ATE490353T1 - Verfahren und vorrichtung zur infiltration einer struktur eines porösen materials durch chemische gasphasenabscheidung - Google Patents

Verfahren und vorrichtung zur infiltration einer struktur eines porösen materials durch chemische gasphasenabscheidung

Info

Publication number
ATE490353T1
ATE490353T1 AT08775285T AT08775285T ATE490353T1 AT E490353 T1 ATE490353 T1 AT E490353T1 AT 08775285 T AT08775285 T AT 08775285T AT 08775285 T AT08775285 T AT 08775285T AT E490353 T1 ATE490353 T1 AT E490353T1
Authority
AT
Austria
Prior art keywords
porous material
infiltration
vapor deposition
chemical vapor
face
Prior art date
Application number
AT08775285T
Other languages
English (en)
Inventor
Sebastien Donet
Fabrice Emieux
Lionel Filhol
Stephanie Thollon
Original Assignee
Commissariat Energie Atomique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of ATE490353T1 publication Critical patent/ATE490353T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Catalysts (AREA)
  • Chemical Vapour Deposition (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
AT08775285T 2007-07-25 2008-07-22 Verfahren und vorrichtung zur infiltration einer struktur eines porösen materials durch chemische gasphasenabscheidung ATE490353T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0756728A FR2919309B1 (fr) 2007-07-25 2007-07-25 Procede et dispositif d'infiltration d'une structure en materiau poreux par depot chimique en phase vapeur.
PCT/EP2008/059613 WO2009013296A1 (fr) 2007-07-25 2008-07-22 Procede et dispositif d'infiltration d'une structure en materiau poreux par depot chimique en phase vapeur

Publications (1)

Publication Number Publication Date
ATE490353T1 true ATE490353T1 (de) 2010-12-15

Family

ID=39278383

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08775285T ATE490353T1 (de) 2007-07-25 2008-07-22 Verfahren und vorrichtung zur infiltration einer struktur eines porösen materials durch chemische gasphasenabscheidung

Country Status (8)

Country Link
US (1) US8545939B2 (de)
EP (1) EP2176445B1 (de)
JP (1) JP5562847B2 (de)
AT (1) ATE490353T1 (de)
DE (1) DE602008003835D1 (de)
ES (1) ES2357360T3 (de)
FR (1) FR2919309B1 (de)
WO (1) WO2009013296A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5663728B2 (ja) * 2009-10-29 2015-02-04 小川　一文 触媒とその製造方法およびそれを用いた乗り物
US11161782B2 (en) 2017-11-30 2021-11-02 Corning Incorporated Method of increasing IOX processability on glass articles with multiple thicknesses

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2594119B1 (fr) * 1986-02-10 1988-06-03 Europ Propulsion Installation pour l'infiltration chimique en phase vapeur d'un materiau refractaire autre que le carbone
US5480678A (en) * 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes
ATE215518T1 (de) * 1994-11-16 2002-04-15 Goodrich Co B F Vorrichtung zur druckfeld cvd/cvi, verfahren und produkt
FR2733254B1 (fr) * 1995-04-18 1997-07-18 Europ Propulsion Procede d'infiltration chimique en phase vapeur pour la densification de substrats poreux disposes en piles annulaires
US6426126B1 (en) * 1997-12-19 2002-07-30 Amt Holdings, Inc. Preparation of metal coatings
DE19827844A1 (de) * 1998-06-23 1999-12-30 Aventis Res & Tech Gmbh & Co Verfahren zur Herstellung von Schalenkatalysatoren durch CVD-Beschichtung
US6669988B2 (en) * 2001-08-20 2003-12-30 Goodrich Corporation Hardware assembly for CVI/CVD processes
UA84862C2 (en) * 2003-03-03 2008-12-10 Месье-Бугатти Substrate

Also Published As

Publication number Publication date
ES2357360T3 (es) 2011-04-25
WO2009013296A1 (fr) 2009-01-29
FR2919309A1 (fr) 2009-01-30
DE602008003835D1 (de) 2011-01-13
EP2176445A1 (de) 2010-04-21
US8545939B2 (en) 2013-10-01
EP2176445B1 (de) 2010-12-01
US20100189899A1 (en) 2010-07-29
FR2919309B1 (fr) 2011-07-22
JP5562847B2 (ja) 2014-07-30
JP2010534126A (ja) 2010-11-04

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