ATE529823T1 - Prozessfensterbewusste detektion und korrektur von lithografischen druckproblemen auf maskenniveau - Google Patents
Prozessfensterbewusste detektion und korrektur von lithografischen druckproblemen auf maskenniveauInfo
- Publication number
- ATE529823T1 ATE529823T1 AT08738102T AT08738102T ATE529823T1 AT E529823 T1 ATE529823 T1 AT E529823T1 AT 08738102 T AT08738102 T AT 08738102T AT 08738102 T AT08738102 T AT 08738102T AT E529823 T1 ATE529823 T1 AT E529823T1
- Authority
- AT
- Austria
- Prior art keywords
- optical
- process window
- failure
- sampling point
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Accessory Devices And Overall Control Thereof (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07290703 | 2007-05-23 | ||
PCT/IB2008/051863 WO2008142604A2 (en) | 2007-05-23 | 2008-05-09 | Process-window aware detection and correction of lithographic printing issues at mask level |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE529823T1 true ATE529823T1 (de) | 2011-11-15 |
Family
ID=40002964
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT08738102T ATE529823T1 (de) | 2007-05-23 | 2008-05-09 | Prozessfensterbewusste detektion und korrektur von lithografischen druckproblemen auf maskenniveau |
Country Status (5)
Country | Link |
---|---|
US (1) | US8230371B2 (de) |
EP (1) | EP2153376B1 (de) |
CN (1) | CN101720474A (de) |
AT (1) | ATE529823T1 (de) |
WO (1) | WO2008142604A2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8103990B2 (en) * | 2008-02-28 | 2012-01-24 | Arm Limited | Characterising circuit cell performance variability in response to perturbations in manufacturing process parameters |
US8099684B2 (en) * | 2009-01-08 | 2012-01-17 | International Business Machines Corporation | Methodology of placing printing assist feature for random mask layout |
US8276102B2 (en) * | 2010-03-05 | 2012-09-25 | International Business Machines Corporation | Spatial correlation-based estimation of yield of integrated circuits |
US20120054694A1 (en) * | 2010-08-24 | 2012-03-01 | Ayman Yehia Hamouda | Aerial Image Signatures |
IT1401439B1 (it) * | 2010-08-24 | 2013-07-26 | Università Degli Studi Di Bergamo | Metodo e sistema per l'identificazione assistita di fenomeni tecnici. |
US8739076B2 (en) * | 2012-09-11 | 2014-05-27 | Synopsys, Inc. | Method and apparatus for process window modeling |
KR101924487B1 (ko) | 2013-12-17 | 2018-12-03 | 에이에스엠엘 네델란즈 비.브이. | 수율 추산 및 제어 |
CN110306156A (zh) * | 2014-06-06 | 2019-10-08 | 大日本印刷株式会社 | 蒸镀掩模及其前体、以及有机半导体元件的制造方法 |
US10339259B2 (en) * | 2014-09-26 | 2019-07-02 | Synopsys, Inc. | Method for organizing, controlling, and reporting on design mismatch information in IC physical design data |
EP3133553B1 (de) | 2015-08-17 | 2021-08-04 | Imec Vzw | Verfahren zur verifizierung eines musters von merkmalen, die von einem lithografieverfahren gedruckt wurden |
EP3385735B1 (de) * | 2017-04-04 | 2019-12-04 | Secure-IC SAS | Vorrichtung und verfahren zur erkennung von fehlerpunkten |
CN111984208B (zh) * | 2020-08-20 | 2022-10-18 | 江苏南锦电子材料有限公司 | 一种光学扩散膜片led灯条侧消光处理方法 |
WO2023169806A1 (en) * | 2022-03-09 | 2023-09-14 | Asml Netherlands B.V. | Methods, systems, and software for determination of failure rates of lithographic processes |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003526110A (ja) | 1997-09-17 | 2003-09-02 | ニューメリカル テクノロジーズ インコーポレイテッド | 設計ルールの照合システム及び方法 |
JP3615182B2 (ja) | 2001-11-26 | 2005-01-26 | 株式会社東芝 | 光近接効果補正方法及び光近接効果補正システム |
US6839125B2 (en) | 2003-02-11 | 2005-01-04 | Asml Netherlands B.V. | Method for optimizing an illumination source using full resist simulation and process window response metric |
JP4758358B2 (ja) * | 2004-01-29 | 2011-08-24 | ケーエルエー−テンカー コーポレイション | レチクル設計データにおける欠陥を検出するためのコンピュータに実装される方法 |
US7568180B2 (en) | 2004-02-26 | 2009-07-28 | Pdf Solutions | Generalization of the photo process window and its application to OPC test pattern design |
WO2005111874A2 (en) | 2004-05-07 | 2005-11-24 | Mentor Graphics Corporation | Integrated circuit layout design methodology with process variation bands |
US7418683B1 (en) * | 2005-09-21 | 2008-08-26 | Cadence Design Systems, Inc | Constraint assistant for circuit design |
US8102408B2 (en) * | 2006-06-29 | 2012-01-24 | Kla-Tencor Technologies Corp. | Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs |
-
2008
- 2008-05-09 CN CN200880017072A patent/CN101720474A/zh active Pending
- 2008-05-09 AT AT08738102T patent/ATE529823T1/de not_active IP Right Cessation
- 2008-05-09 WO PCT/IB2008/051863 patent/WO2008142604A2/en active Application Filing
- 2008-05-09 EP EP08738102A patent/EP2153376B1/de not_active Not-in-force
- 2008-05-09 US US12/597,997 patent/US8230371B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN101720474A (zh) | 2010-06-02 |
WO2008142604A2 (en) | 2008-11-27 |
EP2153376B1 (de) | 2011-10-19 |
US20100293413A1 (en) | 2010-11-18 |
WO2008142604A8 (en) | 2010-02-18 |
WO2008142604A3 (en) | 2009-02-26 |
EP2153376A2 (de) | 2010-02-17 |
US8230371B2 (en) | 2012-07-24 |
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