AT294139B - Positiv arbeitende lichtempfindliche Flachdruckplatte - Google Patents

Positiv arbeitende lichtempfindliche Flachdruckplatte

Info

Publication number
AT294139B
AT294139B AT1206369A AT1206369A AT294139B AT 294139 B AT294139 B AT 294139B AT 1206369 A AT1206369 A AT 1206369A AT 1206369 A AT1206369 A AT 1206369A AT 294139 B AT294139 B AT 294139B
Authority
AT
Austria
Prior art keywords
printing plate
planographic printing
positive working
working photosensitive
photosensitive planographic
Prior art date
Application number
AT1206369A
Other languages
English (en)
Original Assignee
Howson Algraphy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to GB37485/67A priority Critical patent/GB1243963A/en
Application filed by Howson Algraphy Ltd filed Critical Howson Algraphy Ltd
Priority to AT1206369A priority patent/AT294139B/de
Priority to NL6919546A priority patent/NL166135C/xx
Priority to CH1944269A priority patent/CH533322A/de
Priority to BE744002D priority patent/BE744002A/xx
Priority to FR7000950A priority patent/FR2076347A5/fr
Priority to US00167438A priority patent/US3802885A/en
Priority claimed from US00167438A external-priority patent/US3802885A/en
Application granted granted Critical
Publication of AT294139B publication Critical patent/AT294139B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AT1206369A 1967-08-15 1969-12-29 Positiv arbeitende lichtempfindliche Flachdruckplatte AT294139B (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB37485/67A GB1243963A (en) 1967-08-15 1967-08-15 Improvements in or relating to light sensitive lithographic plates
AT1206369A AT294139B (de) 1967-08-15 1969-12-29 Positiv arbeitende lichtempfindliche Flachdruckplatte
NL6919546A NL166135C (nl) 1967-08-15 1969-12-30 Positief werkende lichtgevoelige plaat voor de vervaar- diging van een drukplaat.
CH1944269A CH533322A (de) 1967-08-15 1969-12-30 Positiv arbeitende lichtempfindliche Flachdruckplatte und Verfahren zu ihrer Herstellung
BE744002D BE744002A (fr) 1967-08-15 1970-01-02 Plaques d'impression lithographiques,
FR7000950A FR2076347A5 (de) 1967-08-15 1970-01-12
US00167438A US3802885A (en) 1967-08-15 1971-07-29 Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
GB37485/67A GB1243963A (en) 1967-08-15 1967-08-15 Improvements in or relating to light sensitive lithographic plates
AT1206369A AT294139B (de) 1967-08-15 1969-12-29 Positiv arbeitende lichtempfindliche Flachdruckplatte
NL6919546A NL166135C (nl) 1967-08-15 1969-12-30 Positief werkende lichtgevoelige plaat voor de vervaar- diging van een drukplaat.
CH1944269A CH533322A (de) 1967-08-15 1969-12-30 Positiv arbeitende lichtempfindliche Flachdruckplatte und Verfahren zu ihrer Herstellung
BE744002 1970-01-02
FR7000950A FR2076347A5 (de) 1967-08-15 1970-01-12
US00167438A US3802885A (en) 1967-08-15 1971-07-29 Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base

Publications (1)

Publication Number Publication Date
AT294139B true AT294139B (de) 1971-11-10

Family

ID=27560463

Family Applications (1)

Application Number Title Priority Date Filing Date
AT1206369A AT294139B (de) 1967-08-15 1969-12-29 Positiv arbeitende lichtempfindliche Flachdruckplatte

Country Status (6)

Country Link
AT (1) AT294139B (de)
BE (1) BE744002A (de)
CH (1) CH533322A (de)
FR (1) FR2076347A5 (de)
GB (1) GB1243963A (de)
NL (1) NL166135C (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
US5212043A (en) * 1988-02-17 1993-05-18 Tosho Corporation Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent
CA2097791A1 (en) * 1992-08-28 1994-03-01 Sunit S. Dixit High aspect ratio, flexible thick film positive photoresist
EP1388759A1 (de) * 2002-08-06 2004-02-11 Shin-Etsu Chemical Co., Ltd. Positiv-arbeitende Fotolackzusammensetzung

Also Published As

Publication number Publication date
GB1243963A (en) 1971-08-25
NL166135C (nl) 1981-06-15
CH533322A (de) 1973-01-31
FR2076347A5 (de) 1971-10-15
NL166135B (nl) 1981-01-15
NL6919546A (de) 1971-07-02
BE744002A (fr) 1970-06-15

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee