JP4328776B2 - 蒸気アルミニド被覆ガスマニホールド、被覆システムおよび被覆プロセス - Google Patents
蒸気アルミニド被覆ガスマニホールド、被覆システムおよび被覆プロセス Download PDFInfo
- Publication number
- JP4328776B2 JP4328776B2 JP2006082900A JP2006082900A JP4328776B2 JP 4328776 B2 JP4328776 B2 JP 4328776B2 JP 2006082900 A JP2006082900 A JP 2006082900A JP 2006082900 A JP2006082900 A JP 2006082900A JP 4328776 B2 JP4328776 B2 JP 4328776B2
- Authority
- JP
- Japan
- Prior art keywords
- flow
- manifold
- coating
- gas
- cross
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
- C23C16/12—Deposition of aluminium only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45591—Fixed means, e.g. wings, baffles
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
- Polarising Elements (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
12…内部通路
14…ワークピース
16…根元部
18…プラットホーム
20…エーロフォイル部
22…開口部
24…基部
26…出口冷却孔
28…翼端
30…前縁
32…後縁
34、66…アルミニド被覆ガス供給源
36…流れマニホールド
38…入口
40…内部チャンバー
42…流れダイバータ
44…第一のセクション
46…第二のセクション
48…第一の部分
50…前縁
52…第二の部分
54…内部表面
60…前縁通路
62…中間本体通路
64…後縁通路
68…第一の流れマニホールド
70…第二の流れマニホールド
72…入口
Claims (12)
- ワークピース内のさまざまな大きさの通路を被覆するためのプロセスに使用するためのマニホールドであって、
内部チャンバーと、
被覆ガスの流れを受け入れるための入口と、
内部チャンバー内にあり、第一の断面寸法を有する第一の内部通路の組の表面の全長を被覆するのに十分な第一の流れと、第一の断面寸法より小さな第二の断面寸法を有する第二の内部通路の組の表面の全長を被覆するのに十分な第二の流れとに、被覆ガスの流れを分離する手段と、
を備えることを特徴とするマニホールド。 - 前記流れ分離は、流れダイバータを備えることを特徴とする請求項1記載のマニホールド。
- 前記流れダイバータは、前記チャンバー内で固定されていることを特徴とする請求項2記載のマニホールド。
- 前記流れダイバータは、前記チャンバー内で可動であることを特徴とする請求項2記載のマニホールド。
- 前記流れダイバータは、前記入口内に延在する第一の部分と、この第一の部分に対して角度が付けられている第二の部分とを有し、前記マニホールドは、出口を有しており、前記第二の部分は、前記第一の部分からこの出口のごく近傍の点まで延在することを特徴とする請求項2記載のマニホールド。
- ワークピースの内部通路を被覆するためのシステムであって、
被覆ガスの供給源と、
この被覆ガスの供給源および前記ワークピースに接続されたマニホールドと、
を備えており、前記マニホールドは、内部チャンバーと、被覆ガスの流れを受け入れるための入口と、内部チャンバー内にあり、第一の断面寸法を有する第一の内部通路の組の表面の全長を被覆するのに十分な第一の流れと、第一の断面寸法より小さな第二の断面寸法を有する第二の内部通路の組の表面の全長を被覆するのに十分な第二の流れとに、被覆ガスの流れを分離する手段とを備えることを特徴とするシステム。 - 前記被覆ガスの供給源は、ハロゲン化アルミニウムガスの供給源を含むことを特徴とする請求項6記載のシステム。
- 前記被覆ガスの供給源は、AlF3の供給源を含むことを特徴とする請求項6記載のシステム。
- 前記流れ分離は、流れダイバータを備えることを特徴とする請求項6記載のシステム。
- 前記流れダイバータは、前記チャンバー内で固定されていることを特徴とする請求項9記載のシステム。
- 前記流れダイバータは、前記チャンバー内で可動であることを特徴とする請求項9記載のシステム。
- 前記流れダイバータは、前記入口内に延在する第一の部分と、この第一の部分に対して角度が付けられている第二の部分とを有し、前記マニホールドは、出口を有しており、前記第二の部分は、前記第一の部分からこの出口のごく近傍の点まで延在することを特徴とする請求項9記載のシステム。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/089,989 US20060216415A1 (en) | 2005-03-24 | 2005-03-24 | Vapor aluminide coating gas manifold |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006265733A JP2006265733A (ja) | 2006-10-05 |
JP4328776B2 true JP4328776B2 (ja) | 2009-09-09 |
Family
ID=36522763
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006082900A Expired - Fee Related JP4328776B2 (ja) | 2005-03-24 | 2006-03-24 | 蒸気アルミニド被覆ガスマニホールド、被覆システムおよび被覆プロセス |
Country Status (7)
Country | Link |
---|---|
US (1) | US20060216415A1 (ja) |
EP (1) | EP1705262B1 (ja) |
JP (1) | JP4328776B2 (ja) |
CN (1) | CN1837403A (ja) |
AT (1) | ATE486152T1 (ja) |
DE (1) | DE602006017766D1 (ja) |
SG (1) | SG126093A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8020378B2 (en) * | 2004-12-29 | 2011-09-20 | Umicore Ag & Co. Kg | Exhaust manifold comprising aluminide |
US7763326B2 (en) | 2006-12-20 | 2010-07-27 | United Technologies Corporation | Photocurable maskant composition and method of use |
US20090134035A1 (en) * | 2007-08-02 | 2009-05-28 | United Technologies Corporation | Method for forming platinum aluminide diffusion coatings |
US20090136664A1 (en) * | 2007-08-02 | 2009-05-28 | United Technologies Corporation | Method for forming aluminide diffusion coatings |
US20090035485A1 (en) * | 2007-08-02 | 2009-02-05 | United Technologies Corporation | Method for forming active-element aluminide diffusion coatings |
US20150099065A1 (en) * | 2012-06-07 | 2015-04-09 | Soitec | Gas injection components for deposition systems, deposition systems including such components, and related methods |
US11414759B2 (en) * | 2013-11-29 | 2022-08-16 | Taiwan Semiconductor Manufacturing Co., Ltd | Mechanisms for supplying process gas into wafer process apparatus |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4731004A (en) * | 1984-10-12 | 1988-03-15 | Princeton Packaging, Inc. | Side-by-side co-extrusion of film using multiple materials |
EP0595159B1 (de) * | 1992-10-26 | 1997-12-29 | Schott Glaswerke | Verfahren und Vorrichtung zur Beschichtung der Innenfläche stark gewölbter im wesentlichen kalottenförmiger Substrate mittels CVD |
US5911212A (en) * | 1996-05-20 | 1999-06-15 | Benson; Steven R. | Priority valve for an intercooled engine |
US5800408A (en) * | 1996-11-08 | 1998-09-01 | Micro Therapeutics, Inc. | Infusion device for distributing infusate along an elongated infusion segment |
US5928725A (en) * | 1997-07-18 | 1999-07-27 | Chromalloy Gas Turbine Corporation | Method and apparatus for gas phase coating complex internal surfaces of hollow articles |
US6267664B1 (en) * | 2000-09-01 | 2001-07-31 | Alphonse J. Vandale | Exterior side view mirror and side window defogger system |
US6905547B1 (en) * | 2000-12-21 | 2005-06-14 | Genus, Inc. | Method and apparatus for flexible atomic layer deposition |
US6843882B2 (en) * | 2002-07-15 | 2005-01-18 | Applied Materials, Inc. | Gas flow control in a wafer processing system having multiple chambers for performing same process |
US6929825B2 (en) * | 2003-02-04 | 2005-08-16 | General Electric Company | Method for aluminide coating of gas turbine engine blade |
US8211230B2 (en) * | 2005-01-18 | 2012-07-03 | Asm America, Inc. | Reaction system for growing a thin film |
-
2005
- 2005-03-24 US US11/089,989 patent/US20060216415A1/en not_active Abandoned
-
2006
- 2006-03-20 SG SG200601825A patent/SG126093A1/en unknown
- 2006-03-22 EP EP06251531A patent/EP1705262B1/en not_active Not-in-force
- 2006-03-22 AT AT06251531T patent/ATE486152T1/de not_active IP Right Cessation
- 2006-03-22 DE DE602006017766T patent/DE602006017766D1/de active Active
- 2006-03-23 CN CNA2006100676715A patent/CN1837403A/zh active Pending
- 2006-03-24 JP JP2006082900A patent/JP4328776B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
ATE486152T1 (de) | 2010-11-15 |
JP2006265733A (ja) | 2006-10-05 |
EP1705262B1 (en) | 2010-10-27 |
EP1705262A1 (en) | 2006-09-27 |
SG126093A1 (en) | 2006-10-30 |
US20060216415A1 (en) | 2006-09-28 |
CN1837403A (zh) | 2006-09-27 |
DE602006017766D1 (de) | 2010-12-09 |
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