ATA71783A - METHOD FOR PRODUCING OPTICALLY STRUCTURED FILTERS FOR ELECTROMAGNETIC RADIATION AND OPTICALLY STRUCTURED FILTERS - Google Patents
METHOD FOR PRODUCING OPTICALLY STRUCTURED FILTERS FOR ELECTROMAGNETIC RADIATION AND OPTICALLY STRUCTURED FILTERSInfo
- Publication number
- ATA71783A ATA71783A AT0071783A AT71783A ATA71783A AT A71783 A ATA71783 A AT A71783A AT 0071783 A AT0071783 A AT 0071783A AT 71783 A AT71783 A AT 71783A AT A71783 A ATA71783 A AT A71783A
- Authority
- AT
- Austria
- Prior art keywords
- pct
- filters
- optically structured
- electromagnetic radiation
- sec
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Glass Compositions (AREA)
- Optical Integrated Circuits (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PCT No. PCT/AT84/00010 Sec. 371 Date Oct. 12, 1984 Sec. 102(e) Date Oct. 12, 1984 PCT Filed Feb. 27, 1984 PCT Pub. No. WO84/03571 PCT Pub. Date Sep. 13, 1984.The invention relates to an optically structured filter with predominantly smooth or planar surfaces. Such filters are used as primary masks for the photolithographically manufacturing microelectronic elements, having with at least one pattern with a different transmission in relation to an electromagnetic radiation to be filtered. A filter layer consists of a material of locally homogeneous transmission into which ions, preferably metal ions with an energy of more than 1 keV, are implanted for producing the pattern(s) with the different transmission. This makes it possible to produce filters having patterns with regions of different transmissions for various wave lengths. Suitable materials to be used for the filter layer are materials such as inorganic and organic polymers and glasses as well as mono- and polycrystalline oxides or nitrides. The ion implantation itself is carried out by means of process steps known per se.
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT0071783A AT382040B (en) | 1983-03-01 | 1983-03-01 | METHOD FOR PRODUCING OPTICALLY STRUCTURED FILTERS FOR ELECTROMAGNETIC RADIATION AND OPTICALLY STRUCTURED FILTERS |
EP84900947A EP0136317A1 (en) | 1983-03-01 | 1984-02-27 | Optical structure filter and production method thereof |
JP59501710A JPS60502120A (en) | 1983-03-01 | 1984-02-27 | Optically configured filter and method of manufacturing the same |
PCT/AT1984/000010 WO1984003571A1 (en) | 1983-03-01 | 1984-02-27 | Optical structure filter and production method thereof |
US06/667,493 US4686162A (en) | 1983-03-01 | 1984-02-27 | Optically structured filter and process for its production |
EP84890035A EP0120834B1 (en) | 1983-03-01 | 1984-02-29 | Optically patterned filters and production process |
DE8484890035T DE3471531D1 (en) | 1983-03-01 | 1984-02-29 | Optically patterned filters and production process |
AT84890035T ATE34626T1 (en) | 1983-03-01 | 1984-02-29 | OPTICALLY STRUCTURED FILTER AND METHOD FOR PRODUCTION THEREOF. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT0071783A AT382040B (en) | 1983-03-01 | 1983-03-01 | METHOD FOR PRODUCING OPTICALLY STRUCTURED FILTERS FOR ELECTROMAGNETIC RADIATION AND OPTICALLY STRUCTURED FILTERS |
Publications (2)
Publication Number | Publication Date |
---|---|
ATA71783A true ATA71783A (en) | 1986-05-15 |
AT382040B AT382040B (en) | 1986-12-29 |
Family
ID=3497959
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT0071783A AT382040B (en) | 1983-03-01 | 1983-03-01 | METHOD FOR PRODUCING OPTICALLY STRUCTURED FILTERS FOR ELECTROMAGNETIC RADIATION AND OPTICALLY STRUCTURED FILTERS |
AT84890035T ATE34626T1 (en) | 1983-03-01 | 1984-02-29 | OPTICALLY STRUCTURED FILTER AND METHOD FOR PRODUCTION THEREOF. |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT84890035T ATE34626T1 (en) | 1983-03-01 | 1984-02-29 | OPTICALLY STRUCTURED FILTER AND METHOD FOR PRODUCTION THEREOF. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4686162A (en) |
EP (2) | EP0136317A1 (en) |
JP (1) | JPS60502120A (en) |
AT (2) | AT382040B (en) |
DE (1) | DE3471531D1 (en) |
WO (1) | WO1984003571A1 (en) |
Families Citing this family (52)
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---|---|---|---|---|
CA1270934A (en) * | 1985-03-20 | 1990-06-26 | Masataka Shirasaki | Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings |
CA1313792C (en) * | 1986-02-28 | 1993-02-23 | Junji Hirokane | Method of manufacturing photo-mask and photo-mask manufactured thereby |
DE3623637A1 (en) * | 1986-07-12 | 1988-01-21 | Kernforschungsz Karlsruhe | METHOD FOR PRODUCING MICROSTRUCTURES OF DIFFERENT STRUCTURAL HEIGHT BY MEANS OF X-RAY DEPTH LITHOGRAPHY |
JPS6370203A (en) * | 1986-09-11 | 1988-03-30 | Brother Ind Ltd | Manufacture of distributed index type optical waveguide lens |
JP2706237B2 (en) * | 1986-09-20 | 1998-01-28 | ブラザー工業株式会社 | Laser printer |
US4684436A (en) * | 1986-10-29 | 1987-08-04 | International Business Machines Corp. | Method of simultaneously etching personality and select |
IT1211939B (en) * | 1987-11-27 | 1989-11-08 | Siv Soc Italiana Vetro | PROCEDURE FOR THE MANUFACTURE OF GLASS WITH MODIFIED ENERGY CHARACTERISTICS AND PRODUCT SO OBTAINED |
JPH0296159A (en) * | 1988-10-03 | 1990-04-06 | Sanyo Electric Co Ltd | Production of mask for photolithography |
US5578402A (en) * | 1990-06-21 | 1996-11-26 | Matsushita Electronics Corporation | Photomask used by photolithography and a process of producing same |
TW198129B (en) * | 1990-06-21 | 1993-01-11 | Matsushita Electron Co Ltd | |
US5213916A (en) * | 1990-10-30 | 1993-05-25 | International Business Machines Corporation | Method of making a gray level mask |
US5660956A (en) * | 1990-11-29 | 1997-08-26 | Kabushiki Kaisha Toshiba | Reticle and method of fabricating reticle |
US5589305A (en) * | 1990-11-29 | 1996-12-31 | Kabushiki Kaisha Toshiba | Method of fabricating a reticle |
US5217830A (en) * | 1991-03-26 | 1993-06-08 | Micron Technology, Inc. | Method of fabricating phase shifting reticles using ion implantation |
US5208125A (en) * | 1991-07-30 | 1993-05-04 | Micron Technology, Inc. | Phase shifting reticle fabrication using ion implantation |
FR2695117B1 (en) * | 1992-08-28 | 1994-12-02 | Saint Gobain Vitrage Int | Process for treating thin layers with electrical conduction and / or reflection properties in the infrared. |
JPH06188270A (en) * | 1992-12-15 | 1994-07-08 | Mitsubishi Electric Corp | Manufacture of field effect transistor and pattern transfer mask |
WO1994017449A1 (en) * | 1993-01-21 | 1994-08-04 | Sematech, Inc. | Phase shifting mask structure with multilayer optical coating for improved transmission |
US5411824A (en) * | 1993-01-21 | 1995-05-02 | Sematech, Inc. | Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging |
US5418095A (en) * | 1993-01-21 | 1995-05-23 | Sematech, Inc. | Method of fabricating phase shifters with absorbing/attenuating sidewalls using an additive process |
US5314768A (en) * | 1993-03-19 | 1994-05-24 | National Semiconductor Corporation | Thin film mask for use in an x-ray lithographic process and its method of manufacture by forming opaque pattern of ions in a diamond layer |
US5679483A (en) * | 1994-12-20 | 1997-10-21 | Siemens Aktiengesellschaft | Embedded phase shifting photomasks and method for manufacturing same |
US7658772B2 (en) * | 1997-09-08 | 2010-02-09 | Borealis Technical Limited | Process for making electrode pairs |
US6106979A (en) | 1997-12-30 | 2000-08-22 | Micron Technology, Inc. | Use of attenuating phase-shifting mask for improved printability of clear-field patterns |
US6077630A (en) | 1998-01-08 | 2000-06-20 | Micron Technology, Inc. | Subresolution grating for attenuated phase shifting mask fabrication |
US6096457A (en) | 1998-02-27 | 2000-08-01 | Micron Technology, Inc. | Method for optimizing printing of a phase shift mask having a phase shift error |
US5998069A (en) | 1998-02-27 | 1999-12-07 | Micron Technology, Inc. | Electrically programmable photolithography mask |
US6117344A (en) * | 1998-03-20 | 2000-09-12 | Borealis Technical Limited | Method for manufacturing low work function surfaces |
US6064511A (en) * | 1998-03-31 | 2000-05-16 | The Research Foundation Of State University Of New York | Fabrication methods and structured materials for photonic devices |
US7651875B2 (en) * | 1998-06-08 | 2010-01-26 | Borealis Technical Limited | Catalysts |
US20070108437A1 (en) * | 1998-06-08 | 2007-05-17 | Avto Tavkhelidze | Method of fabrication of high temperature superconductors based on new mechanism of electron-electron interaction |
US7074498B2 (en) * | 2002-03-22 | 2006-07-11 | Borealis Technical Limited | Influence of surface geometry on metal properties |
US6680214B1 (en) | 1998-06-08 | 2004-01-20 | Borealis Technical Limited | Artificial band gap |
US8574663B2 (en) * | 2002-03-22 | 2013-11-05 | Borealis Technical Limited | Surface pairs |
DE10241708B4 (en) * | 2002-09-09 | 2005-09-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | A method of reducing the interfacial reflection of plastic substrates and such modified substrate and its use |
BRPI0414868A (en) * | 2003-10-03 | 2006-11-28 | Allergan Inc | compositions and methods comprising prostaglandin-related compounds and trifoliate factor family peptides for the treatment of glaucoma with reduced hyperemia |
GB0415426D0 (en) * | 2004-07-09 | 2004-08-11 | Borealis Tech Ltd | Thermionic vacuum diode device with adjustable electrodes |
US20060028685A1 (en) * | 2004-08-04 | 2006-02-09 | Nicole Proulx | Method for allowing users to specify multiple quality settings on mixed printouts |
US7550236B2 (en) * | 2004-09-29 | 2009-06-23 | Lsi Corporation | Multi wavelength mask for multi layer printing on a process substrate |
GB0501413D0 (en) * | 2005-01-24 | 2005-03-02 | Tavkhelidze Avto | Method for modification of built in potential of diodes |
US20060251971A1 (en) * | 2005-05-03 | 2006-11-09 | Richard Schenker | Photo-Mask with variable transmission by ion implantation |
GB0515635D0 (en) * | 2005-07-29 | 2005-09-07 | Harbron Stuart | Transistor |
GB0518132D0 (en) * | 2005-09-06 | 2005-10-12 | Cox Isaiah W | Cooling device using direct deposition of diode heat pump |
US7427786B1 (en) | 2006-01-24 | 2008-09-23 | Borealis Technical Limited | Diode device utilizing bellows |
US8227885B2 (en) | 2006-07-05 | 2012-07-24 | Borealis Technical Limited | Selective light absorbing semiconductor surface |
GB0617934D0 (en) * | 2006-09-12 | 2006-10-18 | Borealis Tech Ltd | Transistor |
GB0618268D0 (en) * | 2006-09-18 | 2006-10-25 | Tavkhelidze Avto | High efficiency solar cell with selective light absorbing surface |
GB0700071D0 (en) * | 2007-01-04 | 2007-02-07 | Borealis Tech Ltd | Multijunction solar cell |
US8816192B1 (en) | 2007-02-09 | 2014-08-26 | Borealis Technical Limited | Thin film solar cell |
MY171019A (en) * | 2009-04-13 | 2019-09-23 | Applied Materials Inc | Modification of magnetic properties of films using ion and neutral beam implantation |
WO2010146965A1 (en) * | 2009-06-20 | 2010-12-23 | シャープ株式会社 | Photo mask, photolithography method, substrate production method and display panel production method |
EP3243107A1 (en) | 2015-01-05 | 2017-11-15 | Marsupial Holdings LLC | Multi-tone amplitude photomask |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3682729A (en) * | 1969-12-30 | 1972-08-08 | Ibm | Method of changing the physical properties of a metallic film by ion beam formation and devices produced thereby |
US3940507A (en) * | 1974-05-03 | 1976-02-24 | Rca Corporation | Electron beam recording media and method of recording |
JPS609342B2 (en) * | 1975-05-28 | 1985-03-09 | 株式会社日立製作所 | How to make a pattern |
DE2643811C2 (en) * | 1975-10-28 | 1981-10-15 | Hughes Aircraft Co., Culver City, Calif. | Lithography mask with a membrane permeable to radiation and process for its manufacture |
CA1070855A (en) * | 1976-10-07 | 1980-01-29 | Tadayoshi Mifune | Mask for optical exposure |
US4144066A (en) * | 1977-11-30 | 1979-03-13 | Ppg Industries, Inc. | Electron bombardment method for making stained glass photomasks |
GB1583459A (en) * | 1977-12-20 | 1981-01-28 | Philips Electronic Associated | Masks their manufacture and the manufacture of microminiature solid-state devices using such masks |
JPS5573047A (en) * | 1978-11-25 | 1980-06-02 | Mitsubishi Electric Corp | Manufacture of photo mask |
JPS5619623A (en) * | 1979-07-27 | 1981-02-24 | Hitachi Ltd | Photomask |
FR2486251A1 (en) * | 1980-07-03 | 1982-01-08 | Commissariat Energie Atomique | METHOD FOR PRODUCING AN OPTICAL NETWORK |
JPS5754939A (en) * | 1980-09-19 | 1982-04-01 | Matsushita Electric Ind Co Ltd | Optical mask and its manufacture |
JPS57102019A (en) * | 1980-12-17 | 1982-06-24 | Mitsubishi Electric Corp | Failure correction of x-ray exposure mask |
JPS57157248A (en) * | 1981-03-23 | 1982-09-28 | Nec Corp | Preparation of optical exposure mask |
JPS5893052A (en) * | 1981-11-30 | 1983-06-02 | Seiko Epson Corp | Photomask |
US4548883A (en) * | 1983-05-31 | 1985-10-22 | At&T Bell Laboratories | Correction of lithographic masks |
-
1983
- 1983-03-01 AT AT0071783A patent/AT382040B/en not_active IP Right Cessation
-
1984
- 1984-02-27 JP JP59501710A patent/JPS60502120A/en active Pending
- 1984-02-27 WO PCT/AT1984/000010 patent/WO1984003571A1/en unknown
- 1984-02-27 US US06/667,493 patent/US4686162A/en not_active Expired - Fee Related
- 1984-02-27 EP EP84900947A patent/EP0136317A1/en not_active Withdrawn
- 1984-02-29 EP EP84890035A patent/EP0120834B1/en not_active Expired
- 1984-02-29 AT AT84890035T patent/ATE34626T1/en not_active IP Right Cessation
- 1984-02-29 DE DE8484890035T patent/DE3471531D1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
WO1984003571A1 (en) | 1984-09-13 |
DE3471531D1 (en) | 1988-06-30 |
ATE34626T1 (en) | 1988-06-15 |
EP0120834A1 (en) | 1984-10-03 |
JPS60502120A (en) | 1985-12-05 |
EP0120834B1 (en) | 1988-05-25 |
AT382040B (en) | 1986-12-29 |
US4686162A (en) | 1987-08-11 |
EP0136317A1 (en) | 1985-04-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ELJ | Ceased due to non-payment of the annual fee | ||
REN | Ceased due to non-payment of the annual fee |