GB2047509A - High-power plasmatron - Google Patents

High-power plasmatron Download PDF

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Publication number
GB2047509A
GB2047509A GB7944200A GB7944200A GB2047509A GB 2047509 A GB2047509 A GB 2047509A GB 7944200 A GB7944200 A GB 7944200A GB 7944200 A GB7944200 A GB 7944200A GB 2047509 A GB2047509 A GB 2047509A
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GB
United Kingdom
Prior art keywords
nozzle
power
photodetectors
plasmatron
subsidiary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB7944200A
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GB2047509B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edelstahlwerk 8 Mai 1945 Freital VEB
Original Assignee
Edelstahlwerk 8 Mai 1945 Freital VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edelstahlwerk 8 Mai 1945 Freital VEB filed Critical Edelstahlwerk 8 Mai 1945 Freital VEB
Publication of GB2047509A publication Critical patent/GB2047509A/en
Application granted granted Critical
Publication of GB2047509B publication Critical patent/GB2047509B/en
Expired legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B7/00Heating by electric discharge
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/3494Means for controlling discharge parameters
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/36Circuit arrangements

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Discharge Heating (AREA)
  • Furnace Details (AREA)

Abstract

To prevent nozzle destruction in a high-power plasmatron such as is used in plasma melting furnaces photodetectors (5) are provided which can recognize heavy-current subsidiary arcs and supply control signals to a protective control circuit. The photodetectors (5) are disposed in the gap (6) between the cathode (3) and the nozzle (4), behind the nozzle outlet aperture so that they overlook adjoining zones of the outlet aperture. <IMAGE>

Description

SPECIFICATION High-power plasmatron The invention relates to a high-power plasmatron, more particularly for use in plasma melting furnaces.
Whereas in plasmatrons for cutting, the cathode is disposed downstream of the nozzle, which is formed as a constricted duct to narrow the plasma-gas discharge, in highpower plasmatrons with an unpowered, watercooled nozzle, such as are mainly used in plasma melting furnaces, the cathode is disposed in the nozzle, and the arc is formed in front of the nozzle. Moreover, in high-power plasmatrons, in the interests of saving gas and to facilitate furnace construction, the specific gas flow rates, related to arc power and the nozzle duct cross-section are lower by a factor of about 10 than in the case of low-power plasmatrons used, for instance, for cutting.
Consequently, the arc-stabilizing and arc-insulating effect provided by the gas jacket established by the flowing gas flow is extremely low. High-power plasmatrons are also operated in furnaces with a hot-i.e., ionized furnace atmosphere. It is very probable that subsidiary arcs will occur and burn via the nozzle to the material being treated. If such subsidiary arcs are of very heavy current, for example one kA or more, the nozzles become molten in as short a time as even less than 0.1 second, whereupon the cooling water emerges from the nozzle, and the plasmatron ceases to function.The known electric monitoring devices for the nozzles of high-power plasmatrons are unsatisfactory, since either due to the small cool gas jacket no subsidiary arc can be recognized by a change in the electric parameters, or low-power subsidiary arcs, which are not dangerous to the nozzle, are not distinguished from high-power subsidiary arcs.
It is an object of the invention to provide a high-power plasmatron which is protected against nozzle destruction due to subsidiary arcs.
Another object of the invention is to enable the recognition of heavy-current subsidiary arcs, which quickly destroy the nozzles of high-power plasmatrons, so as to enable the taking of suitable steps to limit the effect of such arcs.
The invention consists in a high-power plasmatron comprising a pin-type cathode enclosed by a nozzle providing a gap for the passage of a plasma-forming gas, a plurality of photodetectors being disposed behind the nozzle outlet aperture in the gap between the cathode and the nozzle and so arranged that they overlook adjoining zones of the outlet aperture, the photodetectors serving for providing control signals for a protective control circuit of the plasmatron.
The photodetectors are preferably disposed so as far behind the cathode that a small angle of aperture is ensured for monitoring a partial zone of the nozzle outlet aperture by each photodetector. There should be a low surrounding temperature in the zones where the photodetectors are disposed. Although the photodetectors are facing the main arc, if subsidiary arcs occur between the cathode and the nozzle an additional light radiation is produced which can be detected by the photodetectors: This additional light radiation depends on the current strength of the subsidiary arc and may be utilized for further switching actions from a subsidiary arc power of 10% of the main arc power onwards.
When a heavy-current subsidiary arc is detected by one of the photodetectors, a control circuit in the power circuit of the plasmatron may be brought into operation in known manner, for immediately causing interruption of the subsidiary arcs by reducing the power of the main arc.
Advantageously, the photodetectors are disposed in the supply zone of the plasmaforming gas, and light-conducting cables are provided which extend from the nozzle gap to the photodetectors.
In order to make the invention clearly understood, reference will now be made to the accompanying drawing which is given by way of example and which is a diagrammatic sectional view of a plasmatron of the invention, shown disposed in a furnace.
A high-power plasmatron is disposed in a furnace 1. The plasmatron comprises a pintype cathode 3 mounted in a water-cooled retaining means 2 and surrounded by a watercooled nozzle 4. A nozzle gap is defined between the nozzle 4 and the cathode 3.
Photodetectors 5 are provided in the nozzle gap, their optical axes being directed towards the nozzle outlet aperture 6.
When a subsidiary arc occurs in the nozzle gap, an increase in light radiation is detected by at least one of the photodetectors 5. The electric signal from the said one photodetector is supplied in a suitable manner by known switching elements to a control circuit, which acts accordingly on the power source of the plasmatron to reduce the main arc current.
The material for melting in the furnace is denoted by the reference numeral 7 and the main arc by the reference numeral 8.
1. A high-power plasmatron comprising a pin-type cathode enclosed by a nozzle providing a gap for the passage of a plasma-forming gas, a plurality of photodetectors being disposed behind the nozzle outlet aperture in the gap between the cathode and the nozzle and so arranged that they overlook adjoining zones of the outlet aperture, the photodetectors serving for providing control signals for a
**WARNING** end of DESC field may overlap start of CLMS **.

Claims (3)

**WARNING** start of CLMS field may overlap end of DESC **. SPECIFICATION High-power plasmatron The invention relates to a high-power plasmatron, more particularly for use in plasma melting furnaces. Whereas in plasmatrons for cutting, the cathode is disposed downstream of the nozzle, which is formed as a constricted duct to narrow the plasma-gas discharge, in highpower plasmatrons with an unpowered, watercooled nozzle, such as are mainly used in plasma melting furnaces, the cathode is disposed in the nozzle, and the arc is formed in front of the nozzle. Moreover, in high-power plasmatrons, in the interests of saving gas and to facilitate furnace construction, the specific gas flow rates, related to arc power and the nozzle duct cross-section are lower by a factor of about 10 than in the case of low-power plasmatrons used, for instance, for cutting. Consequently, the arc-stabilizing and arc-insulating effect provided by the gas jacket established by the flowing gas flow is extremely low. High-power plasmatrons are also operated in furnaces with a hot-i.e., ionized furnace atmosphere. It is very probable that subsidiary arcs will occur and burn via the nozzle to the material being treated. If such subsidiary arcs are of very heavy current, for example one kA or more, the nozzles become molten in as short a time as even less than 0.1 second, whereupon the cooling water emerges from the nozzle, and the plasmatron ceases to function.The known electric monitoring devices for the nozzles of high-power plasmatrons are unsatisfactory, since either due to the small cool gas jacket no subsidiary arc can be recognized by a change in the electric parameters, or low-power subsidiary arcs, which are not dangerous to the nozzle, are not distinguished from high-power subsidiary arcs. It is an object of the invention to provide a high-power plasmatron which is protected against nozzle destruction due to subsidiary arcs. Another object of the invention is to enable the recognition of heavy-current subsidiary arcs, which quickly destroy the nozzles of high-power plasmatrons, so as to enable the taking of suitable steps to limit the effect of such arcs. The invention consists in a high-power plasmatron comprising a pin-type cathode enclosed by a nozzle providing a gap for the passage of a plasma-forming gas, a plurality of photodetectors being disposed behind the nozzle outlet aperture in the gap between the cathode and the nozzle and so arranged that they overlook adjoining zones of the outlet aperture, the photodetectors serving for providing control signals for a protective control circuit of the plasmatron. The photodetectors are preferably disposed so as far behind the cathode that a small angle of aperture is ensured for monitoring a partial zone of the nozzle outlet aperture by each photodetector. There should be a low surrounding temperature in the zones where the photodetectors are disposed. Although the photodetectors are facing the main arc, if subsidiary arcs occur between the cathode and the nozzle an additional light radiation is produced which can be detected by the photodetectors: This additional light radiation depends on the current strength of the subsidiary arc and may be utilized for further switching actions from a subsidiary arc power of 10% of the main arc power onwards. When a heavy-current subsidiary arc is detected by one of the photodetectors, a control circuit in the power circuit of the plasmatron may be brought into operation in known manner, for immediately causing interruption of the subsidiary arcs by reducing the power of the main arc. Advantageously, the photodetectors are disposed in the supply zone of the plasmaforming gas, and light-conducting cables are provided which extend from the nozzle gap to the photodetectors. In order to make the invention clearly understood, reference will now be made to the accompanying drawing which is given by way of example and which is a diagrammatic sectional view of a plasmatron of the invention, shown disposed in a furnace. A high-power plasmatron is disposed in a furnace 1. The plasmatron comprises a pintype cathode 3 mounted in a water-cooled retaining means 2 and surrounded by a watercooled nozzle 4. A nozzle gap is defined between the nozzle 4 and the cathode 3. Photodetectors 5 are provided in the nozzle gap, their optical axes being directed towards the nozzle outlet aperture 6. When a subsidiary arc occurs in the nozzle gap, an increase in light radiation is detected by at least one of the photodetectors 5. The electric signal from the said one photodetector is supplied in a suitable manner by known switching elements to a control circuit, which acts accordingly on the power source of the plasmatron to reduce the main arc current. The material for melting in the furnace is denoted by the reference numeral 7 and the main arc by the reference numeral 8. CLAIMS
1. A high-power plasmatron comprising a pin-type cathode enclosed by a nozzle providing a gap for the passage of a plasma-forming gas, a plurality of photodetectors being disposed behind the nozzle outlet aperture in the gap between the cathode and the nozzle and so arranged that they overlook adjoining zones of the outlet aperture, the photodetectors serving for providing control signals for a protective control circuit of the plasmatron.
2. A plasmatron as claimed in claim 1, wherein the photodetectors are disposed in the supply zone of the plasma-forming gas, and light-conducting cables are provided which extend from the nozzle gap to the photodetectors.
3. A high-power plasmatron constructed and arranged substantially as hereinbefore described with reference to the accompanying drawing.
GB7944200A 1978-12-21 1979-12-21 High-power plasmatron Expired GB2047509B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD78210020A DD151248A1 (en) 1978-12-21 1978-12-21 PROTECTION DEVICE FOR PLASMATRONES HIGH PERFORMANCE

Publications (2)

Publication Number Publication Date
GB2047509A true GB2047509A (en) 1980-11-26
GB2047509B GB2047509B (en) 1983-02-16

Family

ID=5516040

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7944200A Expired GB2047509B (en) 1978-12-21 1979-12-21 High-power plasmatron

Country Status (9)

Country Link
JP (1) JPS5595300A (en)
AT (1) AT374276B (en)
CH (1) CH643417A5 (en)
DD (1) DD151248A1 (en)
DE (1) DE2951121C2 (en)
FR (1) FR2445089A1 (en)
GB (1) GB2047509B (en)
SE (1) SE432335B (en)
YU (1) YU302579A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014133382A1 (en) * 2013-02-27 2014-09-04 Hho Heating Systems B.V. Plasmatron and heating devices comprising a plasmatron

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0103545A3 (en) * 1982-09-13 1984-10-03 Arc Technologies Systems, Ltd. Electrode for arc furnaces
DE3435680A1 (en) * 1984-09-28 1986-04-03 Fried. Krupp Gmbh, 4300 Essen PLASMA TORCH
WO1990004484A1 (en) * 1988-10-26 1990-05-03 Institut Elektrosvarki Imeni E.O.Patona Akademii Nauk Ukrainskoi Ssr Method and device for checking working capacity of plasmatron electrode

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2140241C3 (en) * 1971-08-26 1975-02-27 Ilja Samojlowitsch Schapiro Method for regulating the operating status of a system for plasma arc processing of workpieces and plasma arc processing system
DD132706A3 (en) * 1974-10-08 1978-10-25 Jochen Boehme METHOD AND DEVICE FOR PROTECTING THE DUTIES OF WORK-PLASTERED PLASMA ROLLERS
DD131218A1 (en) * 1977-05-16 1978-06-07 Wenzel Bernd Dieter PLASMATRON HIGH PERFORMANCE

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014133382A1 (en) * 2013-02-27 2014-09-04 Hho Heating Systems B.V. Plasmatron and heating devices comprising a plasmatron

Also Published As

Publication number Publication date
SE7910466L (en) 1980-06-22
GB2047509B (en) 1983-02-16
FR2445089B1 (en) 1984-06-29
ATA756779A (en) 1983-08-15
CH643417A5 (en) 1984-05-30
SE432335B (en) 1984-03-26
FR2445089A1 (en) 1980-07-18
DE2951121A1 (en) 1982-11-11
YU302579A (en) 1982-06-30
AT374276B (en) 1984-04-10
DD151248A1 (en) 1981-10-08
JPS5595300A (en) 1980-07-19
DE2951121C2 (en) 1983-10-20

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