ATE203333T1 - Ablationsübertragung auf zwischenprodukte - Google Patents

Ablationsübertragung auf zwischenprodukte

Info

Publication number
ATE203333T1
ATE203333T1 AT94925226T AT94925226T ATE203333T1 AT E203333 T1 ATE203333 T1 AT E203333T1 AT 94925226 T AT94925226 T AT 94925226T AT 94925226 T AT94925226 T AT 94925226T AT E203333 T1 ATE203333 T1 AT E203333T1
Authority
AT
Austria
Prior art keywords
lat
onto
imaging
receptor
ablation transfer
Prior art date
Application number
AT94925226T
Other languages
English (en)
Inventor
Ernest W Ellis
Original Assignee
Pgi Graphics Imaging Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pgi Graphics Imaging Llc filed Critical Pgi Graphics Imaging Llc
Application granted granted Critical
Publication of ATE203333T1 publication Critical patent/ATE203333T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/38257Contact thermal transfer or sublimation processes characterised by the use of an intermediate receptor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/38264Overprinting of thermal transfer images
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M7/00After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
    • B41M7/0027After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using protective coatings or layers by lamination or by fusion of the coatings or layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F3/00Colour separation; Correction of tonal value
    • G03F3/10Checking the colour or tonal value of separation negatives or positives
    • G03F3/108Checking the colour or tonal value of separation negatives or positives using a non-impact printing method, e.g. ink jet, using duplicating or marking methods covered by B41M5/00, e.g. by ablation or by thermographic means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M7/00After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
    • B41M7/009After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using thermal means, e.g. infrared radiation, heat
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68368Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Accessory Devices And Overall Control Thereof (AREA)
  • Decoration By Transfer Pictures (AREA)
  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Polymerisation Methods In General (AREA)
  • Electronic Switches (AREA)
  • Steroid Compounds (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Disintegrating Or Milling (AREA)
AT94925226T 1993-08-13 1994-08-08 Ablationsübertragung auf zwischenprodukte ATE203333T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10593893A 1993-08-13 1993-08-13
PCT/US1994/008993 WO1995005623A1 (en) 1993-08-13 1994-08-08 Ablation transfer onto intermediate receptors

Publications (1)

Publication Number Publication Date
ATE203333T1 true ATE203333T1 (de) 2001-08-15

Family

ID=22308614

Family Applications (1)

Application Number Title Priority Date Filing Date
AT94925226T ATE203333T1 (de) 1993-08-13 1994-08-08 Ablationsübertragung auf zwischenprodukte

Country Status (9)

Country Link
US (3) US5622795A (de)
EP (1) EP0713586B1 (de)
JP (4) JPH09501620A (de)
AT (1) ATE203333T1 (de)
AU (1) AU689493B2 (de)
DE (1) DE69427762T2 (de)
DK (1) DK0713586T3 (de)
ES (1) ES2159567T3 (de)
WO (1) WO1995005623A1 (de)

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WO1995005623A1 (en) * 1993-08-13 1995-02-23 Rexham Graphics Inc. Ablation transfer onto intermediate receptors
US5945249A (en) 1995-04-20 1999-08-31 Imation Corp. Laser absorbable photobleachable compositions
US5935758A (en) * 1995-04-20 1999-08-10 Imation Corp. Laser induced film transfer system
DE69610579T2 (de) * 1995-05-31 2001-02-15 Kodak Polychrome Graphics Llc, Norwalk Verfahren zur Herstellung eines Bildaufzeichnungselements
US6143451A (en) * 1996-11-26 2000-11-07 E. I. Du Pont De Nemours And Company Imaged laserable assemblages and associated processes with high speed and durable image-transfer characteristics for laser-induced thermal transfer
US5856061A (en) * 1997-08-14 1999-01-05 Minnesota Mining And Manufacturing Company Production of color proofs and printing plates
US6022440A (en) * 1997-12-08 2000-02-08 Imation Corp. Image transfer process for ink-jet generated images
US6350555B1 (en) 1998-01-14 2002-02-26 Precision Coatings, Inc. Direct write imaging medium
US6114088A (en) * 1999-01-15 2000-09-05 3M Innovative Properties Company Thermal transfer element for forming multilayer devices
EP1144197B1 (de) 1999-01-15 2003-06-11 3M Innovative Properties Company Thermisches Übertragungsverfahren.
US6087060A (en) * 1999-05-12 2000-07-11 Presstek, Inc. Method of multistage digital proofing with dimensional consistency
EP1099183A4 (de) * 1999-05-24 2004-12-15 Potomac Photonics Inc Materialauslieferungssystem für miniaturstruktur-fabrikation
US6583381B1 (en) * 1999-05-24 2003-06-24 Potomac Photonics, Inc. Apparatus for fabrication of miniature structures
AU5266800A (en) * 1999-05-24 2000-12-12 Potomac Photonics, Inc. Patterned surface cleaning system of miniature structures
US6792326B1 (en) * 1999-05-24 2004-09-14 Potomac Photonics, Inc. Material delivery system for miniature structure fabrication
US6197474B1 (en) * 1999-08-27 2001-03-06 Eastman Kodak Company Thermal color proofing process
US6228543B1 (en) 1999-09-09 2001-05-08 3M Innovative Properties Company Thermal transfer with a plasticizer-containing transfer layer
US6294308B1 (en) 1999-10-15 2001-09-25 E. I. Du Pont De Nemours And Company Thermal imaging process and products using image rigidification
US6284425B1 (en) 1999-12-28 2001-09-04 3M Innovative Properties Thermal transfer donor element having a heat management underlayer
US6228555B1 (en) 1999-12-28 2001-05-08 3M Innovative Properties Company Thermal mass transfer donor element
WO2001087634A2 (en) 2000-05-16 2001-11-22 E.I. Du Pont De Nemours And Company Aqueous dispersions for color imaging
US6649861B2 (en) 2000-05-24 2003-11-18 Potomac Photonics, Inc. Method and apparatus for fabrication of miniature structures
JP3906653B2 (ja) 2000-07-18 2007-04-18 ソニー株式会社 画像表示装置及びその製造方法
EP1525996B1 (de) 2000-11-21 2008-08-20 E.I. Du Pont De Nemours And Company Thermisch bebilderbare Elemente mit verbesserter Festigkeit
JP3977254B2 (ja) * 2000-11-21 2007-09-19 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 改良された安定性を有する感熱画像形成エレメント
JP4461616B2 (ja) 2000-12-14 2010-05-12 ソニー株式会社 素子の転写方法、素子保持基板の形成方法、及び素子保持基板
US6958202B2 (en) * 2000-12-15 2005-10-25 E.I. Du Pont De Nemours And Company Donor element for adjusting the focus of an imaging laser
DE60118960T2 (de) 2000-12-15 2007-01-04 E.I. Dupont De Nemours And Co., Wilmington Donorelement zur einstellung des brennpunktes eines bilderzeugungslasers
US6881526B2 (en) * 2000-12-15 2005-04-19 E. I. Du Pont De Nemours And Company Receiver element for adjusting the focus of an imaging laser
US6645681B2 (en) 2000-12-15 2003-11-11 E. I. Du Pont De Nemours And Company Color filter
US6864033B2 (en) 2001-01-24 2005-03-08 Fuji Photo Film Co., Ltd. Multicolor image-forming material
US6830863B2 (en) 2001-01-25 2004-12-14 Fuji Photo Film Co., Ltd. Multicolor image-forming material and method for forming multicolor image
EP1226973A3 (de) * 2001-01-26 2003-11-26 Fuji Photo Film Co., Ltd. Mehrfarbiges Bildaufzeichnungsmaterial und mehrfarbiges Bildaufzeichnungsverfahren
JP4649745B2 (ja) 2001-02-01 2011-03-16 ソニー株式会社 発光素子の転写方法
CA2369767A1 (en) * 2001-02-02 2002-08-02 Fuji Photo Film Co., Ltd. Multicolor image forming material and method for forming multicolor image
JP3425565B2 (ja) 2001-02-02 2003-07-14 富士写真フイルム株式会社 多色画像形成材料と多色画像形成方法
US7037013B2 (en) * 2001-03-05 2006-05-02 Fargo Electronics, Inc. Ink-receptive card substrate
US6979141B2 (en) * 2001-03-05 2005-12-27 Fargo Electronics, Inc. Identification cards, protective coatings, films, and methods for forming the same
JP3493021B2 (ja) * 2001-03-19 2004-02-03 富士写真フイルム株式会社 多色画像形成材料及び多色画像形成方法
DE60213301T2 (de) 2001-03-19 2007-08-23 Fuji Photo Film Co., Ltd., Minami-Ashigara Thermisches Übertragungsaufzeichnungsverfahren durch Laser und Vorrichtung
US6856337B2 (en) 2001-03-19 2005-02-15 Fuji Photo Film Co., Ltd. Multicolor image-forming method and multicolor image-forming material
KR100853410B1 (ko) 2001-04-11 2008-08-21 소니 가부시키가이샤 소자의 전사방법 및 이를 이용한 소자의 배열방법,화상표시장치의 제조방법
JP3608615B2 (ja) 2001-04-19 2005-01-12 ソニー株式会社 素子の転写方法及びこれを用いた素子の配列方法、画像表示装置の製造方法
WO2003010825A1 (en) * 2001-07-24 2003-02-06 Seiko Epson Corporation Transfer method, method of manufacturing thin film element, method of manufacturing integrated circuit, circuit substrate and method of manufacturing the circuit substrate, electro-optic device and method of manufacturing the electro-optic device, and ic card and electronic equipmen
JP2003045901A (ja) 2001-08-01 2003-02-14 Sony Corp 素子の転写方法及びこれを用いた素子の配列方法、画像表示装置の製造方法
JP2003077940A (ja) 2001-09-06 2003-03-14 Sony Corp 素子の転写方法及びこれを用いた素子の配列方法、画像表示装置の製造方法
US20030124265A1 (en) * 2001-12-04 2003-07-03 3M Innovative Properties Company Method and materials for transferring a material onto a plasma treated surface according to a pattern
DE60316254T2 (de) 2002-02-06 2008-06-05 E.I. Du Pont De Nemours And Co., Wilmington Bildübertragungselement, lasersystem, und verfahren zur herstellung von farbfilterelementen und flüssigkristallanzeigevorrichtungen
JP2005526293A (ja) * 2002-05-17 2005-09-02 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー カラーフィルタのサーマルプリンティング用平坦化要素
US7018751B2 (en) * 2002-05-17 2006-03-28 E. I. Du Pont De Nemours And Company Radiation filter element and manufacturing processes therefore
FI111922B (fi) * 2002-05-31 2003-10-15 Perlos Oyj Menetelmä kolmiulotteisten pintojen kuviointiin
JP2005085799A (ja) * 2003-09-04 2005-03-31 Seiko Epson Corp 成膜方法、配線パターンの形成方法、半導体装置の製造方法、電気光学装置、及び電子機器
KR100579174B1 (ko) * 2003-12-22 2006-05-11 삼성에스디아이 주식회사 레이저 전사용 도너 필름 및 그 필름을 사용하여 제조되는유기 전계 발광 소자
US20060127805A1 (en) * 2004-12-13 2006-06-15 Kodak Polychrome Graphics Llc Kit for making relief images
US7670450B2 (en) * 2006-07-31 2010-03-02 3M Innovative Properties Company Patterning and treatment methods for organic light emitting diode devices
US7361437B2 (en) * 2006-09-01 2008-04-22 E.I. Du Pont De Nemours And Company Thermal transfer donor element with a carboxylated binder and a hydroxylated organic compound
US8956490B1 (en) 2007-06-25 2015-02-17 Assa Abloy Ab Identification card substrate surface protection using a laminated coating
US10112257B1 (en) 2010-07-09 2018-10-30 General Lasertronics Corporation Coating ablating apparatus with coating removal detection
US9895771B2 (en) 2012-02-28 2018-02-20 General Lasertronics Corporation Laser ablation for the environmentally beneficial removal of surface coatings
EP2731126A1 (de) 2012-11-09 2014-05-14 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Verfahren zum Binden von Chipfarbstoffen
US10086597B2 (en) * 2014-01-21 2018-10-02 General Lasertronics Corporation Laser film debonding method
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Also Published As

Publication number Publication date
ES2159567T3 (es) 2001-10-16
EP0713586A1 (de) 1996-05-29
EP0713586B1 (de) 2001-07-18
DE69427762D1 (de) 2001-08-23
JP2002113950A (ja) 2002-04-16
EP0713586A4 (de) 1996-09-04
WO1995005623A1 (en) 1995-02-23
DK0713586T3 (da) 2001-09-24
AU689493B2 (en) 1998-04-02
JP4050710B2 (ja) 2008-02-20
US5773188A (en) 1998-06-30
AU7522894A (en) 1995-03-14
US5622795A (en) 1997-04-22
DE69427762T2 (de) 2001-10-31
US5593808A (en) 1997-01-14
JP2006327212A (ja) 2006-12-07
JPH09501620A (ja) 1997-02-18
JP2004209988A (ja) 2004-07-29

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee