ATE171587T1 - Vorrichtung zur erzeugung zwei oder mehrere entladungen in einem gleichwellenleiternrohr - Google Patents

Vorrichtung zur erzeugung zwei oder mehrere entladungen in einem gleichwellenleiternrohr

Info

Publication number
ATE171587T1
ATE171587T1 AT96400832T AT96400832T ATE171587T1 AT E171587 T1 ATE171587 T1 AT E171587T1 AT 96400832 T AT96400832 T AT 96400832T AT 96400832 T AT96400832 T AT 96400832T AT E171587 T1 ATE171587 T1 AT E171587T1
Authority
AT
Austria
Prior art keywords
tube
discharges
generating
axis
those
Prior art date
Application number
AT96400832T
Other languages
English (en)
Inventor
Pierre Goudmand
Odile Dessaux
Christian Dupret
Original Assignee
Univ Lille Sciences Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Lille Sciences Tech filed Critical Univ Lille Sciences Tech
Application granted granted Critical
Publication of ATE171587T1 publication Critical patent/ATE171587T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • H01J37/32229Waveguides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
  • Lasers (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
AT96400832T 1995-04-21 1996-04-18 Vorrichtung zur erzeugung zwei oder mehrere entladungen in einem gleichwellenleiternrohr ATE171587T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9504802A FR2733384B1 (fr) 1995-04-21 1995-04-21 Dispositif pour creer deux ou plusieurs decharges plasma dans un meme tube guide d'onde

Publications (1)

Publication Number Publication Date
ATE171587T1 true ATE171587T1 (de) 1998-10-15

Family

ID=9478341

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96400832T ATE171587T1 (de) 1995-04-21 1996-04-18 Vorrichtung zur erzeugung zwei oder mehrere entladungen in einem gleichwellenleiternrohr

Country Status (4)

Country Link
EP (1) EP0739155B1 (de)
AT (1) ATE171587T1 (de)
DE (1) DE69600677D1 (de)
FR (1) FR2733384B1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2762748B1 (fr) * 1997-04-25 1999-06-11 Air Liquide Dispositif d'excitation d'un gaz par plasma d'onde de surface
FR2766321B1 (fr) * 1997-07-16 1999-09-03 Air Liquide Dispositif d'excitation d'un gaz par plasma d'onde de surface
JP4173679B2 (ja) * 2002-04-09 2008-10-29 エム・イー・エス・アフティ株式会社 Ecrプラズマ源およびecrプラズマ装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59189130A (ja) * 1983-04-13 1984-10-26 Toyota Motor Corp プラズマ処理方法
FR2579855A1 (fr) * 1985-03-28 1986-10-03 Centre Nat Rech Scient Dispositif pour l'excitation par ondes hyperfrequences d'un plasma dans une colonne de gaz, permettant notamment la realisation d'un laser ionique
JPH01184921A (ja) * 1988-01-20 1989-07-24 Canon Inc エッチング、アッシング及び成膜等に有用なプラズマ処理装置
US5037666A (en) * 1989-08-03 1991-08-06 Uha Mikakuto Precision Engineering Research Institute Co., Ltd. High-speed film forming method by microwave plasma chemical vapor deposition (CVD) under high pressure
US5049843A (en) * 1990-04-12 1991-09-17 Barnes Ramon M Strip-line for propagating microwave energy
US5389153A (en) * 1993-02-19 1995-02-14 Texas Instruments Incorporated Plasma processing system using surface wave plasma generating apparatus and method

Also Published As

Publication number Publication date
EP0739155A1 (de) 1996-10-23
EP0739155B1 (de) 1998-09-23
DE69600677D1 (de) 1998-10-29
FR2733384B1 (fr) 1997-07-04
FR2733384A1 (fr) 1996-10-25

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Legal Events

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