ATE158654T1 - Ionenselektieve elektrode und verfahren zur herstellung derselben - Google Patents
Ionenselektieve elektrode und verfahren zur herstellung derselbenInfo
- Publication number
- ATE158654T1 ATE158654T1 AT93201494T AT93201494T ATE158654T1 AT E158654 T1 ATE158654 T1 AT E158654T1 AT 93201494 T AT93201494 T AT 93201494T AT 93201494 T AT93201494 T AT 93201494T AT E158654 T1 ATE158654 T1 AT E158654T1
- Authority
- AT
- Austria
- Prior art keywords
- producing
- ion selective
- selective electrode
- same
- glow discharge
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract 2
- 229920000307 polymer substrate Polymers 0.000 abstract 2
- 229910052709 silver Inorganic materials 0.000 abstract 2
- 239000004332 silver Substances 0.000 abstract 2
- 230000032683 aging Effects 0.000 abstract 1
- 238000004061 bleaching Methods 0.000 abstract 1
- 239000002131 composite material Substances 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/28—Electrolytic cell components
- G01N27/30—Electrodes, e.g. test electrodes; Half-cells
- G01N27/333—Ion-selective electrodes or membranes
- G01N27/3335—Ion-selective electrodes or membranes the membrane containing at least one organic component
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Molecular Biology (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Metallurgy (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Physical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Electrolytic Production Of Metals (AREA)
- Electroluminescent Light Sources (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/889,827 US5324414A (en) | 1992-06-01 | 1992-06-01 | Ion selective electrode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE158654T1 true ATE158654T1 (de) | 1997-10-15 |
Family
ID=25395867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT93201494T ATE158654T1 (de) | 1992-06-01 | 1993-05-25 | Ionenselektieve elektrode und verfahren zur herstellung derselben |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5324414A (de) |
| EP (1) | EP0573101B1 (de) |
| JP (1) | JP3260906B2 (de) |
| AT (1) | ATE158654T1 (de) |
| DE (1) | DE69314090T2 (de) |
| HK (1) | HK1000940A1 (de) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6149985A (en) | 1999-07-07 | 2000-11-21 | Eastman Kodak Company | High-efficiency plasma treatment of imaging supports |
| JP3366298B2 (ja) | 1999-10-19 | 2003-01-14 | 松下電器産業株式会社 | 磁気記録装置、磁気ヘッドの調節方法、および磁気記録媒体 |
| US6875327B1 (en) * | 1999-11-15 | 2005-04-05 | Matsushita Electric Industrial Co., Ltd. | Biosensor, method of forming thin-film electrode, and method and apparatus for quantitative determination |
| US6398931B1 (en) | 2000-01-31 | 2002-06-04 | Phoenix Electrode Company | Combination ion-selective electrode with a replaceable sensing membrane |
| US6603121B2 (en) | 2000-05-19 | 2003-08-05 | Eastman Kodak Company | High-efficiency plasma treatment of paper |
| JP2003156466A (ja) * | 2001-11-26 | 2003-05-30 | Fuji Photo Film Co Ltd | 電解質スライドに用いる多層フィルム電極包装体 |
| US7014204B2 (en) * | 2003-10-06 | 2006-03-21 | Amg Medical Inc. | Rocking wheelchair |
| RU2381493C1 (ru) * | 2008-12-22 | 2010-02-10 | ГОУ ВПО Саратовский Государственный Технический Университет (СГТУ) | Способ изготовления твердотельного ион-селективного электрода |
| US11738537B2 (en) | 2013-10-30 | 2023-08-29 | San Diego Gas & Electric Company, c/o Sempra Energy | Nonconductive films for lighter than air balloons |
| US20150118460A1 (en) | 2013-10-30 | 2015-04-30 | San Diego Gas & Electric company c/o Sempra Energy | Nonconductive films for lighter than air balloons |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3686018A (en) * | 1970-11-02 | 1972-08-22 | Dow Chemical Co | Method of metallizing an organic substrate |
| US4214968A (en) * | 1978-04-05 | 1980-07-29 | Eastman Kodak Company | Ion-selective electrode |
| US4259164A (en) * | 1979-08-13 | 1981-03-31 | Eastman Kodak Company | Silver/silver halide electrodes comprising chromium or nickel |
| US4337279A (en) * | 1981-01-23 | 1982-06-29 | Uop Inc. | Method for increasing the peel strength of metal-clad polymers |
| JPS57187327A (en) * | 1981-05-13 | 1982-11-18 | Toray Ind Inc | Poly-p-phenylene sulfide film |
| JPS5810645A (ja) * | 1981-07-13 | 1983-01-21 | Fuji Photo Film Co Ltd | フイルム状イオン選択電極及びこれを用いるイオン濃度測定法 |
| US4454007A (en) * | 1983-01-27 | 1984-06-12 | E. I. Du Pont De Nemours And Company | Ion-selective layered sensor and methods of making and using the same |
| DE3585570D1 (de) * | 1984-06-20 | 1992-04-16 | Fuji Photo Film Co Ltd | Ionenselektive elektrode. |
| GB2168911B (en) * | 1984-12-29 | 1989-06-07 | Tdk Corp | Magnetic recording medium |
| US4886681A (en) * | 1987-01-20 | 1989-12-12 | International Business Machines Corporation | Metal-polymer adhesion by low energy bombardment |
-
1992
- 1992-06-01 US US07/889,827 patent/US5324414A/en not_active Expired - Lifetime
-
1993
- 1993-05-25 DE DE69314090T patent/DE69314090T2/de not_active Expired - Lifetime
- 1993-05-25 EP EP93201494A patent/EP0573101B1/de not_active Expired - Lifetime
- 1993-05-25 AT AT93201494T patent/ATE158654T1/de not_active IP Right Cessation
- 1993-05-31 JP JP12895593A patent/JP3260906B2/ja not_active Expired - Lifetime
-
1997
- 1997-12-18 HK HK97102509A patent/HK1000940A1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP3260906B2 (ja) | 2002-02-25 |
| DE69314090D1 (de) | 1997-10-30 |
| US5324414A (en) | 1994-06-28 |
| EP0573101A1 (de) | 1993-12-08 |
| EP0573101B1 (de) | 1997-09-24 |
| HK1000940A1 (en) | 1998-05-08 |
| JPH06101017A (ja) | 1994-04-12 |
| DE69314090T2 (de) | 1998-03-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |