AR217794A1 - Composicion fotopolimerizable y procedimiento para tratar un sustrato con dicha composicion - Google Patents
Composicion fotopolimerizable y procedimiento para tratar un sustrato con dicha composicionInfo
- Publication number
- AR217794A1 AR217794A1 AR258935A AR25893575A AR217794A1 AR 217794 A1 AR217794 A1 AR 217794A1 AR 258935 A AR258935 A AR 258935A AR 25893575 A AR25893575 A AR 25893575A AR 217794 A1 AR217794 A1 AR 217794A1
- Authority
- AR
- Argentina
- Prior art keywords
- composition
- treating
- procedure
- substrate
- photopolymerizable
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/28—Treatment by wave energy or particle radiation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/109—Polyester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Printing Methods (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/473,236 US3953214A (en) | 1974-05-24 | 1974-05-24 | Photopolymerizable screen printing inks and use thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AR217794A1 true AR217794A1 (es) | 1980-04-30 |
Family
ID=23878720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AR258935A AR217794A1 (es) | 1974-05-24 | 1975-05-23 | Composicion fotopolimerizable y procedimiento para tratar un sustrato con dicha composicion |
Country Status (24)
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2455303A1 (fr) * | 1979-04-24 | 1980-11-21 | Rhone Poulenc Syst | Procede pour la fabrication d'une carte d'identification inviolable comportant des photographies et carte obtenue selon ce procede |
| JPS56143277A (en) * | 1980-04-09 | 1981-11-07 | Toyobo Co Ltd | Uv-curing type ink composition for screen printing |
| JPS5713444A (en) * | 1980-06-27 | 1982-01-23 | Tamura Kaken Kk | Photosensitive composition |
| JPS6050356B2 (ja) * | 1980-11-29 | 1985-11-08 | 大日本インキ化学工業株式会社 | 連続パタ−ンメツキ用レジスト塗膜の形成方法 |
| US4481281A (en) * | 1981-01-16 | 1984-11-06 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
| US4451636A (en) * | 1981-01-16 | 1984-05-29 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
| US4436806A (en) | 1981-01-16 | 1984-03-13 | W. R. Grace & Co. | Method and apparatus for making printed circuit boards |
| US4442198A (en) * | 1981-01-16 | 1984-04-10 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
| US4422914A (en) * | 1981-01-16 | 1983-12-27 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
| US4816295A (en) * | 1981-07-06 | 1989-03-28 | C.A.M. Graphics Co., Inc. | Method for imparting an apparent finish to the surface of an article |
| US4485006A (en) * | 1982-03-04 | 1984-11-27 | Exxon Research And Engineering Co. | Start-up method for a hydrorefining process |
| JPS58179224U (ja) * | 1982-05-26 | 1983-11-30 | 川崎重工業株式会社 | ２輪車用ラジエタ−の支持構造 |
| JPS59128536A (ja) * | 1983-01-14 | 1984-07-24 | Nippon Shokubai Kagaku Kogyo Co Ltd | 紫外線硬化用組成物 |
| JPS6042469A (ja) * | 1983-08-16 | 1985-03-06 | Mitsubishi Rayon Co Ltd | 光硬化型防錆用被覆組成物 |
| DE3411126A1 (de) * | 1984-03-26 | 1985-10-03 | BIAS Forschungs- und Entwicklungs-Labor für angewandte Strahltechnik GmbH, 2820 Bremen | Vorrichtung zur bearbeitung von werkstuecken durch einen energiestrahl hoher leistungsdichte, insbesondere einem laserstrahl eines co(pfeil abwaerts)2(pfeil abwaerts)-lasers |
| JPS61106613A (ja) * | 1984-10-30 | 1986-05-24 | Nippon Kayaku Co Ltd | 光重合性組成物 |
| DE4022405A1 (de) * | 1990-07-13 | 1992-01-16 | Hoechst Ag | Verfahren zur herstellung von tetrafluorethylen-polymerisat in waessriger suspension |
| JPH0434047U (US06605200-20030812-C00035.png) * | 1990-07-16 | 1992-03-19 | ||
| US5352326A (en) * | 1993-05-28 | 1994-10-04 | International Business Machines Corporation | Process for manufacturing metalized ceramic substrates |
| US6558753B1 (en) | 2000-11-09 | 2003-05-06 | 3M Innovative Properties Company | Inks and other compositions incorporating limited quantities of solvent advantageously used in ink jetting applications |
| WO2002038688A2 (en) * | 2000-11-09 | 2002-05-16 | 3M Innovative Properties Company | Weather resistant, ink jettable, radiation curable, fluid compositions particularly suitable for outdoor applications |
| US6467897B1 (en) | 2001-01-08 | 2002-10-22 | 3M Innovative Properties Company | Energy curable inks and other compositions incorporating surface modified, nanometer-sized particles |
| DE602005011098D1 (de) * | 2004-01-06 | 2009-01-02 | Avery Dennison Corp | Strukturierte siebbedruckte laminate |
| CN101218104A (zh) * | 2005-07-06 | 2008-07-09 | 艾弗里·丹尼森公司 | 有纹理的丝网印刷层压制品 |
| TW201238414A (en) * | 2011-03-04 | 2012-09-16 | Taiwan Nanotechnology Corp | Photosensitive environment friendly ink circuit layout method |
| JP2017214523A (ja) * | 2016-06-02 | 2017-12-07 | 株式会社リコー | 活性エネルギー線硬化型組成物、活性エネルギー線硬化型インク、組成物収容容器、２次元又は３次元の像、その形成装置及び形成方法、構造体並びに成形加工品 |
| FR3135652A1 (fr) * | 2022-05-17 | 2023-11-24 | Adèle GUYODO | Procédé d'oxydation de feuilles de métal à dorer en sérigraphie aqueuse |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL87862C (US06605200-20030812-C00035.png) * | 1951-08-20 | |||
| US3255006A (en) * | 1963-03-04 | 1966-06-07 | Purex Corp Ltd | Photosensitive masking for chemical etching |
| US3695877A (en) * | 1969-08-13 | 1972-10-03 | Teijin Ltd | Photopolymerizable resin compositions |
| BE793732A (fr) * | 1972-01-10 | 1973-05-02 | Grace W R & Co | Composition contenant un polyene et un polythiol |
| JPS5513154B2 (US06605200-20030812-C00035.png) * | 1972-01-20 | 1980-04-07 | ||
| JPS5537869A (en) * | 1978-09-11 | 1980-03-17 | Tokyo Shibaura Electric Co | Method of judging abnormal temperature of electric eouipment |
-
1974
- 1974-05-24 US US05/473,236 patent/US3953214A/en not_active Expired - Lifetime
-
1975
- 1975-05-05 IN IN901/CAL/1975A patent/IN144896B/en unknown
- 1975-05-05 ES ES437454A patent/ES437454A1/es not_active Expired
- 1975-05-07 IL IL47251A patent/IL47251A/xx unknown
- 1975-05-09 ZA ZA00753003A patent/ZA753003B/xx unknown
- 1975-05-12 GB GB19962/75A patent/GB1507841A/en not_active Expired
- 1975-05-17 DE DE2522057A patent/DE2522057C3/de not_active Expired
- 1975-05-20 NL NLAANVRAGE7505886,A patent/NL174795C/xx not_active IP Right Cessation
- 1975-05-21 IT IT49699/75A patent/IT1035806B/it active
- 1975-05-21 FI FI751487A patent/FI64014C/fi not_active IP Right Cessation
- 1975-05-22 DD DD186192A patent/DD120661A5/xx unknown
- 1975-05-22 SE SE7505839A patent/SE431880C/xx not_active IP Right Cessation
- 1975-05-22 DD DD191391A patent/DD123993A5/xx unknown
- 1975-05-23 NO NO751831A patent/NO148190C/no unknown
- 1975-05-23 CH CH662575A patent/CH608516A5/xx not_active IP Right Cessation
- 1975-05-23 RO RO7582319A patent/RO67458A/ro unknown
- 1975-05-23 BE BE156666A patent/BE829438A/xx not_active IP Right Cessation
- 1975-05-23 FR FR7516149A patent/FR2272572B1/fr not_active Expired
- 1975-05-23 CA CA227,686A patent/CA1069371A/en not_active Expired
- 1975-05-23 BG BG030069A patent/BG26541A3/xx unknown
- 1975-05-23 DK DK227975A patent/DK145620C/da not_active IP Right Cessation
- 1975-05-23 AR AR258935A patent/AR217794A1/es active
- 1975-05-23 BR BR4188/75A patent/BR7503275A/pt unknown
- 1975-05-24 JP JP50062415A patent/JPS5760787B2/ja not_active Expired
- 1975-05-26 AT AT400675A patent/AT346372B/de not_active IP Right Cessation
-
1982
- 1982-05-10 JP JP57078077A patent/JPS57210692A/ja active Granted
Also Published As
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