AR121638A1 - METHOD FOR THE TREATMENT OF A METALLIC SUBSTRATE FOR THE PREPARATION OF ELECTRODES - Google Patents

METHOD FOR THE TREATMENT OF A METALLIC SUBSTRATE FOR THE PREPARATION OF ELECTRODES

Info

Publication number
AR121638A1
AR121638A1 ARP210100715A ARP210100715A AR121638A1 AR 121638 A1 AR121638 A1 AR 121638A1 AR P210100715 A ARP210100715 A AR P210100715A AR P210100715 A ARP210100715 A AR P210100715A AR 121638 A1 AR121638 A1 AR 121638A1
Authority
AR
Argentina
Prior art keywords
metal substrate
electrodes
preparation
treatment
metallic substrate
Prior art date
Application number
ARP210100715A
Other languages
Spanish (es)
Inventor
Alice Calderara
Marianna Brichese
Original Assignee
Industrie De Nora Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industrie De Nora Spa filed Critical Industrie De Nora Spa
Publication of AR121638A1 publication Critical patent/AR121638A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C23G1/10—Other heavy metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C25B1/04—Hydrogen or oxygen by electrolysis of water
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
    • C25B1/46—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis in diaphragm cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
    • C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
    • C25B11/061—Metal or alloy
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/06—Etching of iron or steel

Abstract

La presente invención se refiere a un método para el tratamiento de la superficie de un sustrato metálico, adecuado para su uso como soporte de electrodo en procesos electroquímicos, que comprende las siguientes etapas: (a) inmersión de dicho sustrato metálico y de al menos un contraelectrodo en un electrolito seleccionado entre ácido clorhídrico, ácido nítrico, ácido bórico o ácido sulfúrico a una concentración en peso de entre el 10 y el 40 %; (b) aplicación de una densidad de corriente anódica a dicho sustrato metálico de entre 0,1 y 30 A/dm² durante un tiempo de entre 0,5 y 120 minutos. La invención también se refiere a un electrodo para la liberación de gas en procesos electroquímicos, obtenido a partir de un sustrato tratado correspondientemente.The present invention relates to a method for treating the surface of a metal substrate, suitable for use as an electrode support in electrochemical processes, comprising the following steps: (a) immersion of said metal substrate and of at least one counter electrode in an electrolyte selected from hydrochloric acid, nitric acid, boric acid or sulfuric acid at a concentration by weight of between 10 and 40%; (b) applying an anodic current density to said metal substrate of between 0.1 and 30 A/dm² for a time between 0.5 and 120 minutes. The invention also relates to an electrode for gas release in electrochemical processes, obtained from a correspondingly treated substrate.

ARP210100715A 2020-03-24 2021-03-22 METHOD FOR THE TREATMENT OF A METALLIC SUBSTRATE FOR THE PREPARATION OF ELECTRODES AR121638A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT202000006187 2020-03-24

Publications (1)

Publication Number Publication Date
AR121638A1 true AR121638A1 (en) 2022-06-22

Family

ID=70918869

Family Applications (1)

Application Number Title Priority Date Filing Date
ARP210100715A AR121638A1 (en) 2020-03-24 2021-03-22 METHOD FOR THE TREATMENT OF A METALLIC SUBSTRATE FOR THE PREPARATION OF ELECTRODES

Country Status (15)

Country Link
US (1) US20230151503A1 (en)
EP (1) EP4127275B1 (en)
JP (1) JP2023523690A (en)
KR (1) KR20220158061A (en)
CN (1) CN115335556A (en)
AR (1) AR121638A1 (en)
AU (1) AU2021243591A1 (en)
BR (1) BR112022019176A2 (en)
CA (1) CA3175062A1 (en)
CL (1) CL2022002604A1 (en)
IL (1) IL296656B1 (en)
MX (1) MX2022011840A (en)
TW (1) TW202206653A (en)
WO (1) WO2021191241A1 (en)
ZA (1) ZA202210124B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114481284A (en) * 2021-12-28 2022-05-13 清华大学 Nickel electrode and preparation method and application thereof
CN114941153A (en) * 2022-05-31 2022-08-26 中自环保科技股份有限公司 Water electrolysis membrane electrode based on proton exchange membrane, preparation method, assembly and application

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB526854A (en) * 1939-03-27 1940-09-26 Battelle Memorial Institute Improvements in or relating to the electrolytic polishing of metal surfaces and an electrolyte therefor
IT1317969B1 (en) * 2000-06-09 2003-07-21 Nora Elettrodi De ELECTRODE CHARACTERIZED BY A HIGH ADHESION OF A SURFACE CATALYTIC LAYER.
CN101660194A (en) * 2009-09-18 2010-03-03 西北有色金属研究院 Electrochemical polishing method of nickel-tungsten alloy base-band for coated conductor
JP5042389B2 (en) * 2010-02-10 2012-10-03 ペルメレック電極株式会社 Active cathode for hydrogen generation
WO2014069360A1 (en) * 2012-10-31 2014-05-08 ダイソー株式会社 Positive electrode for zero-gap type brine electrolyzer, brine electrolyzer, and brine electrolyzing method using same
CN106757299B (en) * 2016-12-15 2019-01-15 上海电气核电设备有限公司 A kind of the electrobrightening corrosive agent and its application method of nickel-base alloy metallographic structure
CN106637377B (en) * 2016-12-19 2019-03-19 二重（德阳）重型装备有限公司 Nickel-base alloy electrolytic polishing liquid and its polishing method
CN106521587A (en) 2016-12-29 2017-03-22 中核北方核燃料元件有限公司 Nickel plating method for stainless steel strips
CN108425144B (en) * 2018-03-23 2020-04-24 陕西师范大学 Preparation method of karst foam nickel for producing oxygen by electrocatalytic total decomposition of hydrogen in water
CN109750317B (en) * 2018-12-26 2020-06-30 浙江工业大学 Preparation method of porous nickel-based copper-rhenium composite hydrogen evolution electrode
CN110205670B (en) * 2019-07-10 2020-09-08 二重（德阳）重型装备有限公司 Corrosion inhibition nickel-based alloy electrolytic polishing solution and polishing method thereof
CN110592614B (en) * 2019-09-27 2021-05-11 西南石油大学 Three-dimensional self-supporting electrocatalyst for preparing hydrogen by water decomposition and preparation method thereof
CN110760862A (en) 2019-11-26 2020-02-07 江东电子材料有限公司 Production process of smooth-surface roughened electrolytic copper foil

Also Published As

Publication number Publication date
US20230151503A1 (en) 2023-05-18
EP4127275C0 (en) 2024-03-06
ZA202210124B (en) 2024-01-31
BR112022019176A2 (en) 2022-11-01
CL2022002604A1 (en) 2023-04-21
JP2023523690A (en) 2023-06-07
CN115335556A (en) 2022-11-11
IL296656A (en) 2022-11-01
CA3175062A1 (en) 2021-09-30
AU2021243591A1 (en) 2022-09-29
TW202206653A (en) 2022-02-16
EP4127275B1 (en) 2024-03-06
IL296656B1 (en) 2024-01-01
MX2022011840A (en) 2022-10-20
WO2021191241A1 (en) 2021-09-30
EP4127275A1 (en) 2023-02-08
KR20220158061A (en) 2022-11-29

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