AT340694B - Verfahren zur herstellung von reliefstrukturen - Google Patents

Verfahren zur herstellung von reliefstrukturen

Info

Publication number
AT340694B
AT340694B AT417174A AT417174A AT340694B AT 340694 B AT340694 B AT 340694B AT 417174 A AT417174 A AT 417174A AT 417174 A AT417174 A AT 417174A AT 340694 B AT340694 B AT 340694B
Authority
AT
Austria
Prior art keywords
production
relief structures
relief
structures
Prior art date
Application number
AT417174A
Other languages
English (en)
Other versions
ATA417174A (de
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of ATA417174A publication Critical patent/ATA417174A/de
Application granted granted Critical
Publication of AT340694B publication Critical patent/AT340694B/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387Polyamides or polyimides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • H01G4/14Organic dielectrics
    • H01G4/145Organic dielectrics vapour deposited
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3157Partial encapsulation or coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • H01L23/485Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00Electric solid-state thin-film or thick-film devices, not otherwise provided for
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12044OLED
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19041Component type being a capacitor
AT417174A 1973-05-23 1974-05-20 Verfahren zur herstellung von reliefstrukturen AT340694B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2326314A DE2326314C2 (de) 1973-05-23 1973-05-23 Verfahren zur Herstellung von Reliefstrukturen

Publications (2)

Publication Number Publication Date
ATA417174A ATA417174A (de) 1977-04-15
AT340694B true AT340694B (de) 1977-12-27

Family

ID=5881922

Family Applications (1)

Application Number Title Priority Date Filing Date
AT417174A AT340694B (de) 1973-05-23 1974-05-20 Verfahren zur herstellung von reliefstrukturen

Country Status (9)

Country Link
US (1) US3953877A (de)
JP (1) JPS5021678A (de)
AT (1) AT340694B (de)
BE (1) BE815392R (de)
DE (1) DE2326314C2 (de)
GB (1) GB1474231A (de)
IT (1) IT1046128B (de)
LU (1) LU70148A1 (de)
NL (1) NL7406905A (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421165A (en) * 1977-07-18 1979-02-17 Nec Corp Semiconductor device
US4644380A (en) * 1977-12-08 1987-02-17 University Of Pennsylvania Substance-sensitive electrical structures
JPS5952822B2 (ja) * 1978-04-14 1984-12-21 東レ株式会社 耐熱性感光材料
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
JPS5568659A (en) * 1978-11-20 1980-05-23 Hitachi Ltd Semiconductor device and manufacturing method thereof
US4369247A (en) * 1980-09-03 1983-01-18 E. I. Du Pont De Nemours And Company Process of producing relief structures using polyamide ester resins
US4414312A (en) * 1980-09-03 1983-11-08 E. I. Du Pont De Nemours & Co. Photopolymerizable polyamide ester resin compositions containing an oxygen scavenger
US4329419A (en) * 1980-09-03 1982-05-11 E. I. Du Pont De Nemours And Company Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors
US4410612A (en) * 1980-09-03 1983-10-18 E. I. Du Pont De Nemours And Company Electrical device formed from polymeric heat resistant photopolymerizable composition
JPS57202607A (en) * 1981-06-08 1982-12-11 Fujikura Ltd Self-adhesive insulated wire
JPS57202608A (en) * 1981-06-08 1982-12-11 Fujikura Ltd Self-adhesive insulated wire
US4558333A (en) * 1981-07-09 1985-12-10 Canon Kabushiki Kaisha Liquid jet recording head
DE3132452A1 (de) * 1981-08-17 1983-02-24 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen einer nach dem galvanischen aufbau von metallischen strukturen planaren strukturebene
US4536240A (en) 1981-12-02 1985-08-20 Advanced Semiconductor Products, Inc. Method of forming thin optical membranes
US4483759A (en) * 1982-07-02 1984-11-20 Thermedics, Inc. Actinic radiation cured polyurethane acrylic copolymer
JPS6012744A (ja) * 1983-07-01 1985-01-23 Hitachi Ltd 半導体装置
US5051814A (en) * 1987-04-15 1991-09-24 The Board Of Trustees Of The Leland Stanford Junior University Method of providing stress-free thermally-conducting attachment of two bodies
US5250388A (en) * 1988-05-31 1993-10-05 Westinghouse Electric Corp. Production of highly conductive polymers for electronic circuits
JPH02105418A (ja) * 1988-10-14 1990-04-18 Mitsubishi Electric Corp 樹脂封止型半導体装置
US5187241A (en) * 1990-05-15 1993-02-16 International Business Machines Corporation Isoimide modifications of a polyimide and reaction thereof with nucleophiles
DE4217688A1 (de) * 1992-05-29 1993-12-02 Basf Lacke & Farben Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen
US5929512A (en) * 1997-03-18 1999-07-27 Jacobs; Richard L. Urethane encapsulated integrated circuits and compositions therefor
JP4530284B2 (ja) * 2004-10-07 2010-08-25 信越化学工業株式会社 ポリイミド系光硬化性樹脂組成物並びにパターン形成方法及び基板保護用皮膜
JP4771412B2 (ja) * 2005-02-14 2011-09-14 信越化学工業株式会社 感光性樹脂及びその製造方法
JP4386454B2 (ja) * 2006-08-22 2009-12-16 信越化学工業株式会社 アルカリ水溶液に可溶な感光性ポリイミド樹脂、該樹脂を含む組成物、及び該組成物から得られる膜

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3179634A (en) * 1962-01-26 1965-04-20 Du Pont Aromatic polyimides and the process for preparing them
US3249829A (en) * 1962-05-18 1966-05-03 Transitron Electronic Corp Encapsulated diode assembly
US3332912A (en) * 1963-12-18 1967-07-25 Ibm Component with standoff and method of making same
US3405224A (en) * 1966-04-20 1968-10-08 Nippon Electric Co Sealed enclosure for electronic device
US3495996A (en) * 1966-05-13 1970-02-17 Ibm Ceramic composition,improved electronic devices employing same,and method of fabrication
GB1230421A (de) * 1967-09-15 1971-05-05
NL6810338A (de) * 1968-07-19 1970-01-21
US3684592A (en) * 1969-09-30 1972-08-15 Westinghouse Electric Corp Passivated surfaces and protective coatings for semiconductor devices and processes for producing the same
FR2083799A5 (de) * 1970-03-27 1971-12-17 Tokyo Shibaura Electric Co
US3653959A (en) * 1970-04-14 1972-04-04 Grace W R & Co Encapsulating and potting composition and process
NL177718C (nl) * 1973-02-22 1985-11-01 Siemens Ag Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren.

Also Published As

Publication number Publication date
DE2326314A1 (de) 1974-12-19
GB1474231A (en) 1977-05-18
LU70148A1 (de) 1975-02-24
ATA417174A (de) 1977-04-15
US3953877A (en) 1976-04-27
BE815392R (fr) 1974-11-22
NL7406905A (de) 1974-11-26
JPS5021678A (de) 1975-03-07
DE2326314C2 (de) 1983-10-27
IT1046128B (it) 1980-06-30

Similar Documents

Publication Publication Date Title
AT330469B (de) Verfahren zur herstellung von reliefstrukturen
AT334331B (de) Verfahren zur herstellung von alpha- acyloxycarbonylverbindungen
AT340694B (de) Verfahren zur herstellung von reliefstrukturen
ATA600574A (de) Verfahren zur herstellung von polylactonen
AT333954B (de) Verfahren zur herstellung von alpha-6-deoxytetracyclinen
AT330352B (de) Verfahren zur herstellung von 7beta-amino-7alpha-methoxy -3- cephemestern
AT334875B (de) Verfahren zur herstellung von benzotrifluorid
AT340919B (de) Verfahren zur herstellung von triacetonamin
AT352406B (de) Verfahren zur herstellung von reliefstrukturen
AT334869B (de) Verfahren zur herstellung von 3-ketoglutarsaure
ATA425874A (de) Verfahren zur herstellung von 2-arylprorionaldehyden
AT340043B (de) Verfahren zur herstellung von alfa-6-deoxytetracyclinen
AT338264B (de) Verfahren zur herstellung von triacetonamin
AT335993B (de) Verfahren zur herstellung von atherpolycarbonsauren
AT335059B (de) Verfahren zur herstellung von alfa-6-deoxy-tetracyclin
AT338763B (de) Verfahren zur herstellung von alfa-athinylbenzhydrolen
DD114089A5 (de) Verfahren zur herstellung von halogenhaltigen tertiaeren phosphinoziden
AT338982B (de) Verfahren zur herstellung von 17beta-oxalylsteroiden
AT330166B (de) Verfahren zur herstellung von neuen 2-aminoindanderivaten
AT337371B (de) Verfahren zur herstellung von neuen cardenoliden
AT335990B (de) Verfahren zur herstellung von 6-methyl-5-hepten-2-on
AT335415B (de) Verfahren zur herstellung von epsilon-aminocapronsaureamid
AT329043B (de) Verfahren zur herstellung von 1-nitro-antrachinon
AT334369B (de) Verfahren zur herstellung von oxadiazolinon-derivaten
CH553748A (de) Verfahren zur herstellung von aminoadamantan-derivaten.

Legal Events

Date Code Title Description
ELA Expired due to lapse of time