ATE134050T1 - Entwickler für strahlungsempfindliche zusammensetzungen - Google Patents
Entwickler für strahlungsempfindliche zusammensetzungenInfo
- Publication number
- ATE134050T1 ATE134050T1 AT89310598T AT89310598T ATE134050T1 AT E134050 T1 ATE134050 T1 AT E134050T1 AT 89310598 T AT89310598 T AT 89310598T AT 89310598 T AT89310598 T AT 89310598T AT E134050 T1 ATE134050 T1 AT E134050T1
- Authority
- AT
- Austria
- Prior art keywords
- developer
- radiation sensitive
- ethylene
- sensitive compositions
- sodium
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 title abstract 2
- 239000007788 liquid Substances 0.000 abstract 3
- -1 polyoxyethylene lauryl ether Polymers 0.000 abstract 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 abstract 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 abstract 1
- 239000004115 Sodium Silicate Substances 0.000 abstract 1
- 150000001734 carboxylic acid salts Chemical class 0.000 abstract 1
- IIWMSIPKUVXHOO-UHFFFAOYSA-N ethyl hexyl sulfate Chemical compound CCCCCCOS(=O)(=O)OCC IIWMSIPKUVXHOO-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229920001223 polyethylene glycol Polymers 0.000 abstract 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 abstract 1
- 235000019795 sodium metasilicate Nutrition 0.000 abstract 1
- BYKRNSHANADUFY-UHFFFAOYSA-M sodium octanoate Chemical compound [Na+].CCCCCCCC([O-])=O BYKRNSHANADUFY-UHFFFAOYSA-M 0.000 abstract 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 abstract 1
- 229910052911 sodium silicate Inorganic materials 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Sampling And Sample Adjustment (AREA)
- Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB888824841A GB8824841D0 (en) | 1988-10-24 | 1988-10-24 | Development of radiation sensitive compositions |
| GB898905577A GB8905577D0 (en) | 1989-03-10 | 1989-03-10 | Development of radiation sensitive compositions |
| GB898916717A GB8916717D0 (en) | 1989-07-21 | 1989-07-21 | Development of radiation sensitive compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE134050T1 true ATE134050T1 (de) | 1996-02-15 |
Family
ID=27264138
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT89310598T ATE134050T1 (de) | 1988-10-24 | 1989-10-16 | Entwickler für strahlungsempfindliche zusammensetzungen |
Country Status (12)
| Country | Link |
|---|---|
| EP (1) | EP0366321B1 (de) |
| JP (1) | JP2954951B2 (de) |
| AT (1) | ATE134050T1 (de) |
| AU (1) | AU607640B2 (de) |
| BR (1) | BR8905389A (de) |
| DE (1) | DE68925610T2 (de) |
| DK (1) | DK529189A (de) |
| ES (1) | ES2082786T3 (de) |
| FI (1) | FI97573C (de) |
| IE (1) | IE61183B1 (de) |
| NO (1) | NO180028C (de) |
| NZ (1) | NZ231122A (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2112920B1 (de) | 2003-06-26 | 2018-07-25 | Intellipharmaceutics Corp. | Protonenpumpeninhibitoren enthaltende kapseln, die verschieden aufgebaute untereinheiten zur verzögerten wirkstofffreisetzung enthalten |
| US7186498B2 (en) | 2003-10-02 | 2007-03-06 | Willi-Kurt Gries | Alkaline developer for radiation sensitive compositions |
| US10624858B2 (en) | 2004-08-23 | 2020-04-21 | Intellipharmaceutics Corp | Controlled release composition using transition coating, and method of preparing same |
| US10064828B1 (en) | 2005-12-23 | 2018-09-04 | Intellipharmaceutics Corp. | Pulsed extended-pulsed and extended-pulsed pulsed drug delivery systems |
| US10960077B2 (en) | 2006-05-12 | 2021-03-30 | Intellipharmaceutics Corp. | Abuse and alcohol resistant drug composition |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2110401A (en) * | 1981-11-04 | 1983-06-15 | Bicc Plc | Developer solutions and processes for making lithographic printing plates |
| US4436807A (en) * | 1982-07-15 | 1984-03-13 | American Hoechst Corporation | Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material |
| DE3439597A1 (de) * | 1984-10-30 | 1986-04-30 | Hoechst Ag, 6230 Frankfurt | Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers |
| US4780396A (en) * | 1987-02-17 | 1988-10-25 | Hoechst Celanese Corporation | Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant |
-
1989
- 1989-10-16 AT AT89310598T patent/ATE134050T1/de not_active IP Right Cessation
- 1989-10-16 ES ES89310598T patent/ES2082786T3/es not_active Expired - Lifetime
- 1989-10-16 DE DE68925610T patent/DE68925610T2/de not_active Expired - Fee Related
- 1989-10-16 EP EP89310598A patent/EP0366321B1/de not_active Expired - Lifetime
- 1989-10-19 NO NO894172A patent/NO180028C/no unknown
- 1989-10-23 IE IE340389A patent/IE61183B1/en not_active IP Right Cessation
- 1989-10-23 AU AU43636/89A patent/AU607640B2/en not_active Ceased
- 1989-10-23 FI FI895029A patent/FI97573C/fi not_active IP Right Cessation
- 1989-10-23 BR BR898905389A patent/BR8905389A/pt not_active Application Discontinuation
- 1989-10-24 JP JP1275073A patent/JP2954951B2/ja not_active Expired - Fee Related
- 1989-10-24 DK DK529189A patent/DK529189A/da not_active Application Discontinuation
- 1989-10-24 NZ NZ231122A patent/NZ231122A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| ES2082786T3 (es) | 1996-04-01 |
| NO180028B (no) | 1996-10-21 |
| EP0366321B1 (de) | 1996-02-07 |
| EP0366321A3 (en) | 1990-06-20 |
| DE68925610T2 (de) | 1996-07-25 |
| NO894172D0 (no) | 1989-10-19 |
| NZ231122A (en) | 1990-08-28 |
| IE61183B1 (en) | 1994-10-05 |
| DK529189D0 (da) | 1989-10-24 |
| EP0366321A2 (de) | 1990-05-02 |
| FI97573B (fi) | 1996-09-30 |
| DE68925610D1 (de) | 1996-03-21 |
| AU607640B2 (en) | 1991-03-07 |
| NO180028C (no) | 1997-01-29 |
| IE893403L (en) | 1990-04-24 |
| FI97573C (fi) | 1997-01-10 |
| JPH02178663A (ja) | 1990-07-11 |
| DK529189A (da) | 1990-04-25 |
| FI895029A0 (fi) | 1989-10-23 |
| AU4363689A (en) | 1990-04-26 |
| JP2954951B2 (ja) | 1999-09-27 |
| BR8905389A (pt) | 1990-05-22 |
| NO894172L (no) | 1990-04-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |