ATE154258T1 - CHEMICAL COATING OF DIAMOND FILM USING WATER-BASED PLASMA DISCHARGE AGENTS - Google Patents
CHEMICAL COATING OF DIAMOND FILM USING WATER-BASED PLASMA DISCHARGE AGENTSInfo
- Publication number
- ATE154258T1 ATE154258T1 AT92923128T AT92923128T ATE154258T1 AT E154258 T1 ATE154258 T1 AT E154258T1 AT 92923128 T AT92923128 T AT 92923128T AT 92923128 T AT92923128 T AT 92923128T AT E154258 T1 ATE154258 T1 AT E154258T1
- Authority
- AT
- Austria
- Prior art keywords
- water
- confined
- reacted
- alcohol
- diamond
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/272—Diamond only using DC, AC or RF discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
Abstract
A chemical vapor deposition (CVD) technique (process and apparatus) for the growth of diamond films using vapor mixtures of selected compounds having desired moieties, specifically precursors that provide carbon and etchant species that remove graphite disclosed. The selected compounds are reacted in a plasma created by a confined rf discharge to produce diamond films on a diamond or a non-diamond substrate. In a preferred embodiment a gas phase mixture including at least 20% water which provides the etchant species is reacted with an alcohol which provides the requisite carbon precursor at low temperature (300 DEG -650 DEG C.) and low pressure (0.1 to 10 Torr), preferably in the presence of an organic acid (acetic acid) which contributes etchant species reactant. In the preferred embodiment the volumetric mixtures have typically been 40-80% water and 60-20% alcohol. The gaseous mixture of H2O and alcohol is dissociated to produce H, OH, and carbon radicals. Both OH and atomic H are capable of etching graphite from the depositing carbon layer. The selected compounds are reacted in a CVD apparatus in which a confined rf discharge is used to create an electric discharge or plasma. The plasma is confined between an inductive rf coil via transformer isolation from the chamber ground.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78789191A | 1991-11-05 | 1991-11-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE154258T1 true ATE154258T1 (en) | 1997-06-15 |
Family
ID=25142838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT92923128T ATE154258T1 (en) | 1991-11-05 | 1992-11-05 | CHEMICAL COATING OF DIAMOND FILM USING WATER-BASED PLASMA DISCHARGE AGENTS |
Country Status (8)
Country | Link |
---|---|
US (1) | US5418018A (en) |
EP (1) | EP0611331B1 (en) |
JP (1) | JPH07500876A (en) |
AT (1) | ATE154258T1 (en) |
AU (1) | AU2912292A (en) |
CA (1) | CA2122995A1 (en) |
DE (1) | DE69220379T2 (en) |
WO (1) | WO1993008927A1 (en) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5480686A (en) * | 1991-11-05 | 1996-01-02 | Research Triangle Institute | Process and apparatus for chemical vapor deposition of diamond films using water-based plasma discharges |
CA2281972C (en) * | 1993-07-20 | 2000-10-17 | Saint-Gobain/Norton Industrial Ceramics Corporation | Cvd diamond radiation detector |
JPH0827576A (en) * | 1994-07-18 | 1996-01-30 | Canon Inc | Formation of diamond film |
US6673503B2 (en) | 1994-11-07 | 2004-01-06 | Barbara Wagner | Energy activated electrographic printing process |
US6649317B2 (en) | 1994-11-07 | 2003-11-18 | Barbara Wagner | Energy activated electrographic printing process |
US7654660B2 (en) * | 1994-11-07 | 2010-02-02 | Sawgrass Technologies, Inc. | Energy activated printing process |
US7041424B2 (en) * | 1994-11-07 | 2006-05-09 | Ming Xu | Energy activated electrographic printing process |
JP3469761B2 (en) * | 1997-10-30 | 2003-11-25 | 東京エレクトロン株式会社 | Method for manufacturing semiconductor device |
US8337006B2 (en) * | 1998-05-06 | 2012-12-25 | Sawgrass Technologies, Inc. | Energy activated printing process |
US6344149B1 (en) | 1998-11-10 | 2002-02-05 | Kennametal Pc Inc. | Polycrystalline diamond member and method of making the same |
ES2267529T3 (en) | 1999-04-23 | 2007-03-16 | Sawgrass Systems, Inc. | PRINT PROCEDURE FOR INK JET THAT USES REACTIVE INKS. |
EP1199991A1 (en) * | 1999-07-30 | 2002-05-02 | Drukker International B.V. | A cutting blade for a surgical instrument |
US7001649B2 (en) | 2001-06-19 | 2006-02-21 | Barbara Wagner | Intermediate transfer recording medium |
US6849370B2 (en) | 2001-10-16 | 2005-02-01 | Barbara Wagner | Energy activated electrographic printing process |
US20060127599A1 (en) * | 2002-02-12 | 2006-06-15 | Wojak Gregory J | Process and apparatus for preparing a diamond substance |
US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
US8555921B2 (en) | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
US7866342B2 (en) | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
DE10358535A1 (en) * | 2003-12-13 | 2005-07-14 | Henkel Kgaa | Hybrid enzymes with cationic binding domain |
US7829377B2 (en) * | 2005-01-11 | 2010-11-09 | Apollo Diamond, Inc | Diamond medical devices |
US20070026205A1 (en) | 2005-08-01 | 2007-02-01 | Vapor Technologies Inc. | Article having patterned decorative coating |
US20130070366A1 (en) * | 2011-09-21 | 2013-03-21 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic recording head with low-wear protective film having hydrogen and/or water vapor therein |
US9469918B2 (en) | 2014-01-24 | 2016-10-18 | Ii-Vi Incorporated | Substrate including a diamond layer and a composite layer of diamond and silicon carbide, and, optionally, silicon |
CN105689012B (en) * | 2015-12-15 | 2017-12-05 | 中国石油大学(华东) | A kind of preparation method of Nano diamond solid acid catalyst |
CN113333042B (en) * | 2021-06-21 | 2022-04-22 | 太原理工大学 | Micro-fluidic chip for nucleic acid detection and manufacturing method thereof |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4517223A (en) * | 1982-09-24 | 1985-05-14 | Sovonics Solar Systems | Method of making amorphous semiconductor alloys and devices using microwave energy |
US4679007A (en) * | 1985-05-20 | 1987-07-07 | Advanced Energy, Inc. | Matching circuit for delivering radio frequency electromagnetic energy to a variable impedance load |
US4686113A (en) * | 1985-12-18 | 1987-08-11 | Fairchild Semiconductor Corporation | Plasma confinement in a low pressure electrically grounded R.F. heated reactor and deposition method |
US4673589A (en) * | 1986-02-18 | 1987-06-16 | Amoco Corporation | Photoconducting amorphous carbon |
US5275798A (en) * | 1986-07-11 | 1994-01-04 | Kyocera Corporation | Method for producing diamond films |
JPH0623430B2 (en) * | 1987-07-13 | 1994-03-30 | 株式会社半導体エネルギ−研究所 | Carbon production method |
JPS6424093A (en) * | 1987-07-21 | 1989-01-26 | Showa Denko Kk | Method for synthesizing diamond by vapor phase method |
US5145711A (en) * | 1987-08-10 | 1992-09-08 | Semiconductor Energy Laboratory Co., Ltd. | Cyclotron resonance chemical vapor deposition method of forming a halogen-containing diamond on a substrate |
US4935303A (en) * | 1987-10-15 | 1990-06-19 | Canon Kabushiki Kaisha | Novel diamond-like carbon film and process for the production thereof |
US5268201A (en) * | 1987-10-20 | 1993-12-07 | Showa Denko Kabushiki Kaisha | Composite diamond grain and method for production thereof |
JPH01197391A (en) * | 1988-02-01 | 1989-08-09 | Idemitsu Petrochem Co Ltd | Method for synthesizing diamond |
KR920003431B1 (en) * | 1988-02-05 | 1992-05-01 | 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 | Plasma processing method and apparatus |
US5079031A (en) * | 1988-03-22 | 1992-01-07 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus and method for forming thin films |
JPH0288497A (en) * | 1988-06-09 | 1990-03-28 | Toshiba Corp | Production of single crystal diamond grain |
US4948629A (en) * | 1989-02-10 | 1990-08-14 | International Business Machines Corporation | Deposition of diamond films |
US5142390A (en) * | 1989-02-23 | 1992-08-25 | Ricoh Company, Ltd. | MIM element with a doped hard carbon film |
JP2730144B2 (en) * | 1989-03-07 | 1998-03-25 | 住友電気工業株式会社 | Single crystal diamond layer formation method |
JP2799875B2 (en) * | 1989-05-20 | 1998-09-21 | 株式会社リコー | Liquid crystal display |
US5106452A (en) * | 1989-06-05 | 1992-04-21 | Semiconductor Energy Laboratory Co., Ltd. | Method of depositing diamond and diamond light emitting device |
US5023109A (en) * | 1989-09-06 | 1991-06-11 | General Atomics | Deposition of synthetic diamonds |
US5110577A (en) * | 1990-01-12 | 1992-05-05 | Ford Motor Company | Process of depositing a carbon film having metallic properties |
US5124179A (en) * | 1990-09-13 | 1992-06-23 | Diamonex, Incorporated | Interrupted method for producing multilayered polycrystalline diamond films |
-
1992
- 1992-11-05 EP EP92923128A patent/EP0611331B1/en not_active Expired - Lifetime
- 1992-11-05 CA CA002122995A patent/CA2122995A1/en not_active Abandoned
- 1992-11-05 DE DE69220379T patent/DE69220379T2/en not_active Expired - Fee Related
- 1992-11-05 JP JP5508600A patent/JPH07500876A/en active Pending
- 1992-11-05 WO PCT/US1992/009289 patent/WO1993008927A1/en active IP Right Grant
- 1992-11-05 AT AT92923128T patent/ATE154258T1/en not_active IP Right Cessation
- 1992-11-05 AU AU29122/92A patent/AU2912292A/en not_active Abandoned
-
1993
- 1993-05-14 US US08/061,291 patent/US5418018A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0611331A1 (en) | 1994-08-24 |
DE69220379T2 (en) | 1998-01-15 |
EP0611331A4 (en) | 1995-01-11 |
CA2122995A1 (en) | 1993-05-13 |
US5418018A (en) | 1995-05-23 |
WO1993008927A1 (en) | 1993-05-13 |
AU2912292A (en) | 1993-06-07 |
DE69220379D1 (en) | 1997-07-17 |
JPH07500876A (en) | 1995-01-26 |
EP0611331B1 (en) | 1997-06-11 |
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Legal Events
Date | Code | Title | Description |
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RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |