AT374276B - Einrichtung zum schutz von plasmatronen hoher leistung - Google Patents

Einrichtung zum schutz von plasmatronen hoher leistung

Info

Publication number
AT374276B
AT374276B AT0756779A AT756779A AT374276B AT 374276 B AT374276 B AT 374276B AT 0756779 A AT0756779 A AT 0756779A AT 756779 A AT756779 A AT 756779A AT 374276 B AT374276 B AT 374276B
Authority
AT
Austria
Prior art keywords
plasmatron
protecting
high performance
performance
protecting plasmatron
Prior art date
Application number
AT0756779A
Other languages
German (de)
English (en)
Other versions
ATA756779A (de
Inventor
Bernd-Dieter Dipl Phys Wenzel
Harry Dr Ing Foerster
Jochen Boehme
Original Assignee
Mai Edelstahl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mai Edelstahl filed Critical Mai Edelstahl
Publication of ATA756779A publication Critical patent/ATA756779A/de
Application granted granted Critical
Publication of AT374276B publication Critical patent/AT374276B/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B7/00—Heating by electric discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3494—Means for controlling discharge parameters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Discharge Heating (AREA)
  • Furnace Details (AREA)
AT0756779A 1978-12-21 1979-11-29 Einrichtung zum schutz von plasmatronen hoher leistung AT374276B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD78210020A DD151248A1 (de) 1978-12-21 1978-12-21 Schutzvorrichtung fuer plasmatrone hoher leistung

Publications (2)

Publication Number Publication Date
ATA756779A ATA756779A (de) 1983-08-15
AT374276B true AT374276B (de) 1984-04-10

Family

ID=5516040

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0756779A AT374276B (de) 1978-12-21 1979-11-29 Einrichtung zum schutz von plasmatronen hoher leistung

Country Status (9)

Country Link
JP (1) JPS5595300A (ja)
AT (1) AT374276B (ja)
CH (1) CH643417A5 (ja)
DD (1) DD151248A1 (ja)
DE (1) DE2951121C2 (ja)
FR (1) FR2445089A1 (ja)
GB (1) GB2047509B (ja)
SE (1) SE432335B (ja)
YU (1) YU302579A (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0103545A3 (en) * 1982-09-13 1984-10-03 Arc Technologies Systems, Ltd. Electrode for arc furnaces
DE3435680A1 (de) * 1984-09-28 1986-04-03 Fried. Krupp Gmbh, 4300 Essen Plasmabrenner
GB2230993A (en) * 1988-10-26 1990-11-07 Inst Elektroswarki Patona Method and device for checking working capacity of plasmatron electrode
NL1040070C2 (nl) * 2013-02-27 2014-08-28 Hho Heating Systems B V Plasmatron en verwarmingsinrichtingen omvattende een plasmatron.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2140241C3 (de) * 1971-08-26 1975-02-27 Ilja Samojlowitsch Schapiro Verfahren zur Regelung des Betriebszustandes einer Anlage zur Plasmalichtbogenbearbeitung von Werkstücken und Plasmalichtbogenbearbeitungsanlage
DD132706A3 (de) * 1974-10-08 1978-10-25 Jochen Boehme Verfahren und einrichtung zum schutz der duesen von werkstueckgepolten plasmabrennern
DD131218A1 (de) * 1977-05-16 1978-06-07 Wenzel Bernd Dieter Plasmatron hoher leistung

Also Published As

Publication number Publication date
DE2951121A1 (de) 1982-11-11
SE432335B (sv) 1984-03-26
FR2445089B1 (ja) 1984-06-29
DD151248A1 (de) 1981-10-08
ATA756779A (de) 1983-08-15
DE2951121C2 (de) 1983-10-20
GB2047509B (en) 1983-02-16
CH643417A5 (de) 1984-05-30
SE7910466L (sv) 1980-06-22
JPS5595300A (en) 1980-07-19
GB2047509A (en) 1980-11-26
FR2445089A1 (fr) 1980-07-18
YU302579A (en) 1982-06-30

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