AT294511B - Device for rotating the sputtering chamber of a vacuum vapor deposition system - Google Patents

Device for rotating the sputtering chamber of a vacuum vapor deposition system

Info

Publication number
AT294511B
AT294511B AT642667A AT642667A AT294511B AT 294511 B AT294511 B AT 294511B AT 642667 A AT642667 A AT 642667A AT 642667 A AT642667 A AT 642667A AT 294511 B AT294511 B AT 294511B
Authority
AT
Austria
Prior art keywords
rotating
vapor deposition
deposition system
vacuum vapor
sputtering chamber
Prior art date
Application number
AT642667A
Other languages
German (de)
Original Assignee
Libbey Owens Ford Glass Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Glass Co filed Critical Libbey Owens Ford Glass Co
Application granted granted Critical
Publication of AT294511B publication Critical patent/AT294511B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Sealing Using Fluids, Sealing Without Contact, And Removal Of Oil (AREA)
AT642667A 1966-07-13 1967-07-10 Device for rotating the sputtering chamber of a vacuum vapor deposition system AT294511B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US564811A US3360600A (en) 1966-07-13 1966-07-13 Vapor source assembly

Publications (1)

Publication Number Publication Date
AT294511B true AT294511B (en) 1971-11-25

Family

ID=24255989

Family Applications (1)

Application Number Title Priority Date Filing Date
AT642667A AT294511B (en) 1966-07-13 1967-07-10 Device for rotating the sputtering chamber of a vacuum vapor deposition system

Country Status (10)

Country Link
US (1) US3360600A (en)
AT (1) AT294511B (en)
BE (1) BE701306A (en)
CH (1) CH463232A (en)
ES (1) ES342858A1 (en)
GB (1) GB1151126A (en)
LU (1) LU53955A1 (en)
NL (1) NL6709464A (en)
NO (1) NO127425B (en)
SE (1) SE335269B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3502499A (en) * 1967-05-22 1970-03-24 Texas Instruments Inc Cladding method and apparatus
US3613633A (en) * 1970-03-18 1971-10-19 Schjeldahl Co G T Method and apparatus for coating articles utilizing rotating crucible coating apparatus including a centrifugal-type crucible
US4048462A (en) * 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
DE2519537C2 (en) * 1975-05-02 1982-11-04 Leybold-Heraeus GmbH, 5000 Köln Electron beam device for heating, melting and evaporation purposes with deflection systems
DE3228311C2 (en) * 1982-07-29 1984-07-05 Leybold-Heraeus GmbH, 5000 Köln Evaporation crucible for vacuum evaporation systems
KR101785562B1 (en) * 2010-10-18 2017-10-18 삼성디스플레이 주식회사 Thin film depositing apparatus for continuous depositing and mask unit and crucible unit included in the thin film depositing apparatus

Also Published As

Publication number Publication date
NO127425B (en) 1973-06-18
ES342858A1 (en) 1968-08-16
US3360600A (en) 1967-12-26
BE701306A (en) 1967-12-18
SE335269B (en) 1971-05-17
DE1621203B2 (en) 1972-12-28
CH463232A (en) 1968-09-30
LU53955A1 (en) 1967-08-28
NL6709464A (en) 1968-01-15
GB1151126A (en) 1969-05-07
DE1621203A1 (en) 1971-06-03

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee