ATE469729T1 - System zur magnetorheologischen feinstbearbeitung von substraten - Google Patents

System zur magnetorheologischen feinstbearbeitung von substraten

Info

Publication number
ATE469729T1
ATE469729T1 AT02707621T AT02707621T ATE469729T1 AT E469729 T1 ATE469729 T1 AT E469729T1 AT 02707621 T AT02707621 T AT 02707621T AT 02707621 T AT02707621 T AT 02707621T AT E469729 T1 ATE469729 T1 AT E469729T1
Authority
AT
Austria
Prior art keywords
wheel
finishing
spherical
substrates
sphere
Prior art date
Application number
AT02707621T
Other languages
English (en)
Inventor
William Kordonski
Stephen Hogan
Jerry Carapella
Andrew Price
Original Assignee
Qed Technologies International
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qed Technologies International filed Critical Qed Technologies International
Application granted granted Critical
Publication of ATE469729T1 publication Critical patent/ATE469729T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
    • B24B31/112—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Liquid Crystal (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
AT02707621T 2001-02-01 2002-01-31 System zur magnetorheologischen feinstbearbeitung von substraten ATE469729T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/775,282 US6506102B2 (en) 2001-02-01 2001-02-01 System for magnetorheological finishing of substrates
PCT/US2002/002667 WO2002060646A1 (en) 2001-02-01 2002-01-31 System for magnetorheological finishing of substrates

Publications (1)

Publication Number Publication Date
ATE469729T1 true ATE469729T1 (de) 2010-06-15

Family

ID=25103919

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02707621T ATE469729T1 (de) 2001-02-01 2002-01-31 System zur magnetorheologischen feinstbearbeitung von substraten

Country Status (7)

Country Link
US (1) US6506102B2 (de)
EP (1) EP1365889B1 (de)
JP (1) JP4105950B2 (de)
AT (1) ATE469729T1 (de)
DE (1) DE60236577D1 (de)
ES (1) ES2344340T3 (de)
WO (1) WO2002060646A1 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040210289A1 (en) * 2002-03-04 2004-10-21 Xingwu Wang Novel nanomagnetic particles
US7162302B2 (en) * 2002-03-04 2007-01-09 Nanoset Llc Magnetically shielded assembly
US7091412B2 (en) * 2002-03-04 2006-08-15 Nanoset, Llc Magnetically shielded assembly
US6746310B2 (en) * 2002-08-06 2004-06-08 Qed Technologies, Inc. Uniform thin films produced by magnetorheological finishing
US20060102871A1 (en) * 2003-04-08 2006-05-18 Xingwu Wang Novel composition
US20070010702A1 (en) * 2003-04-08 2007-01-11 Xingwu Wang Medical device with low magnetic susceptibility
US20050079132A1 (en) * 2003-04-08 2005-04-14 Xingwu Wang Medical device with low magnetic susceptibility
US20050149169A1 (en) * 2003-04-08 2005-07-07 Xingwu Wang Implantable medical device
US20050025797A1 (en) * 2003-04-08 2005-02-03 Xingwu Wang Medical device with low magnetic susceptibility
US20050149002A1 (en) * 2003-04-08 2005-07-07 Xingwu Wang Markers for visualizing interventional medical devices
US20050155779A1 (en) * 2003-04-08 2005-07-21 Xingwu Wang Coated substrate assembly
US20050119725A1 (en) * 2003-04-08 2005-06-02 Xingwu Wang Energetically controlled delivery of biologically active material from an implanted medical device
US20040254419A1 (en) * 2003-04-08 2004-12-16 Xingwu Wang Therapeutic assembly
US20070149496A1 (en) * 2003-10-31 2007-06-28 Jack Tuszynski Water-soluble compound
US20050249667A1 (en) * 2004-03-24 2005-11-10 Tuszynski Jack A Process for treating a biological organism
US20060118758A1 (en) * 2004-09-15 2006-06-08 Xingwu Wang Material to enable magnetic resonance imaging of implantable medical devices
US7959490B2 (en) 2005-10-31 2011-06-14 Depuy Products, Inc. Orthopaedic component manufacturing method and equipment
US7312154B2 (en) * 2005-12-20 2007-12-25 Corning Incorporated Method of polishing a semiconductor-on-insulator structure
CN102341216B (zh) * 2009-03-06 2013-12-18 Qed技术国际股份有限公司 用于基材的磁流变抛光的系统
WO2011115131A1 (ja) 2010-03-16 2011-09-22 旭硝子株式会社 Ｅｕｖリソグラフィ光学部材用基材およびその製造方法
US9102030B2 (en) 2010-07-09 2015-08-11 Corning Incorporated Edge finishing apparatus
US8896293B2 (en) * 2010-12-23 2014-11-25 Qed Technologies International, Inc. Method and apparatus for measurement and control of magnetic particle concentration in a magnetorheological fluid
US8613640B2 (en) * 2010-12-23 2013-12-24 Qed Technologies International, Inc. System for magnetorheological finishing of substrates
CN103447891B (zh) * 2013-08-26 2015-12-09 中国科学院光电技术研究所 一种磁流变高精度定位装置及磁流变去除函数转换方法
CN111230602B (zh) * 2020-02-17 2021-07-09 辽宁科技大学 一种自识别多角度磁极头化学磁粒研磨加工装置
CN113352152B (zh) * 2020-02-20 2022-12-06 中国科学院长春光学精密机械与物理研究所 一种基于机械臂的磁流变抛光加工系统
CN113664698B (zh) * 2021-09-14 2022-06-10 浙江师范大学 一种磁控模量平面抛光装置及抛光方法
CN120791614B (zh) * 2025-09-11 2025-12-23 上海大学 用于磁流变抛光的外转气浮轴承支撑一体式的抛光装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5795212A (en) * 1995-10-16 1998-08-18 Byelocorp Scientific, Inc. Deterministic magnetorheological finishing
US5951369A (en) 1999-01-06 1999-09-14 Qed Technologies, Inc. System for magnetorheological finishing of substrates

Also Published As

Publication number Publication date
EP1365889B1 (de) 2010-06-02
EP1365889A4 (de) 2004-11-03
WO2002060646A1 (en) 2002-08-08
EP1365889A1 (de) 2003-12-03
US6506102B2 (en) 2003-01-14
DE60236577D1 (de) 2010-07-15
ES2344340T3 (es) 2010-08-25
JP4105950B2 (ja) 2008-06-25
JP2004520948A (ja) 2004-07-15
US20020102928A1 (en) 2002-08-01

Similar Documents

Publication Publication Date Title
ATE469729T1 (de) System zur magnetorheologischen feinstbearbeitung von substraten
CN102341216B (zh) 用于基材的磁流变抛光的系统
Hsiao et al. Purification and characterization of an aspartic protease from the Rhizopus oryzae protease extract, Peptidase R
Konrad et al. Inhibition of phenylalanine tRNA synthetase from Bacillus subtilis by ochratoxin A
WO2002098548A1 (fr) Dispositif de melange rotatif de type mouvement a trois dimensions
TW200516132A (en) Abrasive particles for chemical mechanical polishing
ATE323214T1 (de) Erniedrigung von mineralsalzabsetzung
EP0852389A3 (de) Magnetfeldverstärkte Plasmakammer mit ungleichmässiger Magnetfeld
Kumar et al. Supermacroporous cryogel matrix for integrated protein isolation: immobilized metal affinity chromatographic purification of urokinase from cell culture broth of a human kidney cell line
EP1227912A4 (de) Verfahren und vorrichtung zum planarisieren von mikroelektronischem substratenaufbau
DE50203361D1 (de) System zur separation von magnetisch anziehbaren partikeln
Sales et al. Integrated process production and extraction of the fibrinolytic protease from Bacillus sp. UFPEDA 485
WO2002016075A3 (en) Cmp apparatus with an oscillating polishing pad rotating in the opposite direction of the wafer
KR20150026887A (ko) 드레싱 장치 및 그것을 구비한 화학적 기계적 연마 장치, 그것에 사용하는 드레서 디스크
NZ542001A (en) Waterways lime spreader
WO2003020839A8 (en) Polishing composition
Sukul et al. A water-soluble metal–organic complex array as a multinuclear heterometallic peptide amphiphile that shows unconventional anion dependency in its self-assembly
Ha et al. Immobilization of hexa-arginine tagged esterase onto carboxylated gold nanoparticles
JPH05208791A (ja) 永久磁石式磁気運搬具
US9505706B2 (en) Preparation of lipoamino acids and lipopeptides using salts as co-reactants
Umetsu et al. Production, purification, and properties of serine carboxypeptidase from Paecilomyces carneus
CN205734380U (zh) 一种平动抛光机
SU1240561A1 (ru) Способ очистки абразивного круга при шлифовании ферромагнитных материалов
CN212815704U (zh) 一种磁性负离子水杯
Tzougraki et al. New fluorogenic substrates for the determination of post-proline endopeptidase activity

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties