ATE299957T1 - Verfahren und vorrichtung zur behandlung eines werkstoffes mit elektromagnetischer strahlung in einer kontrollierten atmosphäre - Google Patents
Verfahren und vorrichtung zur behandlung eines werkstoffes mit elektromagnetischer strahlung in einer kontrollierten atmosphäreInfo
- Publication number
- ATE299957T1 ATE299957T1 AT00410038T AT00410038T ATE299957T1 AT E299957 T1 ATE299957 T1 AT E299957T1 AT 00410038 T AT00410038 T AT 00410038T AT 00410038 T AT00410038 T AT 00410038T AT E299957 T1 ATE299957 T1 AT E299957T1
- Authority
- AT
- Austria
- Prior art keywords
- radiation
- controlled atmosphere
- treatment
- treating
- deposit
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9905413A FR2792774B1 (fr) | 1999-04-26 | 1999-04-26 | Procede et dispositif de traitement d'un materiau par rayonnement electromagnetique et sous atmosphere controlee |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE299957T1 true ATE299957T1 (de) | 2005-08-15 |
Family
ID=9544997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00410038T ATE299957T1 (de) | 1999-04-26 | 2000-04-14 | Verfahren und vorrichtung zur behandlung eines werkstoffes mit elektromagnetischer strahlung in einer kontrollierten atmosphäre |
Country Status (7)
Country | Link |
---|---|
US (1) | US6259066B1 (de) |
EP (1) | EP1048747B1 (de) |
JP (1) | JP2001023916A (de) |
KR (1) | KR100607895B1 (de) |
AT (1) | ATE299957T1 (de) |
DE (1) | DE60021302T2 (de) |
FR (1) | FR2792774B1 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100267155B1 (ko) * | 1996-09-13 | 2000-10-16 | 아끼구사 나오유끼 | 반도체 장치의 제조 방법 및 제조 장치 |
DE10060987B4 (de) * | 2000-09-22 | 2006-08-03 | Schott Ag | Verfahren und Vorrichtung zum Keramisieren des Ausgangsglases einer Glaskeramik sowie Verwendungen von Verfahren und Vorrichtung |
US8536492B2 (en) * | 2003-10-27 | 2013-09-17 | Applied Materials, Inc. | Processing multilayer semiconductors with multiple heat sources |
US20080090309A1 (en) * | 2003-10-27 | 2008-04-17 | Ranish Joseph M | Controlled annealing method |
US20060032846A1 (en) * | 2004-07-27 | 2006-02-16 | Dieter Haas | Infrared heating element and a substrate type vacuum chamber, particularly for vacuum coating facilities |
US20140003800A1 (en) * | 2004-09-24 | 2014-01-02 | Applied Materials, Inc. | Processing multilayer semiconductors with multiple heat sources |
KR101233059B1 (ko) * | 2005-06-22 | 2013-02-13 | 액셀리스 테크놀로지스, 인크. | 유전 물질을 처리하는 장치 및 프로세스 |
US7547633B2 (en) * | 2006-05-01 | 2009-06-16 | Applied Materials, Inc. | UV assisted thermal processing |
US7822324B2 (en) | 2006-08-14 | 2010-10-26 | Applied Materials, Inc. | Load lock chamber with heater in tube |
TWM413957U (en) * | 2010-10-27 | 2011-10-11 | Tangteck Equipment Inc | Diffusion furnace apparatus |
KR101224059B1 (ko) * | 2012-02-28 | 2013-01-21 | (주)앤피에스 | 기판 처리 장치 및 그 처리 방법 |
TWI494174B (zh) * | 2012-05-16 | 2015-08-01 | Kern Energy Entpr Co Ltd | 基板表面處理設備 |
US20170194162A1 (en) * | 2016-01-05 | 2017-07-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor manufacturing equipment and method for treating wafer |
DE102020208184A1 (de) | 2020-06-30 | 2021-12-30 | Singulus Technologies Aktiengesellschaft | Heizsystem und Verfahren zum Aufheizen von großflächigen Substraten |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58158914A (ja) * | 1982-03-16 | 1983-09-21 | Semiconductor Res Found | 半導体製造装置 |
CH670171A5 (de) | 1986-07-22 | 1989-05-12 | Bbc Brown Boveri & Cie | |
US5441569A (en) * | 1993-11-29 | 1995-08-15 | The United States Of America As Represented By The United States Department Of Energy | Apparatus and method for laser deposition of durable coatings |
US5863327A (en) * | 1997-02-10 | 1999-01-26 | Micron Technology, Inc. | Apparatus for forming materials |
-
1999
- 1999-04-26 FR FR9905413A patent/FR2792774B1/fr not_active Expired - Lifetime
-
2000
- 2000-04-14 EP EP00410038A patent/EP1048747B1/de not_active Expired - Lifetime
- 2000-04-14 AT AT00410038T patent/ATE299957T1/de active
- 2000-04-14 DE DE60021302T patent/DE60021302T2/de not_active Expired - Lifetime
- 2000-04-21 US US09/556,956 patent/US6259066B1/en not_active Expired - Lifetime
- 2000-04-24 KR KR1020000021626A patent/KR100607895B1/ko not_active IP Right Cessation
- 2000-04-26 JP JP2000126361A patent/JP2001023916A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2792774A1 (fr) | 2000-10-27 |
DE60021302T2 (de) | 2006-05-24 |
US6259066B1 (en) | 2001-07-10 |
EP1048747B1 (de) | 2005-07-20 |
FR2792774B1 (fr) | 2003-08-01 |
JP2001023916A (ja) | 2001-01-26 |
DE60021302D1 (de) | 2005-08-25 |
KR20010014814A (ko) | 2001-02-26 |
EP1048747A1 (de) | 2000-11-02 |
KR100607895B1 (ko) | 2006-08-03 |
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