ATE158654T1 - Ionenselektieve elektrode und verfahren zur herstellung derselben - Google Patents

Ionenselektieve elektrode und verfahren zur herstellung derselben

Info

Publication number
ATE158654T1
ATE158654T1 AT93201494T AT93201494T ATE158654T1 AT E158654 T1 ATE158654 T1 AT E158654T1 AT 93201494 T AT93201494 T AT 93201494T AT 93201494 T AT93201494 T AT 93201494T AT E158654 T1 ATE158654 T1 AT E158654T1
Authority
AT
Austria
Prior art keywords
producing
ion selective
selective electrode
same
glow discharge
Prior art date
Application number
AT93201494T
Other languages
English (en)
Inventor
Robert G Spahn
Louis J Gerenser
Original Assignee
Johnson & Johnson Clin Diag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Johnson & Johnson Clin Diag filed Critical Johnson & Johnson Clin Diag
Application granted granted Critical
Publication of ATE158654T1 publication Critical patent/ATE158654T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
    • C23C14/022Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/28Electrolytic cell components
    • G01N27/30Electrodes, e.g. test electrodes; Half-cells
    • G01N27/333Ion-selective electrodes or membranes
    • G01N27/3335Ion-selective electrodes or membranes the membrane containing at least one organic component
AT93201494T 1992-06-01 1993-05-25 Ionenselektieve elektrode und verfahren zur herstellung derselben ATE158654T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/889,827 US5324414A (en) 1992-06-01 1992-06-01 Ion selective electrode

Publications (1)

Publication Number Publication Date
ATE158654T1 true ATE158654T1 (de) 1997-10-15

Family

ID=25395867

Family Applications (1)

Application Number Title Priority Date Filing Date
AT93201494T ATE158654T1 (de) 1992-06-01 1993-05-25 Ionenselektieve elektrode und verfahren zur herstellung derselben

Country Status (6)

Country Link
US (1) US5324414A (de)
EP (1) EP0573101B1 (de)
JP (1) JP3260906B2 (de)
AT (1) ATE158654T1 (de)
DE (1) DE69314090T2 (de)
HK (1) HK1000940A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6149985A (en) * 1999-07-07 2000-11-21 Eastman Kodak Company High-efficiency plasma treatment of imaging supports
CN100347537C (zh) 1999-11-15 2007-11-07 松下电器产业株式会社 生物传感器
US6398931B1 (en) 2000-01-31 2002-06-04 Phoenix Electrode Company Combination ion-selective electrode with a replaceable sensing membrane
US6603121B2 (en) 2000-05-19 2003-08-05 Eastman Kodak Company High-efficiency plasma treatment of paper
JP2003156466A (ja) * 2001-11-26 2003-05-30 Fuji Photo Film Co Ltd 電解質スライドに用いる多層フィルム電極包装体
US7014204B2 (en) * 2003-10-06 2006-03-21 Amg Medical Inc. Rocking wheelchair
US20150118460A1 (en) 2013-10-30 2015-04-30 San Diego Gas & Electric company c/o Sempra Energy Nonconductive films for lighter than air balloons
US11738537B2 (en) 2013-10-30 2023-08-29 San Diego Gas & Electric Company, c/o Sempra Energy Nonconductive films for lighter than air balloons

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3686018A (en) * 1970-11-02 1972-08-22 Dow Chemical Co Method of metallizing an organic substrate
US4214968A (en) * 1978-04-05 1980-07-29 Eastman Kodak Company Ion-selective electrode
US4259164A (en) * 1979-08-13 1981-03-31 Eastman Kodak Company Silver/silver halide electrodes comprising chromium or nickel
US4337279A (en) * 1981-01-23 1982-06-29 Uop Inc. Method for increasing the peel strength of metal-clad polymers
JPS57187327A (en) * 1981-05-13 1982-11-18 Toray Ind Inc Poly-p-phenylene sulfide film
JPS5810645A (ja) * 1981-07-13 1983-01-21 Fuji Photo Film Co Ltd フイルム状イオン選択電極及びこれを用いるイオン濃度測定法
US4454007A (en) * 1983-01-27 1984-06-12 E. I. Du Pont De Nemours And Company Ion-selective layered sensor and methods of making and using the same
DE3585570D1 (de) * 1984-06-20 1992-04-16 Fuji Photo Film Co Ltd Ionenselektive elektrode.
GB2168911B (en) * 1984-12-29 1989-06-07 Tdk Corp Magnetic recording medium
US4886681A (en) * 1987-01-20 1989-12-12 International Business Machines Corporation Metal-polymer adhesion by low energy bombardment

Also Published As

Publication number Publication date
EP0573101B1 (de) 1997-09-24
JP3260906B2 (ja) 2002-02-25
EP0573101A1 (de) 1993-12-08
DE69314090D1 (de) 1997-10-30
DE69314090T2 (de) 1998-03-12
JPH06101017A (ja) 1994-04-12
HK1000940A1 (en) 1998-05-08
US5324414A (en) 1994-06-28

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties