ATA327085A - Plasmareaktor zum aetzen von leiterplatten - Google Patents

Plasmareaktor zum aetzen von leiterplatten

Info

Publication number
ATA327085A
ATA327085A AT327085A AT327085A ATA327085A AT A327085 A ATA327085 A AT A327085A AT 327085 A AT327085 A AT 327085A AT 327085 A AT327085 A AT 327085A AT A327085 A ATA327085 A AT A327085A
Authority
AT
Austria
Prior art keywords
plasma reactor
assemble pcb
pcb
assemble
reactor
Prior art date
Application number
AT327085A
Other languages
English (en)
Other versions
AT386316B (de
Inventor
Dieter Dr Wagner
Richard Dipl Ing Ehrenfeldner
Original Assignee
Voest Alpine Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Voest Alpine Ag filed Critical Voest Alpine Ag
Priority to AT327085A priority Critical patent/AT386316B/de
Publication of ATA327085A publication Critical patent/ATA327085A/de
Application granted granted Critical
Publication of AT386316B publication Critical patent/AT386316B/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0041—Etching of the substrate by chemical or physical means by plasma etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/09—Treatments involving charged particles
    • H05K2203/095—Plasma, e.g. for treating a substrate to improve adhesion with a conductor or for cleaning holes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0055—After-treatment, e.g. cleaning or desmearing of holes

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
AT327085A 1985-11-11 1985-11-11 Plasmareaktor zum aetzen von leiterplatten AT386316B (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT327085A AT386316B (de) 1985-11-11 1985-11-11 Plasmareaktor zum aetzen von leiterplatten

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT327085A AT386316B (de) 1985-11-11 1985-11-11 Plasmareaktor zum aetzen von leiterplatten

Publications (2)

Publication Number Publication Date
ATA327085A true ATA327085A (de) 1987-12-15
AT386316B AT386316B (de) 1988-08-10

Family

ID=3547996

Family Applications (1)

Application Number Title Priority Date Filing Date
AT327085A AT386316B (de) 1985-11-11 1985-11-11 Plasmareaktor zum aetzen von leiterplatten

Country Status (1)

Country Link
AT (1) AT386316B (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003007682A (ja) * 2001-06-25 2003-01-10 Matsushita Electric Ind Co Ltd プラズマ処理装置用の電極部材

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1512856A (en) * 1974-08-16 1978-06-01 Int Plasma Corp Plasma etching device and process
FR2312114A1 (fr) * 1975-05-22 1976-12-17 Ibm Attaque de materiaux par ions reactifs
JPS5378170A (en) * 1976-12-22 1978-07-11 Toshiba Corp Continuous processor for gas plasma etching
DE2654083A1 (de) * 1976-11-29 1978-06-01 Siemens Ag Plasmaaetzverfahren
DE2730819A1 (de) * 1977-07-07 1979-01-25 Siemens Ag Plasma-aetzverfahren

Also Published As

Publication number Publication date
AT386316B (de) 1988-08-10

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee
ELJ Ceased due to non-payment of the annual fee