ATE2581T1 - Lichtempfindliches gemisch. - Google Patents
Lichtempfindliches gemisch.Info
- Publication number
- ATE2581T1 ATE2581T1 AT79101994T AT79101994T ATE2581T1 AT E2581 T1 ATE2581 T1 AT E2581T1 AT 79101994 T AT79101994 T AT 79101994T AT 79101994 T AT79101994 T AT 79101994T AT E2581 T1 ATE2581 T1 AT E2581T1
- Authority
- AT
- Austria
- Prior art keywords
- carbon atoms
- optionally substituted
- naphthoquinone
- group
- atoms
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 abstract 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 3
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 abstract 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- 125000003342 alkenyl group Chemical group 0.000 abstract 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 125000001246 bromo group Chemical group Br* 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical class [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 125000005017 substituted alkenyl group Chemical group 0.000 abstract 1
- 125000000547 substituted alkyl group Chemical group 0.000 abstract 1
- 125000005346 substituted cycloalkyl group Chemical group 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Luminescent Compositions (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Electroluminescent Light Sources (AREA)
- Photoreceptors In Electrophotography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19782828037 DE2828037A1 (de) | 1978-06-26 | 1978-06-26 | Lichtempfindliches gemisch |
| EP79101994A EP0006561B1 (de) | 1978-06-26 | 1979-06-18 | Lichtempfindliches Gemisch |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE2581T1 true ATE2581T1 (de) | 1983-03-15 |
Family
ID=6042817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT79101994T ATE2581T1 (de) | 1978-06-26 | 1979-06-18 | Lichtempfindliches gemisch. |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4266001A (en, 2012) |
| EP (1) | EP0006561B1 (en, 2012) |
| JP (1) | JPS556397A (en, 2012) |
| AT (1) | ATE2581T1 (en, 2012) |
| AU (1) | AU521070B2 (en, 2012) |
| BR (1) | BR7904034A (en, 2012) |
| CA (1) | CA1113108A (en, 2012) |
| DE (2) | DE2828037A1 (en, 2012) |
| IE (1) | IE48185B1 (en, 2012) |
| IL (1) | IL57623A (en, 2012) |
| PT (1) | PT69817A (en, 2012) |
| ZA (1) | ZA793154B (en, 2012) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6026550B2 (ja) * | 1976-07-31 | 1985-06-24 | 一郎 高木 | バリカン用定規 |
| DE3039926A1 (de) * | 1980-10-23 | 1982-05-27 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial |
| DE3040156A1 (de) * | 1980-10-24 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
| DE3100856A1 (de) * | 1981-01-14 | 1982-08-12 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
| DE3124936A1 (de) * | 1981-06-25 | 1983-01-20 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
| DE3127754A1 (de) * | 1981-07-14 | 1983-02-03 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
| US4526856A (en) * | 1983-05-23 | 1985-07-02 | Allied Corporation | Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents |
| JPS59187340A (ja) * | 1983-08-01 | 1984-10-24 | Kimoto & Co Ltd | 感光性組成物 |
| EP0147596A3 (en) * | 1983-12-30 | 1987-03-04 | International Business Machines Corporation | A positive lithographic resist composition |
| EP0164083B1 (de) * | 1984-06-07 | 1991-05-02 | Hoechst Aktiengesellschaft | Positiv arbeitende strahlungsempfindliche Beschichtungslösung |
| US5066561A (en) * | 1984-06-11 | 1991-11-19 | Hoechst Celanese Corporation | Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate |
| US5143814A (en) * | 1984-06-11 | 1992-09-01 | Hoechst Celanese Corporation | Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate |
| GB8430377D0 (en) * | 1984-12-01 | 1985-01-09 | Ciba Geigy Ag | Modified phenolic resins |
| DE3445276A1 (de) * | 1984-12-12 | 1986-06-19 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform |
| GB8505402D0 (en) * | 1985-03-02 | 1985-04-03 | Ciba Geigy Ag | Modified phenolic resins |
| DE3629122A1 (de) * | 1986-08-27 | 1988-03-10 | Hoechst Ag | Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch |
| DE3718416A1 (de) * | 1987-06-02 | 1988-12-15 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung |
| DE3729035A1 (de) * | 1987-08-31 | 1989-03-09 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial |
| JP2552900B2 (ja) * | 1988-06-07 | 1996-11-13 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
| US5238775A (en) * | 1990-02-20 | 1993-08-24 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition |
| DE4126836A1 (de) * | 1991-08-14 | 1993-02-18 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche |
| DE4335425A1 (de) * | 1993-10-18 | 1995-04-20 | Hoechst Ag | Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial |
| JP2002278056A (ja) * | 2001-03-16 | 2002-09-27 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
| US20040038152A1 (en) * | 2002-07-15 | 2004-02-26 | Goodin Jonathan W. | Method for making printing plate by inkjet deposition on positive-working media |
| AU2003292816A1 (en) * | 2002-12-26 | 2004-07-22 | Ube Industries, Ltd. | Bisphenol compound and aromatic polyaryl ether |
| DE602006009919D1 (de) * | 2006-08-03 | 2009-12-03 | Agfa Graphics Nv | Flachdruckplattenträger |
| ES2344668T3 (es) | 2007-11-30 | 2010-09-02 | Agfa Graphics N.V. | Metodo para tratar una plancha de impresion litografica. |
| ES2430562T3 (es) | 2008-03-04 | 2013-11-21 | Agfa Graphics N.V. | Método para la fabricación de un soporte de una plancha de impresión litográfica |
| ATE514561T1 (de) | 2008-03-31 | 2011-07-15 | Agfa Graphics Nv | Verfahren zur behandlung einer lithografischen druckplatte |
| KR101146622B1 (ko) * | 2009-08-31 | 2012-05-16 | 금호석유화학 주식회사 | 감광성 화합물 및 이를 포함하는 감광성 조성물 |
| EP3032334B1 (en) | 2014-12-08 | 2017-10-18 | Agfa Graphics Nv | A system for reducing ablation debris |
| EP3429850A1 (en) | 2016-03-16 | 2019-01-23 | Agfa Nv | Method and apparatus for processing a lithographic printing plate |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE510151A (en, 2012) * | 1949-07-23 | |||
| DE872154C (de) * | 1950-12-23 | 1953-03-30 | Kalle & Co Ag | Photomechanisches Verfahren zur Herstellung von Bildern und Druckformen mit Hilfe von Diazoverbindungen |
| BE586713A (en, 2012) * | 1959-01-21 | |||
| DE1114705C2 (de) * | 1959-04-16 | 1962-04-12 | Kalle Ag | Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen |
| DE1543721A1 (de) * | 1966-07-27 | 1969-09-11 | Kalle Ag | Naphthochinondiazidsulfosaeureester und Verfahren zu seiner Herstellung und Verfahren zur Herstellung eines den Ester enthaltenden lagerfaehigen lichtempfindlichen Materials |
| US3669658A (en) * | 1969-06-11 | 1972-06-13 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| US3785825A (en) * | 1971-07-19 | 1974-01-15 | Polychrome Corp | Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate |
| CS160783B1 (en, 2012) | 1971-09-09 | 1975-05-04 | ||
| CS160784B1 (en, 2012) | 1971-09-09 | 1975-05-04 | ||
| US4005437A (en) * | 1975-04-18 | 1977-01-25 | Rca Corporation | Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil |
| DE2742631A1 (de) | 1977-09-22 | 1979-04-05 | Hoechst Ag | Lichtempfindliche kopiermasse |
| US4157918A (en) * | 1977-09-26 | 1979-06-12 | American Hoechst Corporation | Light sensitive film composition |
-
1978
- 1978-06-26 DE DE19782828037 patent/DE2828037A1/de not_active Withdrawn
-
1979
- 1979-06-18 AT AT79101994T patent/ATE2581T1/de not_active IP Right Cessation
- 1979-06-18 DE DE7979101994T patent/DE2964798D1/de not_active Expired
- 1979-06-18 EP EP79101994A patent/EP0006561B1/de not_active Expired
- 1979-06-21 AU AU48268/79A patent/AU521070B2/en not_active Ceased
- 1979-06-22 IL IL57623A patent/IL57623A/xx unknown
- 1979-06-22 CA CA330,337A patent/CA1113108A/en not_active Expired
- 1979-06-25 US US06/051,908 patent/US4266001A/en not_active Expired - Lifetime
- 1979-06-25 ZA ZA793154A patent/ZA793154B/xx unknown
- 1979-06-25 PT PT69817A patent/PT69817A/pt unknown
- 1979-06-26 JP JP7977379A patent/JPS556397A/ja active Granted
- 1979-06-26 BR BR7904034A patent/BR7904034A/pt not_active IP Right Cessation
- 1979-08-08 IE IE1175/79A patent/IE48185B1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| IL57623A (en) | 1983-05-15 |
| JPS623411B2 (en, 2012) | 1987-01-24 |
| US4266001A (en) | 1981-05-05 |
| ZA793154B (en) | 1980-06-25 |
| IE48185B1 (en) | 1984-10-17 |
| DE2964798D1 (en) | 1983-03-24 |
| JPS556397A (en) | 1980-01-17 |
| PT69817A (de) | 1979-07-01 |
| IE791175L (en) | 1979-12-26 |
| EP0006561A1 (de) | 1980-01-09 |
| CA1113108A (en) | 1981-11-24 |
| IL57623A0 (en) | 1979-10-31 |
| DE2828037A1 (de) | 1980-01-10 |
| AU521070B2 (en) | 1982-03-11 |
| EP0006561B1 (de) | 1983-02-16 |
| AU4826879A (en) | 1980-01-03 |
| BR7904034A (pt) | 1980-03-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| REN | Ceased due to non-payment of the annual fee |