A (en) 1988-11-01
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AU603196B2 (en) 1990-11-08
KR960016468B1 (en) 1996-12-12

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