FR2076347A5 - - Google Patents

Info

Publication number
FR2076347A5
FR2076347A5 FR7000950A FR7000950A FR2076347A5 FR 2076347 A5 FR2076347 A5 FR 2076347A5 FR 7000950 A FR7000950 A FR 7000950A FR 7000950 A FR7000950 A FR 7000950A FR 2076347 A5 FR2076347 A5 FR 2076347A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7000950A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Howson Algraphy Ltd
Original Assignee
Howson Algraphy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to GB37485/67A priority Critical patent/GB1243963A/en
Priority to AT1206369A priority patent/AT294139B/de
Priority to CH1944269A priority patent/CH533322A/de
Priority to NL6919546A priority patent/NL166135C/xx
Priority to BE744002D priority patent/BE744002A/fr
Application filed by Howson Algraphy Ltd filed Critical Howson Algraphy Ltd
Priority to FR7000950A priority patent/FR2076347A5/fr
Priority to US00167438A priority patent/US3802885A/en
Priority claimed from US00167438A external-priority patent/US3802885A/en
Application granted granted Critical
Publication of FR2076347A5 publication Critical patent/FR2076347A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7000950A 1967-08-15 1970-01-12 Expired FR2076347A5 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB37485/67A GB1243963A (en) 1967-08-15 1967-08-15 Improvements in or relating to light sensitive lithographic plates
AT1206369A AT294139B (de) 1967-08-15 1969-12-29 Positiv arbeitende lichtempfindliche Flachdruckplatte
CH1944269A CH533322A (de) 1967-08-15 1969-12-30 Positiv arbeitende lichtempfindliche Flachdruckplatte und Verfahren zu ihrer Herstellung
NL6919546A NL166135C (nl) 1967-08-15 1969-12-30 Positief werkende lichtgevoelige plaat voor de vervaar- diging van een drukplaat.
BE744002D BE744002A (fr) 1967-08-15 1970-01-02 Plaques d'impression lithographiques,
FR7000950A FR2076347A5 (fr) 1967-08-15 1970-01-12
US00167438A US3802885A (en) 1967-08-15 1971-07-29 Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
GB37485/67A GB1243963A (en) 1967-08-15 1967-08-15 Improvements in or relating to light sensitive lithographic plates
AT1206369A AT294139B (de) 1967-08-15 1969-12-29 Positiv arbeitende lichtempfindliche Flachdruckplatte
CH1944269A CH533322A (de) 1967-08-15 1969-12-30 Positiv arbeitende lichtempfindliche Flachdruckplatte und Verfahren zu ihrer Herstellung
NL6919546A NL166135C (nl) 1967-08-15 1969-12-30 Positief werkende lichtgevoelige plaat voor de vervaar- diging van een drukplaat.
BE744002 1970-01-02
FR7000950A FR2076347A5 (fr) 1967-08-15 1970-01-12
US00167438A US3802885A (en) 1967-08-15 1971-07-29 Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base

Publications (1)

Publication Number Publication Date
FR2076347A5 true FR2076347A5 (fr) 1971-10-15

Family

ID=27560463

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7000950A Expired FR2076347A5 (fr) 1967-08-15 1970-01-12

Country Status (6)

Country Link
AT (1) AT294139B (fr)
BE (1) BE744002A (fr)
CH (1) CH533322A (fr)
FR (1) FR2076347A5 (fr)
GB (1) GB1243963A (fr)
NL (1) NL166135C (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
WO1989007786A1 (fr) * 1988-02-17 1989-08-24 Tosoh Corporation Composition d'une photoreserve
CA2097791A1 (fr) * 1992-08-28 1994-03-01 Sunit S. Dixit Resine photosensible positive souple en couche epaisse a rapport dimensionnel eleve
US6773858B2 (en) 2002-08-06 2004-08-10 Shin-Etsu Chemical Co., Ltd. Positive photoresist composition

Also Published As

Publication number Publication date
NL6919546A (fr) 1971-07-02
CH533322A (de) 1973-01-31
NL166135C (nl) 1981-06-15
GB1243963A (en) 1971-08-25
AT294139B (de) 1971-11-10
BE744002A (fr) 1970-06-15
NL166135B (nl) 1981-01-15

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Legal Events

Date Code Title Description
CD Change of name or company name
ST Notification of lapse