ATE163690T1 - Werkzeug, verfahren zur herstellung des werkzeuges und verwendung des werkzeuges - Google Patents

Werkzeug, verfahren zur herstellung des werkzeuges und verwendung des werkzeuges

Info

Publication number
ATE163690T1
ATE163690T1 AT95915122T AT95915122T ATE163690T1 AT E163690 T1 ATE163690 T1 AT E163690T1 AT 95915122 T AT95915122 T AT 95915122T AT 95915122 T AT95915122 T AT 95915122T AT E163690 T1 ATE163690 T1 AT E163690T1
Authority
AT
Austria
Prior art keywords
vapor deposition
chemical vapor
pct
coating
tool
Prior art date
Application number
AT95915122T
Other languages
English (en)
Inventor
Udo Koenig
Original Assignee
Widia Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE4417729A external-priority patent/DE4417729A1/de
Application filed by Widia Gmbh filed Critical Widia Gmbh
Application granted granted Critical
Publication of ATE163690T1 publication Critical patent/ATE163690T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T409/00—Gear cutting, milling, or planing
    • Y10T409/30—Milling
    • Y10T409/300056—Thread or helix generating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00—Cutting
    • Y10T83/929—Tool or tool with support
    • Y10T83/9372—Rotatable type
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00—Cutting
    • Y10T83/929—Tool or tool with support
    • Y10T83/9411—Cutting couple type

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
AT95915122T 1994-05-20 1995-04-01 Werkzeug, verfahren zur herstellung des werkzeuges und verwendung des werkzeuges ATE163690T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4417729A DE4417729A1 (de) 1992-11-21 1994-05-20 Werkzeug sowie Verfahren und Vorrichtung zur Herstellung des Werkzeuges und Verwendung des Werkzeuges

Publications (1)

Publication Number Publication Date
ATE163690T1 true ATE163690T1 (de) 1998-03-15

Family

ID=6518599

Family Applications (1)

Application Number Title Priority Date Filing Date
AT95915122T ATE163690T1 (de) 1994-05-20 1995-04-01 Werkzeug, verfahren zur herstellung des werkzeuges und verwendung des werkzeuges

Country Status (5)

Country Link
US (1) US5869147A (de)
EP (1) EP0760021B1 (de)
JP (1) JPH10500451A (de)
AT (1) ATE163690T1 (de)
WO (1) WO1995032317A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19719195A1 (de) 1997-05-09 1998-11-12 Widia Gmbh Schneideinsatz zum Zerspanen und Verfahren zur Herstellung dieses Schneideinsatzes
US6821571B2 (en) * 1999-06-18 2004-11-23 Applied Materials Inc. Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers
DE10016958A1 (de) * 2000-04-06 2001-10-18 Widia Gmbh Verfahren zur Herstellung von Multilagenschichten auf Substratkörpern und Verbundwerkstoff, bestehend aus einem beschichteten Substratkörper
US6794311B2 (en) 2000-07-14 2004-09-21 Applied Materials Inc. Method and apparatus for treating low k dielectric layers to reduce diffusion
US7455918B2 (en) * 2004-03-12 2008-11-25 Kennametal Inc. Alumina coating, coated product and method of making the same
GB0416385D0 (en) * 2004-07-22 2004-08-25 Boc Group Plc Gas abatement
US20100255337A1 (en) * 2008-11-24 2010-10-07 Langhorn Jason B Multilayer Coatings

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3027688C2 (de) * 1980-07-22 1982-04-01 Fried. Krupp Gmbh, 4300 Essen Verfahren zur Herstellung eines verschleißfesten Verbundwerkstoffes
JPS57137460A (en) * 1981-02-18 1982-08-25 Sumitomo Electric Ind Ltd Coated superhard alloy tool
US5300951A (en) * 1985-11-28 1994-04-05 Kabushiki Kaisha Toshiba Member coated with ceramic material and method of manufacturing the same
DE3830430A1 (de) * 1987-09-11 1989-03-23 Japan Synthetic Rubber Co Ltd Verfahren zur herstellung von ueberzuegen
US5079031A (en) * 1988-03-22 1992-01-07 Semiconductor Energy Laboratory Co., Ltd. Apparatus and method for forming thin films
EP0577678B1 (de) * 1991-03-27 1995-03-08 Widia GmbH Verbundkörper, verwendung des verbundkörpers und verfahren zu seiner herstellung
JP2601573B2 (ja) * 1991-07-01 1997-04-16 日本電信電話株式会社 プラズマ処理におけるダメージ低減方法
DE4126851A1 (de) * 1991-08-14 1993-02-18 Krupp Widia Gmbh Werkzeug mit verschleissfester schneide aus kubischem bornitrid oder polykristallinem kubischem bornitrid, verfahren zu dessen herstellung sowie dessen verwendung
US5346600A (en) * 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
US5271963A (en) * 1992-11-16 1993-12-21 Materials Research Corporation Elimination of low temperature ammonia salt in TiCl4 NH3 CVD reaction
DE4239234A1 (de) * 1992-11-21 1994-06-09 Krupp Widia Gmbh Werkzeug und Verfahren zur Beschichtung eines Werkzeuggrundkörpers
US5576071A (en) * 1994-11-08 1996-11-19 Micron Technology, Inc. Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds

Also Published As

Publication number Publication date
WO1995032317A1 (de) 1995-11-30
JPH10500451A (ja) 1998-01-13
EP0760021B1 (de) 1998-03-04
US5869147A (en) 1999-02-09
EP0760021A1 (de) 1997-03-05

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