ATE545160T1 - Herstellung eines kohlenstoff-passivierten ovonic-schwellenschalters - Google Patents

Herstellung eines kohlenstoff-passivierten ovonic-schwellenschalters

Info

Publication number
ATE545160T1
ATE545160T1 AT09180915T AT09180915T ATE545160T1 AT E545160 T1 ATE545160 T1 AT E545160T1 AT 09180915 T AT09180915 T AT 09180915T AT 09180915 T AT09180915 T AT 09180915T AT E545160 T1 ATE545160 T1 AT E545160T1
Authority
AT
Austria
Prior art keywords
threshold switch
carbon
ovonic threshold
production
passivated
Prior art date
Application number
AT09180915T
Other languages
English (en)
Inventor
Jinwook Lee
Kuo-Wei Chang
Jason S Reid
Wim Y Deweerd
Aleshandre M Diaz
Original Assignee
St Microelectronics Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by St Microelectronics Srl filed Critical St Microelectronics Srl
Application granted granted Critical
Publication of ATE545160T1 publication Critical patent/ATE545160T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/20—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
    • H10B63/24—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes of the Ovonic threshold switching type
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011—Manufacture or treatment of multistable switching devices
    • H10N70/041—Modification of switching materials after formation, e.g. doping
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011—Manufacture or treatment of multistable switching devices
    • H10N70/061—Shaping switching materials
    • H10N70/066—Shaping switching materials by filling of openings, e.g. damascene method
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20—Multistable switching devices, e.g. memristors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20—Multistable switching devices, e.g. memristors
    • H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/821—Device geometry
    • H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/841—Electrodes
    • H10N70/8413—Electrodes adapted for resistive heating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/90—Bulk effect device making

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Thermistors And Varistors (AREA)
AT09180915T 2008-12-30 2009-12-29 Herstellung eines kohlenstoff-passivierten ovonic-schwellenschalters ATE545160T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/346,705 US7939815B2 (en) 2008-12-30 2008-12-30 Forming a carbon passivated ovonic threshold switch

Publications (1)

Publication Number Publication Date
ATE545160T1 true ATE545160T1 (de) 2012-02-15

Family

ID=42104564

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09180915T ATE545160T1 (de) 2008-12-30 2009-12-29 Herstellung eines kohlenstoff-passivierten ovonic-schwellenschalters

Country Status (3)

Country Link
US (1) US7939815B2 (de)
EP (1) EP2204860B1 (de)
AT (1) ATE545160T1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8188454B2 (en) * 2005-10-28 2012-05-29 Ovonyx, Inc. Forming a phase change memory with an ovonic threshold switch
US8377741B2 (en) * 2008-12-30 2013-02-19 Stmicroelectronics S.R.L. Self-heating phase change memory cell architecture
US8093576B1 (en) * 2009-11-30 2012-01-10 Micron Technology, Inc. Chemical-mechanical polish termination layer to build electrical device isolation
US8765581B2 (en) 2009-11-30 2014-07-01 Micron Technology, Inc. Self-aligned cross-point phase change memory-switch array
US8530875B1 (en) * 2010-05-06 2013-09-10 Micron Technology, Inc. Phase change memory including ovonic threshold switch with layered electrode and methods for forming same
US9166158B2 (en) 2013-02-25 2015-10-20 Micron Technology, Inc. Apparatuses including electrodes having a conductive barrier material and methods of forming same
CN104518084B (zh) * 2013-09-29 2017-11-03 中芯国际集成电路制造(上海)有限公司 相变存储器及其形成方法
US10084016B2 (en) * 2013-11-21 2018-09-25 Micron Technology, Inc. Cross-point memory and methods for fabrication of same
US9806129B2 (en) 2014-02-25 2017-10-31 Micron Technology, Inc. Cross-point memory and methods for fabrication of same
US9484196B2 (en) 2014-02-25 2016-11-01 Micron Technology, Inc. Semiconductor structures including liners comprising alucone and related methods
US9577010B2 (en) 2014-02-25 2017-02-21 Micron Technology, Inc. Cross-point memory and methods for fabrication of same
US11223014B2 (en) 2014-02-25 2022-01-11 Micron Technology, Inc. Semiconductor structures including liners comprising alucone and related methods
US10249819B2 (en) 2014-04-03 2019-04-02 Micron Technology, Inc. Methods of forming semiconductor structures including multi-portion liners
US9768378B2 (en) 2014-08-25 2017-09-19 Micron Technology, Inc. Cross-point memory and methods for fabrication of same
US10424619B2 (en) 2016-01-13 2019-09-24 Samsung Electronics Co., Ltd. Variable resistance memory devices and methods of manufacturing the same
CN108630806A (zh) * 2017-03-17 2018-10-09 中芯国际集成电路制造(上海)有限公司 相变存储器及其形成方法
KR102375588B1 (ko) * 2017-07-06 2022-03-16 삼성전자주식회사 반도체 장치 및 그 제조 방법
US11088206B2 (en) * 2017-10-16 2021-08-10 Sandisk Tehnologies Llc Methods of forming a phase change memory with vertical cross-point structure
US10593875B2 (en) * 2018-06-15 2020-03-17 Macronix International Co., Ltd. Self-aligned 3D memory with confined cell
US10937832B2 (en) 2018-06-21 2021-03-02 Macronix International Co., Ltd. 3D memory with confined cell
KR102557911B1 (ko) * 2018-08-31 2023-07-19 삼성전자주식회사 반도체 장치 및 그 제조 방법
US12249369B2 (en) * 2021-07-09 2025-03-11 Taiwan Semiconductor Manufacturing Company, Ltd. Adjusting operation voltage of cross point memory according to aging information
CN113871529A (zh) * 2021-09-29 2021-12-31 长江先进存储产业创新中心有限责任公司 相变存储器及其制造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4845533A (en) * 1986-08-22 1989-07-04 Energy Conversion Devices, Inc. Thin film electrical devices with amorphous carbon electrodes and method of making same
US5159661A (en) * 1990-10-05 1992-10-27 Energy Conversion Devices, Inc. Vertically interconnected parallel distributed processor
US5414271A (en) * 1991-01-18 1995-05-09 Energy Conversion Devices, Inc. Electrically erasable memory elements having improved set resistance stability
US6795338B2 (en) * 2002-12-13 2004-09-21 Intel Corporation Memory having access devices using phase change material such as chalcogenide
US6967344B2 (en) * 2003-03-10 2005-11-22 Energy Conversion Devices, Inc. Multi-terminal chalcogenide switching devices
EP1677357A1 (de) * 2004-12-30 2006-07-05 STMicroelectronics S.r.l. Phasenübergangsspeichereinrichtung mit einer Haftschicht und Herstellungsverfahren dafür
JP2006324501A (ja) * 2005-05-19 2006-11-30 Toshiba Corp 相変化メモリおよびその製造方法

Also Published As

Publication number Publication date
US7939815B2 (en) 2011-05-10
EP2204860B1 (de) 2012-02-08
US20100163818A1 (en) 2010-07-01
EP2204860A1 (de) 2010-07-07

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