ATE480800T1 - Alkalischer entwickler für strahlungsempfindliche zusammensetzungen - Google Patents

Alkalischer entwickler für strahlungsempfindliche zusammensetzungen

Info

Publication number
ATE480800T1
ATE480800T1 AT05103878T AT05103878T ATE480800T1 AT E480800 T1 ATE480800 T1 AT E480800T1 AT 05103878 T AT05103878 T AT 05103878T AT 05103878 T AT05103878 T AT 05103878T AT E480800 T1 ATE480800 T1 AT E480800T1
Authority
AT
Austria
Prior art keywords
developer
radiation sensitive
sensitive compositions
alkaline developer
alkaline
Prior art date
Application number
AT05103878T
Other languages
English (en)
Inventor
Willi-Kurt Gries
Damme Marc Van
Mario Boxhorn
Pascla Meeus
Original Assignee
Agfa Graphics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Graphics Nv filed Critical Agfa Graphics Nv
Application granted granted Critical
Publication of ATE480800T1 publication Critical patent/ATE480800T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
AT05103878T 2005-05-10 2005-05-10 Alkalischer entwickler für strahlungsempfindliche zusammensetzungen ATE480800T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05103878A EP1722274B1 (de) 2005-05-10 2005-05-10 Alkalischer Entwickler für strahlungsempfindliche Zusammensetzungen

Publications (1)

Publication Number Publication Date
ATE480800T1 true ATE480800T1 (de) 2010-09-15

Family

ID=36168413

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05103878T ATE480800T1 (de) 2005-05-10 2005-05-10 Alkalischer entwickler für strahlungsempfindliche zusammensetzungen

Country Status (3)

Country Link
EP (1) EP1722274B1 (de)
AT (1) ATE480800T1 (de)
DE (1) DE602005023417D1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BRPI0811197B1 (pt) 2007-05-25 2019-04-02 Agfa Nv Precursor de placa de impressão litográfica, processo para a preparação de misturas de sensibilizantes e método para manufaturar uma placa de impressão
EP2031448B1 (de) * 2007-08-27 2011-10-19 Agfa Graphics N.V. Verfahren zur Entwicklung einer wärmeempfindlichen Lithographiedruckplatte mit einer wässrigen alkalischen Entwicklerlösung
EP2225612B1 (de) * 2007-12-19 2016-11-16 Agfa Graphics N.V. Verfahren zur herstellung von vorläufern lithographischer druckplatten
EP2095948B1 (de) * 2008-02-28 2010-09-15 Agfa Graphics N.V. Verfahren zur Herstellung einer Lithografiedruckplatte
JP5346755B2 (ja) * 2009-09-24 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5635328A (en) * 1993-08-21 1997-06-03 Konica Corporation Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound
US6248506B1 (en) * 1998-12-04 2001-06-19 Nichigo-Morton Aqueous developing solutions for reduced developer residue
EP1172699B1 (de) * 2000-07-14 2013-09-11 FUJIFILM Corporation Verfahren zur Herstellung lithographischer Druckplatten
US6887654B2 (en) * 2002-05-07 2005-05-03 Shipley Company, L.L.C. Residue and scum reducing composition and method

Also Published As

Publication number Publication date
DE602005023417D1 (de) 2010-10-21
EP1722274B1 (de) 2010-09-08
EP1722274A1 (de) 2006-11-15

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Legal Events

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