ATE543081T1 - Verfahren zur kalibrierung eines pyrometers, verfahren zur bestimmung der temperatur eines halbleiterwafers und system zur bestimmung der temperatur eines halbleiterwafers - Google Patents

Verfahren zur kalibrierung eines pyrometers, verfahren zur bestimmung der temperatur eines halbleiterwafers und system zur bestimmung der temperatur eines halbleiterwafers

Info

Publication number
ATE543081T1
ATE543081T1 AT09170604T AT09170604T ATE543081T1 AT E543081 T1 ATE543081 T1 AT E543081T1 AT 09170604 T AT09170604 T AT 09170604T AT 09170604 T AT09170604 T AT 09170604T AT E543081 T1 ATE543081 T1 AT E543081T1
Authority
AT
Austria
Prior art keywords
integrating sphere
temperature
pyrometer
determining
calibrated
Prior art date
Application number
AT09170604T
Other languages
English (en)
Inventor
Joerg-Thomas Zettler
Steffen Uredat
Jens Zilian
Tobias Schenk
Bernd Henninger
Marcello Binetti
Kolja Haberland
Original Assignee
Laytec Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Laytec Ag filed Critical Laytec Ag
Application granted granted Critical
Publication of ATE543081T1 publication Critical patent/ATE543081T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G01J5/0007—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0846—Optical arrangements having multiple detectors for performing different types of detection, e.g. using radiometry and reflectometry channels
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0896—Optical arrangements using a light source, e.g. for illuminating a surface
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
    • G01J5/53—Reference sources, e.g. standard lamps; Black bodies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/60—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiation Pyrometers (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AT09170604T 2009-05-12 2009-09-17 Verfahren zur kalibrierung eines pyrometers, verfahren zur bestimmung der temperatur eines halbleiterwafers und system zur bestimmung der temperatur eines halbleiterwafers ATE543081T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009003041 2009-05-12
DE102009029859 2009-06-18

Publications (1)

Publication Number Publication Date
ATE543081T1 true ATE543081T1 (de) 2012-02-15

Family

ID=41396363

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09170604T ATE543081T1 (de) 2009-05-12 2009-09-17 Verfahren zur kalibrierung eines pyrometers, verfahren zur bestimmung der temperatur eines halbleiterwafers und system zur bestimmung der temperatur eines halbleiterwafers

Country Status (4)

Country Link
US (1) US8388219B2 (de)
EP (2) EP2251658B1 (de)
KR (1) KR20100122465A (de)
AT (1) ATE543081T1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6181390A (ja) * 1984-09-28 1986-04-24 株式会社日立製作所 引込みクレ−ン
DE102010061950A1 (de) * 2010-11-25 2012-05-31 Carl Zeiss Smt Gmbh Verfahren sowie Anordnung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System
US8888360B2 (en) * 2010-12-30 2014-11-18 Veeco Instruments Inc. Methods and systems for in-situ pyrometer calibration
US20130223472A1 (en) * 2012-02-27 2013-08-29 Cvg Management Corporation Infrared temperature sensor calibration system and method
EP2660574A1 (de) * 2012-05-04 2013-11-06 LayTec AG Flache lichtemittierende Platte zur Simulation von Wärmestrahlung, Verfahren zur Kalibrierung eines Pyrometers und Verfahren zur Bestimmung der Temperatur eines Halbleiter-Wafers
KR101389003B1 (ko) * 2013-02-05 2014-04-24 에이피시스템 주식회사 온도측정 파이로미터의 교정 장치
KR101432159B1 (ko) 2013-02-05 2014-08-20 에이피시스템 주식회사 온도측정 파이로미터의 교정 장치
EP2887031B1 (de) * 2013-12-18 2020-09-16 LayTec AG Verfahren zur Kalibrierung eines Pyrometers mit zwei Wellenlängen, Verfahren zur Bestimmung der Temperatur eines Halbleiterwafers und System zur Bestimmung der Temperatur eines Halbleiterwafers
DE102013114412A1 (de) * 2013-12-18 2015-06-18 Aixtron Se Vorrichtung und Verfahren zur Regelung der Temperatur in einer Prozesskammer eines CVD-Reaktors unter Verwendung zweier Temperatursensoreinrichtungen
JP6295674B2 (ja) * 2014-01-20 2018-03-20 ウシオ電機株式会社 熱処理装置およびランプ制御方法
CN104089703A (zh) * 2014-07-09 2014-10-08 北京智朗芯光科技有限公司 半导体薄膜反应腔辅助温度校准装置
JP6403469B2 (ja) * 2014-07-11 2018-10-10 光洋サーモシステム株式会社 連続式加熱炉及び温度測定方法
DE102014117388A1 (de) 2014-11-27 2016-06-02 Aixtron Se Verfahren zum Kalibrieren einer Pyrometeranordnung eines CVD- oder PVD-Reaktors
US10190913B2 (en) 2015-08-27 2019-01-29 Zeus Co., Ltd. Substrate processing apparatus and method
CN109489811B (zh) * 2018-11-01 2021-01-05 西安应用光学研究所 一种具有黑体辐射功能的积分球
US11391634B2 (en) 2019-02-12 2022-07-19 Accure Acne, Inc. Temperature sensing apparatus for use with a photo-thermal targeted treatment system and associated methods

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1127944A (en) * 1966-03-15 1968-09-18 Ass Portland Cement Improvements relating to pyrometer
DD254114A3 (de) * 1985-07-30 1988-02-17 Univ Dresden Tech Pyrometrisches messverfahren
US4881823A (en) * 1988-03-29 1989-11-21 Purdue Research Foundation Radiation thermometry
LU87933A1 (fr) * 1991-05-02 1992-12-15 Europ Communities Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes
US5690429A (en) * 1994-12-07 1997-11-25 Ng; Daniel Method and apparatus for emissivity independent self-calibrating of a multiwavelength pyrometer
US6682216B1 (en) * 1999-12-16 2004-01-27 The Regents Of The University Of California Single-fiber multi-color pyrometry
US6666577B2 (en) * 2000-11-02 2003-12-23 Matsushita Electric Industrial Co., Ltd. Method for predicting temperature, test wafer for use in temperature prediction, and method for evaluating lamp heating system
JP2003106901A (ja) 2001-07-11 2003-04-09 Tokyo Electron Ltd 放射温度計用安定光源、放射温度計のキャリブレーション方法及び放射温度計を用いた半導体製造装置
US7734439B2 (en) * 2002-06-24 2010-06-08 Mattson Technology, Inc. System and process for calibrating pyrometers in thermal processing chambers
US7275861B2 (en) * 2005-01-31 2007-10-02 Veeco Instruments Inc. Calibration wafer and method of calibrating in situ temperatures

Also Published As

Publication number Publication date
EP2365307B1 (de) 2012-07-18
US8388219B2 (en) 2013-03-05
EP2365307A1 (de) 2011-09-14
EP2251658A1 (de) 2010-11-17
KR20100122465A (ko) 2010-11-22
US20100290500A1 (en) 2010-11-18
EP2251658B1 (de) 2012-01-25

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