ATE486152T1 - Gasverteiler mit einem strömungsteiler - Google Patents

Gasverteiler mit einem strömungsteiler

Info

Publication number
ATE486152T1
ATE486152T1 AT06251531T AT06251531T ATE486152T1 AT E486152 T1 ATE486152 T1 AT E486152T1 AT 06251531 T AT06251531 T AT 06251531T AT 06251531 T AT06251531 T AT 06251531T AT E486152 T1 ATE486152 T1 AT E486152T1
Authority
AT
Austria
Prior art keywords
flow
cross
gas distributor
flow divider
section dimension
Prior art date
Application number
AT06251531T
Other languages
English (en)
Inventor
Walter E Olson
Mathew C Gartland
Original Assignee
United Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Technologies Corp filed Critical United Technologies Corp
Application granted granted Critical
Publication of ATE486152T1 publication Critical patent/ATE486152T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C23C16/12—Deposition of aluminium only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles
AT06251531T 2005-03-24 2006-03-22 Gasverteiler mit einem strömungsteiler ATE486152T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/089,989 US20060216415A1 (en) 2005-03-24 2005-03-24 Vapor aluminide coating gas manifold

Publications (1)

Publication Number Publication Date
ATE486152T1 true ATE486152T1 (de) 2010-11-15

Family

ID=36522763

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06251531T ATE486152T1 (de) 2005-03-24 2006-03-22 Gasverteiler mit einem strömungsteiler

Country Status (7)

Country Link
US (1) US20060216415A1 (de)
EP (1) EP1705262B1 (de)
JP (1) JP4328776B2 (de)
CN (1) CN1837403A (de)
AT (1) ATE486152T1 (de)
DE (1) DE602006017766D1 (de)
SG (1) SG126093A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8020378B2 (en) * 2004-12-29 2011-09-20 Umicore Ag & Co. Kg Exhaust manifold comprising aluminide
US7763326B2 (en) 2006-12-20 2010-07-27 United Technologies Corporation Photocurable maskant composition and method of use
US20090035485A1 (en) * 2007-08-02 2009-02-05 United Technologies Corporation Method for forming active-element aluminide diffusion coatings
US20090134035A1 (en) * 2007-08-02 2009-05-28 United Technologies Corporation Method for forming platinum aluminide diffusion coatings
US20090136664A1 (en) * 2007-08-02 2009-05-28 United Technologies Corporation Method for forming aluminide diffusion coatings
WO2013182878A2 (en) * 2012-06-07 2013-12-12 Soitec Gas injection components for deposition systems, deposition systems including such components, and related methods
US11414759B2 (en) * 2013-11-29 2022-08-16 Taiwan Semiconductor Manufacturing Co., Ltd Mechanisms for supplying process gas into wafer process apparatus

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4731004A (en) * 1984-10-12 1988-03-15 Princeton Packaging, Inc. Side-by-side co-extrusion of film using multiple materials
EP0595159B1 (de) * 1992-10-26 1997-12-29 Schott Glaswerke Verfahren und Vorrichtung zur Beschichtung der Innenfläche stark gewölbter im wesentlichen kalottenförmiger Substrate mittels CVD
US5911212A (en) * 1996-05-20 1999-06-15 Benson; Steven R. Priority valve for an intercooled engine
US5800408A (en) * 1996-11-08 1998-09-01 Micro Therapeutics, Inc. Infusion device for distributing infusate along an elongated infusion segment
US5928725A (en) * 1997-07-18 1999-07-27 Chromalloy Gas Turbine Corporation Method and apparatus for gas phase coating complex internal surfaces of hollow articles
US6267664B1 (en) * 2000-09-01 2001-07-31 Alphonse J. Vandale Exterior side view mirror and side window defogger system
US6905547B1 (en) * 2000-12-21 2005-06-14 Genus, Inc. Method and apparatus for flexible atomic layer deposition
US6843882B2 (en) * 2002-07-15 2005-01-18 Applied Materials, Inc. Gas flow control in a wafer processing system having multiple chambers for performing same process
US6929825B2 (en) * 2003-02-04 2005-08-16 General Electric Company Method for aluminide coating of gas turbine engine blade
KR101332739B1 (ko) * 2005-01-18 2013-11-25 에이에스엠 아메리카, 인코포레이티드 박막 성장용 반응 시스템

Also Published As

Publication number Publication date
DE602006017766D1 (de) 2010-12-09
EP1705262A1 (de) 2006-09-27
JP2006265733A (ja) 2006-10-05
CN1837403A (zh) 2006-09-27
US20060216415A1 (en) 2006-09-28
JP4328776B2 (ja) 2009-09-09
EP1705262B1 (de) 2010-10-27
SG126093A1 (en) 2006-10-30

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Legal Events

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