AT175151B - Lichtempfindliche Schichten für die photomechanische Reproduktion - Google Patents

Lichtempfindliche Schichten für die photomechanische Reproduktion

Info

Publication number
AT175151B
AT175151B AT175151DA AT175151B AT 175151 B AT175151 B AT 175151B AT 175151D A AT175151D A AT 175151DA AT 175151 B AT175151 B AT 175151B
Authority
AT
Austria
Prior art keywords
photosensitive layers
photomechanical reproduction
photomechanical
reproduction
photosensitive
Prior art date
Application number
Other languages
German (de)
English (en)
Original Assignee
Kalle & Co Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle & Co Ag filed Critical Kalle & Co Ag
Application granted granted Critical
Publication of AT175151B publication Critical patent/AT175151B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
AT175151D 1950-10-31 1951-10-17 Lichtempfindliche Schichten für die photomechanische Reproduktion AT175151B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK7867A DE865860C (de) 1950-10-31 1950-10-31 Lichtempfindliche Schichten fuer die photomechanische Reproduktion

Publications (1)

Publication Number Publication Date
AT175151B true AT175151B (de) 1953-06-10

Family

ID=7211722

Family Applications (1)

Application Number Title Priority Date Filing Date
AT175151D AT175151B (de) 1950-10-31 1951-10-17 Lichtempfindliche Schichten für die photomechanische Reproduktion

Country Status (8)

Country Link
US (1) US3046120A (OSRAM)
AT (1) AT175151B (OSRAM)
BE (1) BE506677A (OSRAM)
CH (1) CH300348A (OSRAM)
DE (1) DE865860C (OSRAM)
FR (1) FR1044248A (OSRAM)
GB (1) GB711626A (OSRAM)
NL (1) NL78779C (OSRAM)

Families Citing this family (103)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (OSRAM) * 1950-10-31
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
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BE560264A (OSRAM) * 1956-09-25
BE593423A (OSRAM) * 1959-07-29
US3175908A (en) * 1959-07-29 1965-03-30 Kalle Ag Production of relief printing plates
NL255348A (OSRAM) * 1959-08-29
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BE606642A (OSRAM) * 1960-07-29
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US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
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CA1085212A (en) * 1975-05-27 1980-09-09 Ronald H. Engebrecht Use of volatile carboxylic acids in improved photoresists containing quinone diazides
US4040891A (en) * 1976-06-30 1977-08-09 Ibm Corporation Etching process utilizing the same positive photoresist layer for two etching steps
DE2653428C3 (de) 1976-11-24 1979-05-17 Claus Koenig Kg, 8520 Erlangen Farbfolie zum Herstellen einer Vorlage für Werbezwecke
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
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US4260673A (en) * 1979-09-05 1981-04-07 Minnesota Mining And Manufacturing Company Single sheet color proofing system
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4600684A (en) * 1983-02-10 1986-07-15 Oki Electric Industry Co., Ltd. Process for forming a negative resist using high energy beam
US4609615A (en) * 1983-03-31 1986-09-02 Oki Electric Industry Co., Ltd. Process for forming pattern with negative resist using quinone diazide compound
JPS6032045A (ja) * 1983-08-01 1985-02-19 Sanyo Kokusaku Pulp Co Ltd 多色画像形成材料およびその画像形成方法
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
DE3685766T2 (de) * 1985-04-18 1993-02-11 Fuji Chem Ind Co Ltd Photolackbildherstellungsverfahren.
EP0225464A3 (en) * 1985-12-10 1989-06-07 International Business Machines Corporation Composite resist structures
DE3629122A1 (de) * 1986-08-27 1988-03-10 Hoechst Ag Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
US4777109A (en) * 1987-05-11 1988-10-11 Robert Gumbinner RF plasma treated photosensitive lithographic printing plates
US5037720A (en) * 1987-07-21 1991-08-06 Hoechst Celanese Corporation Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
US5238771A (en) * 1988-05-31 1993-08-24 Konica Corporation Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
DE3822522A1 (de) * 1988-07-04 1990-03-22 Hoechst Ag 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
DE68928903T2 (de) * 1988-10-03 1999-08-12 Konica Corp., Tokio/Tokyo Lichtempfindliche Zusammensetzung
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
US5356758A (en) * 1988-12-28 1994-10-18 Texas Instruments Incorporated Method and apparatus for positively patterning a surface-sensitive resist on a semiconductor wafer
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0455228B1 (en) * 1990-05-02 1998-08-12 Mitsubishi Chemical Corporation Photoresist composition
JP2639853B2 (ja) * 1990-05-18 1997-08-13 富士写真フイルム株式会社 新規キノンジアジド化合物及びそれを含有する感光性組成物
US5395727A (en) * 1990-06-05 1995-03-07 Sumitomo Chemical Company, Limited Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol
US5145763A (en) * 1990-06-29 1992-09-08 Ocg Microelectronic Materials, Inc. Positive photoresist composition
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
US5589553A (en) * 1995-03-29 1996-12-31 Shipley Company, L.L.C. Esterification product of aromatic novolak resin with quinone diazide sulfonyl group
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
WO1997039894A1 (en) 1996-04-23 1997-10-30 Horsell Graphic Industries Limited Heat-sensitive composition and method of making a lithographic printing form with it
GB9517669D0 (en) * 1995-08-30 1995-11-01 Cromax Uk Ltd A printing apparatus and method
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5858626A (en) 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
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JP2002510404A (ja) 1997-07-05 2002-04-02 コダック・ポリクローム・グラフィックス・カンパニー・リミテッド パターン形成方法および放射線感受性材料
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6454789B1 (en) * 1999-01-15 2002-09-24 Light Science Corporation Patient portable device for photodynamic therapy
US6602274B1 (en) 1999-01-15 2003-08-05 Light Sciences Corporation Targeted transcutaneous cancer therapy
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ATE497882T1 (de) 2000-11-30 2011-02-15 Fujifilm Corp Flachdruckplattenvorläufer
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JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP2007070694A (ja) * 2005-09-07 2007-03-22 Konica Minolta Medical & Graphic Inc 帯状アルミニウム板の陽極酸化処理方法、平版印刷版材料用支持体及び陽極酸化処理装置
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JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JPWO2009063824A1 (ja) 2007-11-14 2011-03-31 富士フイルム株式会社 塗布膜の乾燥方法及び平版印刷版原版の製造方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (OSRAM) * 1950-10-31

Also Published As

Publication number Publication date
US3046120A (en) 1962-07-24
CH300348A (de) 1954-07-31
GB711626A (en) 1954-07-07
NL78779C (OSRAM) 1955-03-15
FR1044248A (fr) 1953-11-16
DE865860C (de) 1953-02-05
BE506677A (OSRAM)

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